Patent US6608371B2 successfully refreshed from Google Patents.
US6608371B2
Expired / Lapsed
US
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Semiconductor device and method of manufacturing the same, circuit board, and electronic equipment
Assignee: Samsung Electronics Co Ltd
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Filing: 2001-07-11
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Granted: 2003-08-19
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Expires: 2021-07-11
Abstract
Abstract A method of manufacturing a semiconductor device includes: a first step of forming a first through hole that penetrates the location of the electrode in a semiconductor element having an electrode; a second step of providing an insulating material in a region including an inside of the first through hole, in such a manner that a second through hole is provided penetrating through the insulating material; and a third step of providing a conductive member within the second through hole that penetrates through at least the insulating material in the inside of the first through hole.
Inventors
- 👤 Yohei Kurashima
- 👤 Kazushige Umetsu
- 👤 Haruki Ito
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 11:30
CPC Classifications
H; H10; H10W; H10W90/00; H10W20/00; H10W20/01; H10W20/021; H10W20/023; H10W20/0238; H10W20/0242; H10W20/0265; H10W20/20; H10W70/00; H10W70/60; H10W72/00; H10W72/01; H10W72/012; H10W72/01221; H10W72/01225; H10W72/019; H10W72/071; H10W72/072; H10W72/07221; H10W72/07227; H10W72/07231; H10W72/07236; H10W72/073; H10W72/20; H10W72/221; H10W72/222; H10W72/225; H10W72/241; H10W72/244; H10W72/251; H10W72/252; H10W72/253; H10W72/29; H10W72/90; H10W72/921; H10W72/923; H10W72/925; H10W72/941; H10W72/942; H10W72/951; H10W72/952; H10W72/953; H10W90/20; H10W90/291; H10W90/297; H10W90/701; H10W90/721; H10W90/722; H10W90/724
Claims Analysis
Total Claims: 40
Claim 1
Independent Claim
108 words
A method of manufacturing a semiconductor device, the method comprising: a first step of forming a first through hole that penetrates the location of the electrode in a semiconductor element having an electrode; a second step of providing an insulating material in a region including an inside of the first through hole, in such a manner that a second through hole is provided penetrating through the insulating material; and a third step of providing a conductive member within the second through hole that penetrates through at least the insulating material in the inside of the first through hole, wherein the first through hole extends through the semiconductor element.
Claim 2
Independent Claim
108 words
A method of manufacturing a semiconductor device, the method comprising: a first step of forming a first through hole that penetrates the location of the electrode in a semiconductor element having an electrode; a second step of providing an insulating material in a region including an inside of the first through hole, in such a manner that a second through hole is provided penetrating through the insulating material; and a third step of providing a conductive member within the second through hole that penetrates through at least the insulating material in the inside of the first through hole, wherein the first through hole extends through the semiconductor element.
Claim 3
Dependent Claim
45 words
The method of manufacturing a semiconductor device as defined by claim 1 , further comprising steps of: stacking a plurality of the semiconductor devices manufactured by the method defined by claim 1 ; and electrically connecting upper and lower semiconductor elements by the conductive member.
Claim 4
Dependent Claim
43 words
The method of manufacturing a semiconductor device as defined by claim 2 , wherein in the second step, the insulating material is formed to cover a surface of the semiconductor element which is opposite to a surface on which the electrode is formed.
Claim 5
Dependent Claim
61 words
The method of manufacturing a semiconductor device as defined by claim 3 , wherein the insulating material is formed of a resin, wherein a plurality of the semiconductor elements are pasted together by using the resin as an adhesive, and wherein the conductive member and the electrode are electrically connected by heating the resin to complete hardening contraction of the resin.
Claim 6
Dependent Claim
36 words
The method of manufacturing a semiconductor device as defined by claim 4 , wherein the resin is heated before a plurality of the semiconductor elements are pasted together, to activate the adhesive force of the resin.
Claim 7
Dependent Claim
32 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein the insulating material is formed of a resin, and wherein the resin is applied in the second step.
Claim 8
Dependent Claim
63 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein in the second step, the first through hole is filled with the insulating material, and the second through hole having a diameter smaller than a diameter of the first through hole is formed inside the first through hole, in such a manner as to pass through the insulating material.
Claim 9
Dependent Claim
37 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein the conductive member is a conductive paste, and wherein the second through hole is filled with the conductive paste in the second step.
Claim 10
Dependent Claim
34 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein the second through hole is formed with a taper that decreases in dimension towards the electrode of the semiconductor element.
Claim 11
Dependent Claim
35 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein the second through hole is formed with a taper that decreases in dimension away from the electrode of the semiconductor element.
Claim 12
Dependent Claim
33 words
The method of manufacturing a semiconductor device as defined by claim 1 , wherein at least one of the first through hole and the second through hole is formed by a laser beam.
Claim 13
Dependent Claim
36 words
The method of manufacturing a semiconductor device as defined by claim 11 , wherein the laser beam is irradiated from a surface opposite to a surface of the semiconductor element on which the electrode is formed.
Claim 14
Independent Claim
125 words
A method of manufacturing a semiconductor device, the method comprising: a first step of forming a first through hole that penetrates the location of the electrode in first and second semiconductor elements each having an electrode; a second step of providing an insulating material in a region including an inside of the first through hole, in such a manner that a second through hole is provided penetrating through the insulating material; and a third step of electrically connecting the electrode of the semiconductor element and a conductive member, and fitting the conductive member into the second through hole in the second semiconductor device, and superposing the first and second semiconductor elements, wherein the first through hole extends through the respective first and second semiconductor elements.
Claim 15
Independent Claim
125 words
A method of manufacturing a semiconductor device, the method comprising: a first step of forming a first through hole that penetrates the location of the electrode in first and second semiconductor elements each having an electrode; a second step of providing an insulating material in a region including an inside of the first through hole, in such a manner that a second through hole is provided penetrating through the insulating material; and a third step of electrically connecting the electrode of the semiconductor element and a conductive member, and fitting the conductive member into the second through hole in the second semiconductor device, and superposing the first and second semiconductor elements, wherein the first through hole extends through the respective first and second semiconductor elements.
Claim 16
Dependent Claim
43 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein in the second step, the insulating material is formed to cover a surface of the semiconductor element which is opposite to a surface on which the electrode is formed.
Claim 17
Dependent Claim
61 words
The method of manufacturing a semiconductor device as defined by claim 14 , wherein the insulating material is formed of a resin, wherein a plurality of the semiconductor elements are pasted together by using the resin as an adhesive, and wherein the conductive member and the electrode are electrically connecting by heating the resin to complete hardening contraction of the resin.
Claim 18
Dependent Claim
36 words
The method of manufacturing a semiconductor device as defined by claim 15 , wherein the resin is heated before a plurality of the semiconductor elements are pasted together, to activate the adhesive force of the resin.
Claim 19
Dependent Claim
32 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein the insulating material is formed of a resin, and wherein the resin is applied in the second step.
Claim 20
Dependent Claim
63 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein in the second step, the first through hole is filled with the insulating material, and the second through hole having a diameter smaller than a diameter of the first through hole is formed inside the first through hole, in such a manner as to pass through the insulating material.
Claim 21
Dependent Claim
37 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein the conductive member is a conductive paste, and wherein the second through hole is filled with the conductive paste in the second step.
Claim 22
Dependent Claim
42 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein the conductive member is a bump, and wherein at least part of the bump engages with the second through hole in the semiconductor element during the third step.
Claim 23
Dependent Claim
24 words
The method of manufacturing a semiconductor device as defined by claim 20 , wherein a plurality of the bumps are provided in a stack.
Claim 24
Dependent Claim
28 words
The method of manufacturing a semiconductor device as defined by claim 20 , wherein after the third step, the bump is melted to fill the second through hole.
Claim 25
Dependent Claim
34 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein the second through hole is formed with a taper that decreases in dimension towards the electrode of the semiconductor element.
Claim 26
Dependent Claim
35 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein the second through hole is formed with a taper that decreases in dimension away from the electrode of the semiconductor element.
Claim 27
Dependent Claim
33 words
The method of manufacturing a semiconductor device as defined by claim 13 , wherein at least one of the first through hole or the second through hole is formed by a laser beam.
Claim 28
Dependent Claim
36 words
The method of manufacturing a semiconductor device as defined by claim 25 , wherein the laser beam is irradiated from a surface opposite to a surface of the semiconductor element on which the electrode is formed.
Claim 29
Dependent Claim
18 words
A semiconductor device manufactured by the method of manufacturing a semiconductor device as defined by claim 1 .
Claim 30
Dependent Claim
18 words
A semiconductor device manufactured by the method of manufacturing a semiconductor device as defined by claim 13 .
Claim 31
Dependent Claim
64 words
A semiconductor device comprising: a semiconductor element having an electrode, a through hole being formed at a location of the electrode; insulating material provided in a region including an inside of the through hole; and a conductive member provided in such a manner as to pass along a central axis of the through hole, wherein the first through hole extends through the semiconductor element.
Claim 32
Dependent Claim
64 words
A semiconductor device comprising: a semiconductor element having an electrode, a through hole being formed at a location of the electrode; insulating material provided in a region including an inside of the through hole; and a conductive member provided in such a manner as to pass along a central axis of the through hole, wherein the first through hole extends through the semiconductor element.
Claim 33
Dependent Claim
19 words
The semiconductor device as defined by claim 29 , wherein the through hole is filled with the conductive member.
Claim 34
Dependent Claim
29 words
The semiconductor device as defined by claim 29 , wherein the through hole is formed with a taper that decreases in dimension towards the electrode of the semiconductor element.
Claim 35
Dependent Claim
30 words
The semiconductor device as defined by claim 29 , wherein the through hole is formed with a taper that decreases in dimension away from the electrode of the semiconductor element.
Claim 36
Dependent Claim
43 words
The semiconductor device as defined by claim 29 , wherein the insulating material is provided so as to expose the conductive member and to cover a surface of the semiconductor element which is opposite to a surface on which the electrode is formed.
Claim 37
Dependent Claim
43 words
The semiconductor device as defined by claim 29 , wherein a part of the conductive member protrudes to an outside of the through hole, at a surface of the semiconductor element which is opposite to a surface on which the electrode is formed.
Claim 38
Dependent Claim
34 words
The semiconductor device as defined by claim 29 , wherein a stack of a plurality of the semiconductor devices are provided, and upper and lower semiconductor elements are connected electrically by the conductive member.
Claim 39
Dependent Claim
16 words
A circuit board on which is mounted the semiconductor device as defined by claim 29 .
Claim 40
Dependent Claim
12 words
Electronic equipment having the semiconductor device as defined by claim 29 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-08-18 | 2007-02-17 | 2007-08-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-08-18 | 2011-02-17 | 2011-08-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-08-18 | 2015-02-17 | 2015-08-19 | $7700.00 | Window Closed / Lapsed |