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US6522392B1
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Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system
Assignee: Carl Zeiss SMT GmbH
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Filing: 2000-11-22
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Granted: 2003-02-18
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Expires: 2020-11-22
Abstract
Abstract An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source ( 30 ) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation ( 1 ) of the light source ( 30 ) the optical element is substantially symmetrical in relation to an axis of rotational symmetry ( 5 ). The optical element or its housing ( 6 ) is rotatably connected to a frame ( 7 ) by at least one bearing ( 8, 9, 10 ). An actuator ( 18 ) sets the optical element ( 25 ) or its housing ( 6 ) in rotation about the axis of rotational symmetry ( 5 ). The actuation cooperates with a control device ( 23 ). The latter activates the actuator ( 18 ) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.
Inventors
- 👤 Werner Müller-Rissmann
- 👤 Hubert Holderer
- 👤 Rudolf Von Bünau
- 👤 Christian Wagner
- 👤 Jochen Becker
- 👤 Stefan Xalter
- 👤 Wolfgang Hummel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; G03F7/70258; G03F7/708; G03F7/70808; G03F7/70825
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
234 words
A method of compensating rotationally non-symmetrical image defects in an optical system, the optical system comprising a microlithographic projection printing installation: a) having a light source; b) having an optical element, which ba) comprises at least one surface acted upon by radiation of the light source; and bb) the basic shape of which at least in the region of the at least one surface acted upon by radiation is substantially symmetrical relative to an axis of rotational symmetry, wherein c) the optical element ( 25 ) or its housing ( 6 ) is rotatably connected to a frame ( 7 ) by at least one bearing ( 8 , 9 , 10 ); d) an actuator ( 18 ) is provided, which sets at least one of the optical element ( 25 ) and its housing ( 6 ) in rotation about the axis of rotational symmetry; wherein e) the actuator ( 18 ) cooperates with a control device 923 ), which activates the actuator ( 18 ) at least temporarily during the period, when the optical element ( 25 ) is exposed to rumination, for rotation of the optical element ( 25 ); wherein the method has the following process steps: a) rotation of the optical element ( 25 ) through a specific angle of rotation; b) reverse rotation of the optical element ( 25 ) through a specific angle of reverse rotation.
Claim 2
Independent Claim
234 words
A method of compensating rotationally non-symmetrical image defects in an optical system, the optical system comprising a microlithographic projection printing installation: a) having a light source; b) having an optical element, which ba) comprises at least one surface acted upon by radiation of the light source; and bb) the basic shape of which at least in the region of the at least one surface acted upon by radiation is substantially symmetrical relative to an axis of rotational symmetry, wherein c) the optical element ( 25 ) or its housing ( 6 ) is rotatably connected to a frame ( 7 ) by at least one bearing ( 8 , 9 , 10 ); d) an actuator ( 18 ) is provided, which sets at least one of the optical element ( 25 ) and its housing ( 6 ) in rotation about the axis of rotational symmetry; wherein e) the actuator ( 18 ) cooperates with a control device 923 ), which activates the actuator ( 18 ) at least temporarily during the period, when the optical element ( 25 ) is exposed to rumination, for rotation of the optical element ( 25 ); wherein the method has the following process steps: a) rotation of the optical element ( 25 ) through a specific angle of rotation; b) reverse rotation of the optical element ( 25 ) through a specific angle of reverse rotation.
Claim 3
Dependent Claim
40 words
A method as claimed in claim 1 , wherein by means of the control device ( 23 ) the reversal points between the two directions of rotation within an angle-of-rotation range are activated at an identical relative rate of occurrence.
Claim 4
Dependent Claim
46 words
A method as claimed in one of claim 1 , wherein the optical element ( 25 ) is rotated in relation to a starting position in accordance with the symmetry of the radiated power distribution in the light beam through a fraction of a full revolution.
Claim 5
Independent Claim
345 words
A method of compensating rotationally non-symmetrical image defects in an optical system, through which a light beam is passed, the optical system comprising a microlithographic projection printing installation: a) having a light source; b) having an optical element, which ba) comprises at least one surface acted upon by radiation of the light source; and bb) the basic shape of which at least in the region of the at least one surface acted upon by radiation is substantially symmetrical relative to an axis of rotational symmetry, wherein c) the optical element ( 25 ) or its housing ( 6 ) is rotatably connected to a frame ( 7 ) by at least one bearing ( 8 , 9 , 10 ); d) an actuator ( 18 ) is provided, which sets at least one of the optical element ( 25 ) and its housing ( 6 ) in rotation about the axis of rotational symmetry; wherein e) the actuator ( 18 ) cooperates with a control device 923 ), which activates the actuator ( 18 ) at least temporarily during the period, when the optical element ( 25 ) is exposed to rumination, for rotation of the optical element ( 25 ); wherein the method has the following process steps: a) compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ), fast rotation of the optical element ( 25 ) through a specific angle of rotation; b) maintaining of the position of the optical element ( 25 ) for a dwell period, which is long compared to the duration of rotation and short compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ); c) compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ), fast reverse rotation of the optical element ( 25 ) through a specific angle of reverse rotation.
Claim 6
Independent Claim
345 words
A method of compensating rotationally non-symmetrical image defects in an optical system, through which a light beam is passed, the optical system comprising a microlithographic projection printing installation: a) having a light source; b) having an optical element, which ba) comprises at least one surface acted upon by radiation of the light source; and bb) the basic shape of which at least in the region of the at least one surface acted upon by radiation is substantially symmetrical relative to an axis of rotational symmetry, wherein c) the optical element ( 25 ) or its housing ( 6 ) is rotatably connected to a frame ( 7 ) by at least one bearing ( 8 , 9 , 10 ); d) an actuator ( 18 ) is provided, which sets at least one of the optical element ( 25 ) and its housing ( 6 ) in rotation about the axis of rotational symmetry; wherein e) the actuator ( 18 ) cooperates with a control device 923 ), which activates the actuator ( 18 ) at least temporarily during the period, when the optical element ( 25 ) is exposed to rumination, for rotation of the optical element ( 25 ); wherein the method has the following process steps: a) compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ), fast rotation of the optical element ( 25 ) through a specific angle of rotation; b) maintaining of the position of the optical element ( 25 ) for a dwell period, which is long compared to the duration of rotation and short compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ); c) compared to the time constant of the formation of image defects induced by the radiation ( 1 ) of the light source ( 30 ), fast reverse rotation of the optical element ( 25 ) through a specific angle of reverse rotation.
Claim 7
Dependent Claim
44 words
A method as claimed in claim 4 , wherein the optical element ( 25 ) is rotated in relation to a starting position in accordance with the symmetry of the radiated power distribution in the light beam through a fraction of a full revolution.
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