Patent US6490451B1 successfully refreshed from Google Patents.
Patent US6504644B1 successfully refreshed from Google Patents.
US6504644B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Modulator design for pattern generator
Assignee: Micronic Laser Systems AB
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Filing: 1999-03-02
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Granted: 2003-01-07
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Expires: 2019-03-02
Abstract
Abstract An apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source, a spatial modulator (SLM) having a multitude of modulating elements (pixels), a projection system, an electronic data processing and delivery system controlling said modulator, a precision mechanical system for moving said workpiece and an electronic control system. Specifically, the drive signals can set the pixels in a number of states larger than two, and intermediate modulation states are used for pixels along edges of pattern features. The design of the modulating elements and the exposure method create, for differently placed and/or differently oriented edges in the pattern, a symmetry in the aperture stop of the projection system.
Inventors
- 👤 Torbjorn Sandstrom
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 10:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70716; G03F7/70725; G03F7/20; B; B23; B23K; B23K26/00; B23K26/02; B23K26/03; B23K26/032; B23K26/06; B23K26/064; B23K26/0648; B41; B41J; B41J2/00; B41J2/435; B41J2/465; G02; G02B; G02B26/00; G02B26/08; G02B26/0816; G02B26/0833; G02B26/0841; G02B27/00; G02B27/0025; G02B27/0037; G02B27/0043; G02B27/42; G02B27/4205; G03F7/2022; G03F7/70008; G03F7/70041; G03F7/70216; G03F7/70283; G03F7/70291; G03F7/70383; G03F7/704; G03F7/70425; G03F7/70475; G09; G09G; G09G3/00; G09G3/20; G09G3/34; G09G3/3433; G09G3/346; H; H04; H04N; H04N1/00; H04N1/04; H04N1/19; H04N1/195; H04N5/00; H04N5/74; H04N5/7416; H04N5/7458; G09G3/2007; H04N2201/00; H04N2201/04; H04N2201/0402; H04N2201/0414
Claims Analysis
Total Claims: 48
Claim 1
Independent Claim
215 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask, a display panel or a microoptical device, comprising: a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, where the drive signals and the modulating elements are adapted to create a number of modulation states larger than two, where intermediate modulation states are used for pixels along edges of pattern features, and the design of the modulating elements and the exposure method are adapted to create, for differently placed and/or differently oriented edges in the pattern, a symmetry in an aperture stop of the projection system.
Claim 2
Independent Claim
215 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask, a display panel or a microoptical device, comprising: a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, where the drive signals and the modulating elements are adapted to create a number of modulation states larger than two, where intermediate modulation states are used for pixels along edges of pattern features, and the design of the modulating elements and the exposure method are adapted to create, for differently placed and/or differently oriented edges in the pattern, a symmetry in an aperture stop of the projection system.
Claim 3
Dependent Claim
39 words
An apparatus according to claim 1 , where asymmetry between edges placed at different positions relative to the pixel grid is reduced by overlaying at least two images with different placement of the pixel grid relative to the pattern.
Claim 4
Dependent Claim
23 words
An apparatus according to claim 1 , where the SLM is a deflection type SLM and the symmetry relates to the intensity distribution.
Claim 5
Dependent Claim
24 words
An apparatus according to claim 3 , where the modulating elements are deflecting the light symmetrically relative to the center of the aperture stop.
Claim 6
Dependent Claim
40 words
An apparatus according to claim 3 , where the modulating elements deflecting the light asymmetrically relative to the center of the aperture stop, at least two exposures having opposite directions of deflection for a pixel in the image are overlayed.
Claim 7
Dependent Claim
74 words
An apparatus according to claim 3 , where the modulating elements are deflecting the light asymmetrically relative to the center of the aperture stop, and deflecting the light from a modulating element at an edge of a feature in the pattern is controlled to be in a direction having a fixed geometrical relation to the orientation of the edge, e.g. in a direction perpendicular to the edge and toward the interior of the feature.
Claim 8
Dependent Claim
15 words
An apparatus according to claim 1 , where the SLM is a diffraction type SLM.
Claim 9
Dependent Claim
34 words
An apparatus according to claim 7 , where the differences between differently placed and/or oriented edges are reduced by overlaying at least two exposures using complementary states of the modulator with opposite phase maps.
Claim 10
Dependent Claim
20 words
An apparatus according to claim 7 , where the modulating elements have essentially constant average phase for different modulation states.
Claim 11
Dependent Claim
31 words
An apparatus according to claim 9 , where a modulating element gives an average complex amplitude essentially limited to real values, said real values being in the range −1 to 1.
Claim 12
Dependent Claim
33 words
An apparatus according to claim 9 , where a modulating element gives an average complex amplitude essentially limited to real values, said real values being most preferably in the range −0.5 to 0.
Claim 13
Dependent Claim
22 words
An apparatus according to claim 1 , where a modulating element is a reflective micromirror with at least one pivoting surface elements.
Claim 14
Dependent Claim
29 words
An apparatus according to claim 1 where a modulating element is a reflective micromirror with at least one deforming surface element having an essentially constant phase for varying deformation.
Claim 15
Dependent Claim
57 words
An apparatus according to claim 1 , where the pattern consists of areas with an essentially uniform exposure dose and a background having a different dose, and where at least one modulating element is driven to a state where its complex amplitude is negative relative to the state corresponding to the highest of two uniform exposure doses.
Claim 16
Dependent Claim
29 words
An apparatus according to claim 1 where adjacent modulating element are driven to different states selected to provide in the image a complex amplitude essentially limited to being real.
Claim 17
Dependent Claim
21 words
An apparatus according to claim 1 , where a modulating element has an N-fold rotational symmetry, N being at least 2.
Claim 18
Dependent Claim
29 words
An apparatus according to claim 1 , where a modulating element is rotationally asymmetric and rotational symmetry is created in the pattern by multiple exposure with different modulation states.
Claim 19
Dependent Claim
40 words
An apparatus according to claim 1 where the light intensity in the pupil plane of the projection system is asymmetrical for intermediate states of modulation, and a sequence of overlayed exposures gives an average symmetrical distribution for said intermediate states.
Claim 20
Dependent Claim
49 words
An apparatus according to claim 1 , adapted to write patterns with areas with essentially two uniform exposure doses, and where the state of the modulating elements corresponding to the smallest dose has a complex amplitude that is negative relative to the state corresponding to the highest exposure dose.
Claim 21
Dependent Claim
49 words
An apparatus according to claim 1 adapted to write patterns with pattern with areas with essentially two uniform exposures, and where near the boundaries between the areas at least one modulating element is driven to a state corresponding to an exposure outside the range between the two uniform exposures.
Claim 22
Dependent Claim
34 words
An apparatus according to claim 1 where for two exposed areas in the pattern separated by a narrow unexposed line the SLM is driven to create opposite phase on the sides of the line.
Claim 23
Dependent Claim
22 words
An apparatus according to claim 1 , where a modulating element is a reflective micromirror with at least four pivoting surface elements.
Claim 24
Dependent Claim
22 words
An apparatus according to claim 1 , where the modulation element has an N-fold rotational symmetry, N being preferably at least 4.
Claim 25
Independent Claim
216 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising: a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, where the drive signals and the modulating elements are adapted to create a number of modulation states preferably larger than three, where intermediate modulation states are used for pixels along edges of pattern features, and the design of the modulating elements and the exposure method are adapted to create, for differently placed and/or differently oriented edges in the pattern, a symmetry in an aperture stop of the projection system.
Claim 26
Independent Claim
216 words
An apparatus for creating a pattern on a workpiece sensitive to light radiation, such as a photomask a display panel or a microoptical device, comprising: a source for emitting light in the wavelength range from EUV to IR, a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation, a projection system creating an image of the modulator on the workpiece, an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting said pattern to modulator signals, and feeding said signals to the modulator, a precision mechanical system for positioning said workpiece and/or projection system relative to each other, an electronic control system controlling the position of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is printed on the workpiece, where the drive signals and the modulating elements are adapted to create a number of modulation states preferably larger than three, where intermediate modulation states are used for pixels along edges of pattern features, and the design of the modulating elements and the exposure method are adapted to create, for differently placed and/or differently oriented edges in the pattern, a symmetry in an aperture stop of the projection system.
Claim 27
Dependent Claim
39 words
An apparatus according to claim 24 , where asymmetry between edges placed at different positions relative to the pixel grid is reduced by overlaying at least two images with different placement of the pixel grid relative to the pattern.
Claim 28
Dependent Claim
23 words
An apparatus according to claim 24 , where the SLM is a deflection type SLM and the symmetry relates to the intensity distribution.
Claim 29
Dependent Claim
24 words
An apparatus according to claim 26 , where the modulating elements are deflecting the light symmetrically relative to the center of the aperture stop.
Claim 30
Dependent Claim
40 words
An apparatus according to claim 26 , where the modulating elements deflecting the light asymmetrically relative to the center of the aperture stop, at least two exposures having opposite directions of deflection for a pixel in the image are overlayed.
Claim 31
Dependent Claim
74 words
An apparatus according to claim 26 , where the modulating elements are deflecting the light asymmetrically relative to the center of the aperture stop, and deflecting the light from a modulating element at an edge of a feature in the pattern is controlled to be in a direction having a fixed geometrical relation to the orientation of the edge, e.g. in a direction perpendicular to the edge and toward the interior of the feature.
Claim 32
Independent Claim
15 words
An apparatus according to claims 24 , where the SLM is a diffraction type SLM.
Claim 33
Dependent Claim
34 words
An apparatus according to claim 30 , where the differences between differently placed and/or oriented edges are reduced by overlaying at least two exposures using complementary states of the modulator with opposite phase maps.
Claim 34
Dependent Claim
20 words
An apparatus according to claim 30 , where the modulating elements have essentially constant average phase for different modulation states.
Claim 35
Dependent Claim
31 words
An apparatus according to claim 32 , where a modulating element gives an average complex amplitude essentially limited to real values, said real values being in the range −1 to 1.
Claim 36
Dependent Claim
33 words
An apparatus according to claim 32 , where a modulating element gives an average complex amplitude essentially limited to real values, said real values being most preferably in the range −0.5 to 0.
Claim 37
Dependent Claim
22 words
An apparatus according to claim 24 , where a modulating element is a reflective micromirror with at least one pivoting surface element.
Claim 38
Dependent Claim
30 words
An apparatus according to claim 24 , where a modulating element is a reflective micromirror with at least one deforming surface element having an essentially constant phase for varying deformation.
Claim 39
Dependent Claim
57 words
An apparatus according to claim 24 , where the pattern consists of areas with an essentially uniform exposure dose and a background having a different dose, and where at least one modulating element is driven to a state where its complex amplitude is negative relative to the state corresponding to the highest of two uniform exposure doses.
Claim 40
Dependent Claim
30 words
An apparatus according to claim 24 , where adjacent modulating element, are driven to different states selected to provide in the image a complex amplitude essentially limited to being real.
Claim 41
Dependent Claim
21 words
An apparatus according to claim 24 , where a modulating element has an N-fold rotational symmetry, N being at least 2.
Claim 42
Dependent Claim
29 words
An apparatus according to claim 24 , where a modulating element is rotationally asymmetric and rotational symmetry is created in the pattern by multiple exposure with different modulation states.
Claim 43
Dependent Claim
41 words
An apparatus according to claim 24 , where the light intensity in the pupil plane of the projection system is asymmetrical for intermediate states of modulation, and a sequence of overlayed exposures gives an average symmetrical distribution for said intermediate states.
Claim 44
Dependent Claim
49 words
An apparatus according to claim 24 , adapted to write patterns with areas with essentially two uniform exposure doses, and where the state of the modulating elements corresponding to the smallest dose has a complex amplitude that is negative relative to the state corresponding to the highest exposure dose.
Claim 45
Dependent Claim
48 words
An apparatus according to claim 24 , adapted to write patterns with areas with essentially two uniform exposures, and where near the boundaries between the areas at least one modulator element is driven to a state corresponding to an exposure outside the range between the two uniform exposures.
Claim 46
Dependent Claim
35 words
An apparatus according to claim 24 , where for two exposed areas in the pattern separated by a narrow unexposed line the SLM is driven to create opposite phase on the sides of the line.
Claim 47
Dependent Claim
22 words
An apparatus according to claim 24 , where a modulating element is a reflective micromirror with at least four pivoting surface elements.
Claim 48
Dependent Claim
22 words
An apparatus according to claim 24 , where a modulating element has an N-fold rotational symmetry, N being preferably at least 4.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-01-06 | 2006-07-08 | 2007-01-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-01-06 | 2010-07-08 | 2011-01-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-01-06 | 2014-07-08 | 2015-01-07 | $7700.00 | Window Closed / Lapsed |