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US6452017B1
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Complexes having tris(pyrazolyl)methanate ligands
Assignee: Micron Technology Inc
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Filing: 2000-07-14
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Granted: 2002-09-17
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Expires: 2020-07-14
Abstract
Abstract Methods of forming a film on a substrate using chemical vapor deposition techniques and pyrazolyl complexes. The complexes and methods are particularly suitable for the preparation of semiconductor structures.
Inventors
- 👤 Stefan Uhlenbrock
- 👤 Brian A. Vaartstra
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:24
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; C; C23; C23C; C23C16/00; C23C16/06; C23C16/18; C23C16/22; C23C16/30; C23C16/40; C23C16/409; H10P14/66; H10P14/668; H10P14/69; H10P14/692; H10P14/6938; H10P14/69398
Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
52 words
A chemical vapor deposition precursor composition comprising one or more metal complexes comprising a Group IIA, IVB, VA, or VB metal and one or more anionic tris(pyrazolyl)methanate ligands of the formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 2
Dependent Claim
52 words
A chemical vapor deposition precursor composition comprising one or more metal complexes comprising a Group IIA, IVB, VA, or VB metal and one or more anionic tris(pyrazolyl)methanate ligands of the formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 3
Dependent Claim
94 words
A chemical vapor deposition precursor composition comprising one or more metal complexes selected from the group of ML 2 , M(O)L 2 , M(OR 4 ) x L 4−x , and M(OR 4 ) y L 5−y ; wherein: M is a Group IIA, IVB, VA, or VB metal; each R 4 group is independently an organic group; x=2 to 4; y=2 to 5; L is an anionic ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 4
Dependent Claim
94 words
A chemical vapor deposition precursor composition comprising one or more metal complexes selected from the group of ML 2 , M(O)L 2 , M(OR 4 ) x L 4−x , and M(OR 4 ) y L 5−y ; wherein: M is a Group IIA, IVB, VA, or VB metal; each R 4 group is independently an organic group; x=2 to 4; y=2 to 5; L is an anionic ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 5
Dependent Claim
82 words
A metal complex of one of the following formulas ML 2 , M(O)L 2 , M(OR 4 ) x L 4−x , and M(OR 4 ) y L 5−y ; wherein: M is a Group IIA, IVB, VA, or VB metal; each R 4 group is independently an organic; x=2to 4; y=2to 5; L is an anionic ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or halide.
Claim 6
Dependent Claim
82 words
A metal complex of one of the following formulas ML 2 , M(O)L 2 , M(OR 4 ) x L 4−x , and M(OR 4 ) y L 5−y ; wherein: M is a Group IIA, IVB, VA, or VB metal; each R 4 group is independently an organic; x=2to 4; y=2to 5; L is an anionic ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or halide.
Claim 7
Dependent Claim
29 words
An anionic tris(pyrazolyl)methanate ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 8
Dependent Claim
29 words
An anionic tris(pyrazolyl)methanate ligand of the following formula: wherein each R 1 , R 2 , and R 3 group is independently H, an organic group, or a halide.
Claim 9
Dependent Claim
21 words
The precursor composition of claim 1 wherein the metal is selected from the group of Ba, Sr, Ti, and mixtures thereof.
Claim 10
Dependent Claim
20 words
The precursor composition of claim 2 wherein M is selected from the group of Ba, Sr, Ti, and mixtures thereof.
Claim 11
Dependent Claim
20 words
The metal complex of claim 3 wherein M is selected from the group of Ba, Sr, Ti, and mixtures thereof.
Claim 12
Dependent Claim
65 words
The precursor composition of claim 1 wherein the complexes are selected from the group of ML 2 , M(O)L 2 , M(OR 4 ) x L 4−x , and M(OR 4 ) y L 5−y , wherein L is the anionic tris(pyrazolyl)methanate ligand, M is a Group IIA, IVB, or VB metal, R 4 is an organic group, x=2 to 4, and y=2 to 5.
Claim 13
Dependent Claim
21 words
The precursor composition of claim 1 further comprising one or more metal complexes that do not contain the anionic tris(pyrazolyl)methanate ligand.
Claim 14
Dependent Claim
21 words
The precursor composition of claim 2 further comprising one or more metal complexes that do not contain the anionic tris(pyrazolyl)methanate ligand.
Claim 15
Dependent Claim
29 words
The precursor composition of claim 1 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 30 )organic group.
Claim 16
Dependent Claim
29 words
The precursor composition of claim 2 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 30 )organic group.
Claim 17
Dependent Claim
29 words
The metal complex of claim 3 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 30 )organic group.
Claim 18
Dependent Claim
28 words
The ligand of claim 4 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 30 )organic group.
Claim 19
Dependent Claim
29 words
The precursor composition of claim 1 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 8 )organic group.
Claim 20
Dependent Claim
28 words
The precursor composition of claim 2 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1-C 8 )organic group.
Claim 21
Dependent Claim
29 words
The metal complex of claim 3 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1 -C 8 )organic group.
Claim 22
Dependent Claim
27 words
The ligand of claim 4 wherein each R 1 , R 2 , and R 3 group is independently H or a (C 1-C 8 )organic group.
Claim 23
Dependent Claim
19 words
The precursor composition of claim 1 wherein R 1 and R 3 are methyl, and R 2 is hydrogen.
Claim 24
Dependent Claim
19 words
The precursor composition of claim 2 wherein R 1 and R 3 are methyl, and R 2 is hydrogen.
Claim 25
Dependent Claim
19 words
The metal complex of claim 3 wherein R 1 and R 3 are methyl, and R 2 is hydrogen.
Claim 26
Dependent Claim
18 words
The ligand of claim 4 wherein R 1 and R 3 are methyl, and R 2 is hydrogen.
Claim 27
Dependent Claim
19 words
The precursor composition of claim 1 wherein each R 1 , R 2 , and R 3 is hydrogen.
Claim 28
Dependent Claim
19 words
The precursor composition of claim 2 wherein each R 1 , R 2 , and R 3 is hydrogen.
Claim 29
Dependent Claim
19 words
The metal complex of claim 3 wherein each R 1 , R 2 , and R 3 is hydrogen.
Claim 30
Dependent Claim
18 words
The ligand of claim 4 wherein each R 1 , R 2 , and R 3 is hydrogen.
References Cited (Backward Citations)
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