Patent US6401236B1 successfully refreshed from Google Patents.
US6401236B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method to eliminate side lobe printing of attenuated phase shift
Assignee: Micron Technology Inc
•
Filing: 1999-04-05
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Granted: 2002-06-04
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Expires: 2019-04-05
Abstract
Abstract A computer implemented method that uses a full integrated circuit (IC) chip design, to be printed by an attenuated phase shift mask, as an input parameter. Each feature environment within the input full IC chip design is individually simulated to determine how the features within the environment would be printed from the mask created according to the input design. The simulation of each environment also determines the extent and locations of unwanted side lobes that would also be printed from the mask. Once the side lobes are determined, auxiliary features are incorporated into the input design so that the auxiliary features will become transparent openings within a mask created in accordance with the modified input design. Each auxiliary feature opening is placed at a side lobe location and is designed to eliminate the side lobe by passing radiant energy that is 180 degrees out of phase with the radiant energy of the side lobe. Thus, each auxiliary feature serves as a side lobe inhibitor when incorporated into the mask. The modified input design undergoes a proximity correction to ensure that features of each environment print as originally desired. Once corrected, each environment is simulated again to verify that its features will print as originally desired and without side lobes. Once verified, the modified input design is used to create an attenuated phase shift mask that prints the desired features, but does not print side lobes.
Inventors
- 👤 William J. Baggenstoss
- 👤 William A. Stanton
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 11:38
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/32; G03F1/36
Claims Analysis
Total Claims: 62
Claim 1
Independent Claim
155 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments by determining whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identifying the contour as a side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 2
Dependent Claim
155 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments by determining whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identifying the contour as a side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 3
Dependent Claim
26 words
The method of claim 1 wherein said simulating step is performed by determining how the environments would print from the mask based on a simulation model.
Claim 4
Dependent Claim
13 words
The method of claim 2 wherein the simulation model comprises an optical model.
Claim 5
Dependent Claim
33 words
The method of claim 3 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments.
Claim 6
Dependent Claim
13 words
The method of claim 2 wherein the simulation model comprises a process model.
Claim 7
Dependent Claim
23 words
The method of claim 5 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments.
Claim 8
Dependent Claim
16 words
The method of claim 1 wherein the circuit features correspond to transparent regions within the mask.
Claim 9
Dependent Claim
33 words
The method of claim 1 wherein said correcting step comprises an optimal proximity correction of the circuit features based on the placement of the circuit features and the auxiliary features within the environments.
Claim 10
Dependent Claim
18 words
The method of claim 1 wherein multiple environments of the input design are processed in a parallel manner.
Claim 11
Dependent Claim
171 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe, wherein the auxiliary features correspond to transparent regions within the mask; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask, wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 12
Dependent Claim
171 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe, wherein the auxiliary features correspond to transparent regions within the mask; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask, wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 13
Dependent Claim
165 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe; correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verifying the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments; and determining from the contours if there are any side lobes within the corrected design.
Claim 14
Dependent Claim
165 words
A computer implemented method of eliminating side lobe printing from a phase shift mask implementing a circuit design, comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe; correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verifying the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments; and determining from the contours if there are any side lobes within the corrected design.
Claim 15
Dependent Claim
34 words
The method of claim 11 wherein said step of simulating the corrected design is performed by determining how the environments of the corrected design would print from the mask based on a simulation model.
Claim 16
Dependent Claim
13 words
The method of claim 12 wherein the simulation model comprises an optical model.
Claim 17
Dependent Claim
37 words
The method of claim 13 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments of the corrected design.
Claim 18
Dependent Claim
13 words
The method of claim 12 wherein the simulation model comprises a process model.
Claim 19
Dependent Claim
27 words
The method of claim 15 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments of the corrected design.
Claim 20
Dependent Claim
158 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of eliminating side lobe printing from a phase shift mask implementing a circuit design, said method comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identifying the contour as a determined side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 21
Dependent Claim
158 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of eliminating side lobe printing from a phase shift mask implementing a circuit design, said method comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identifying the contour as a determined side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 22
Dependent Claim
30 words
The computer readable storage medium of claim 17 wherein said method performs said simulating step by determining how the environments would print from the mask based on a simulation model.
Claim 23
Dependent Claim
16 words
The computer readable storage medium of claim 18 wherein the simulation model comprises an optical model.
Claim 24
Dependent Claim
36 words
The computer readable storage medium of claim 19 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments.
Claim 25
Dependent Claim
16 words
The computer readable storage medium of claim 18 wherein the simulation model comprises a process model.
Claim 26
Dependent Claim
26 words
The computer readable storage medium of claim 21 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments.
Claim 27
Dependent Claim
19 words
The computer readable storage medium of claim 17 wherein the circuit features correspond to transparent regions within the mask.
Claim 28
Dependent Claim
19 words
The computer readable storage medium of claim 17 wherein the auxiliary features correspond to transparent regions within the mask.
Claim 29
Dependent Claim
46 words
The computer readable storage medium of claim 24 wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 30
Dependent Claim
37 words
The computer readable storage medium of claim 17 wherein said method correcting step comprises an optimal proximity correction of the circuit features based on the placement of the circuit features and the auxiliary features within the environments.
Claim 31
Dependent Claim
21 words
The computer readable storage medium of claim 17 wherein multiple environments of the input design are processed in a parallel manner.
Claim 32
Dependent Claim
181 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of eliminating side lobe printing from a phase shift mask implementing a circuit design, said method comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe; correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verifying the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments; and determining from the contours if there are any side lobes within the corrected design.
Claim 33
Dependent Claim
181 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of eliminating side lobe printing from a phase shift mask implementing a circuit design, said method comprising the steps of: inputting the circuit design, the design comprising circuit features to be printed from the mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments; placing an auxiliary feature within the environments at a location of each determined side lobe; correcting each environment to form a corrected design and to ensure that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verifying the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments; and determining from the contours if there are any side lobes within the corrected design.
Claim 34
Dependent Claim
41 words
The computer readable storage medium of claim 28 wherein said method step of simulating the environments of the corrected design is performed by determining how the environments of the corrected design would print from the mask based on a simulation model.
Claim 35
Dependent Claim
16 words
The computer readable storage medium of claim 29 wherein the simulation model comprises an optical model.
Claim 36
Dependent Claim
40 words
The computer readable storage medium of claim 30 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments of the corrected design.
Claim 37
Dependent Claim
16 words
The computer readable storage medium of claim 29 wherein the simulation model comprises a process model.
Claim 38
Dependent Claim
30 words
The computer readable storage medium of claim 32 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments of the corrected design.
Claim 39
Independent Claim
176 words
A system, comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: input a circuit design, the design comprising circuit features to be printed from the mask; organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environment; determine whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identify the contour as a determined side lobe; place an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a corrected design and to ensure to that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 40
Independent Claim
176 words
A system, comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: input a circuit design, the design comprising circuit features to be printed from the mask; organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environment; determine whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identify the contour as a determined side lobe; place an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a corrected design and to ensure to that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 41
Dependent Claim
26 words
The system of claim 34 wherein said processor simulates the environments by determining how the environments would print from the mask based on a simulation model.
Claim 42
Dependent Claim
13 words
The system of claim 35 wherein the simulation model comprises an optical model.
Claim 43
Dependent Claim
33 words
The system of claim 35 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments.
Claim 44
Dependent Claim
13 words
The system of claim 35 wherein the simulation model comprises a process model.
Claim 45
Dependent Claim
23 words
The system of claim 38 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments.
Claim 46
Dependent Claim
16 words
The system of claim 34 wherein the circuit features correspond to transparent regions within the mask.
Claim 47
Dependent Claim
16 words
The system of claim 34 wherein the auxiliary features correspond to transparent regions within the mask.
Claim 48
Dependent Claim
43 words
The system of claim 41 wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 49
Dependent Claim
36 words
The system of claim 34 wherein said processor corrects the environments by performing an optimal proximity correction of the circuit features based on the placement of the circuit features and the auxiliary features within the environments.
Claim 50
Independent Claim
206 words
A system, comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: input a circuit design, the design comprising circuit features to be printed from the mask; organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environment; determine from the contours if there are any side lobes within the environments; place an auxiliary feature within the environments at a location of each determined side lobe; correct each environment to form a corrected design and to ensure to that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verify the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments of the corrected design; and determining from the contours if there are any side lobes within the environments of the corrected design.
Claim 51
Independent Claim
206 words
A system, comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: input a circuit design, the design comprising circuit features to be printed from the mask; organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environment; determine from the contours if there are any side lobes within the environments; place an auxiliary feature within the environments at a location of each determined side lobe; correct each environment to form a corrected design and to ensure to that circuit features of the corrected design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask; and verify the corrected design to ensure that side lobes do not print from the mask by: simulating environments of the corrected design to determine contours of the environments of the corrected design; and determining from the contours if there are any side lobes within the environments of the corrected design.
Claim 52
Dependent Claim
34 words
The system of claim 44 wherein said processor simulates the environments of the corrected design by determining how the environments of the corrected design would print from the mask based on a simulation model.
Claim 53
Dependent Claim
13 words
The system of claim 45 wherein the simulation model comprises an optical model.
Claim 54
Dependent Claim
37 words
The system of claim 46 wherein the optical model utilizes image data determined by settings of a tool used to process a wafer with the mask to simulate the contours of the environments of the corrected design.
Claim 55
Dependent Claim
13 words
The system of claim 45 wherein the simulation model comprises a process model.
Claim 56
Dependent Claim
27 words
The system of claim 48 wherein the process model utilizes contour data from a processed wafer to simulate the contours of the environments of the corrected design.
Claim 57
Independent Claim
207 words
A system comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design, said storage medium also containing a circuit design, said design comprising circuit features to be printed from the mask; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium to: organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environments; determine from the contours if there are any side lobes within the environments; place an auxiliary feature within the environments at a location of each determined side lobe, the auxiliary features corresponding to transparent regions within the mask; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask and wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 58
Independent Claim
207 words
A system comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design, said storage medium also containing a circuit design, said design comprising circuit features to be printed from the mask; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium to: organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environments; determine from the contours if there are any side lobes within the environments; place an auxiliary feature within the environments at a location of each determined side lobe, the auxiliary features corresponding to transparent regions within the mask; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask and wherein the mask also contains attenuating regions and wherein the transparent regions associated with the auxiliary features are designed to pass radiant energy that is 180 degrees out of phase with radiant energy passing through the attenuating regions.
Claim 59
Dependent Claim
175 words
A computer program transmitted from a server computer to a computer system, said computer system comprising memory and a processor in communication with said memory, said memory containing the computer program, said computer program causing said processor to perform the acts of: inputting a circuit design, the design comprising circuit features to be printed from a mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments by determining whether a contour is associated with a circuit feature of the input design and if a contour is not associated with a circuit feature, identifying the contour as a side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 60
Dependent Claim
175 words
A computer program transmitted from a server computer to a computer system, said computer system comprising memory and a processor in communication with said memory, said memory containing the computer program, said computer program causing said processor to perform the acts of: inputting a circuit design, the design comprising circuit features to be printed from a mask; organizing the input design into a plurality of feature environments; simulating the environments to determine contours of the environments; determining from the contours if there are any side lobes within the environments by determining whether a contour is associated with a circuit feature of the input design and if a contour is not associated with a circuit feature, identifying the contour as a side lobe; placing an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask.
Claim 61
Independent Claim
214 words
A system for eliminating side lobe printing from a phase shift mask implementing a circuit design, said system comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design, said storage medium also containing a circuit design, said design comprising circuit features to be printed from the mask; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium to: organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environments; determine whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identify the contour as a determined side lobe; place an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask, wherein each computer system processes different environments of said input design.
Claim 62
Independent Claim
214 words
A system for eliminating side lobe printing from a phase shift mask implementing a circuit design, said system comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to eliminate side lobe printing from a phase shift mask implementing a circuit design, said storage medium also containing a circuit design, said design comprising circuit features to be printed from the mask; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium to: organize the input design into a plurality of feature environments; simulate the environments to determine contours of the environments; determine whether a contour is associated with a circuit feature of the input design, and if a contour is not associated with a circuit feature, identify the contour as a determined side lobe; place an auxiliary feature within the environments at a location of each determined side lobe; and correct each environment to form a modified design and to ensure that circuit features of the modified design print in accordance with the input circuit design, wherein the auxiliary features eliminate side lobe printing from the mask, wherein each computer system processes different environments of said input design.
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