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Method and apparatus for manufacturing a micromechanical device

Assignee: Surface Technology Systems Ltd
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Filing: 1999-03-16
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Granted: 2002-03-12
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Expires: 2019-03-16
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Abstract

Abstract In the manufacture of a micromechanical device, a substrate, having a mask thereon, is etched using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate. A layer of protecting substance is deposited on the exposed surfaces of the substrate and mask, and the protecting substance is then selectively removed from the base. The base is then etched using the fluorine-containing etchant.

Inventors

  • 👤 Andrew Duncan McQuarrie

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 11:50
CPC Classifications
B; B01; B01J; B01J19/00; B01J19/08; B01J19/087; B01J19/088; B01J12/00; B01J12/002; B01J12/007; B01J19/24; B01J19/2445; B01J19/245; B01J7/00; B81; B81C; B81C1/00; B81C1/00436; B81C1/005; B81C1/00515; C; C01; C01B; C01B7/00; C01B7/24; C07; C07C; C07C17/00; G; G01; G01P; G01P15/00; G01P15/02; G01P15/08; G01P15/0802; G01P15/125; H; H10; H10P; H10P50/00; H10P50/20; H10P50/24; H10P50/242; H10P50/244; H10P50/60; H10P50/64; H10P50/642; H10P50/69; H10P50/691; H10P50/692; B01J2219/00; B01J2219/00002; B01J2219/00027; B01J2219/00038; B01J2219/0004; B01J2219/00049; B01J2219/00051; B01J2219/00054; B01J2219/00056; B01J2219/00058; B01J2219/00162; B01J2219/08; B01J2219/0803; B01J2219/0805; B01J2219/0807; B01J2219/0809; B01J2219/0837; B01J2219/0841; B01J2219/0869; B01J2219/0871; B01J2219/0873; B01J2219/0881; B01J2219/0883; B01J2219/0894; B81C2201/00; B81C2201/01; B81C2201/0101; B81C2201/0111; B81C2201/0112; B81C2201/0128; B81C2201/013; B81C2201/0132

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 88 words
A method of manufacturing a micromechanical device, comprising: (a) etching a substrate, having a mask thereon, using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate; (b) depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask; (c) selectively removing the protecting substance from the base; and (d) etching the base using a fluorine-containing etchant.
Claim 2
Independent Claim 88 words
A method of manufacturing a micromechanical device, comprising: (a) etching a substrate, having a mask thereon, using a flourine-containing etchant gas or vapour in the absence of a plasma through an opening in the mask to a desired depth to form a trench having a side wall and a base in the substrate; (b) depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask; (c) selectively removing the protecting substance from the base; and (d) etching the base using a fluorine-containing etchant.
Claim 3
Dependent Claim 25 words
A method according to claim 1 , wherein the fluorine-containing etchant is selected from XeF 2 , F 2 , ClF 3 or mixtures thereof.
Claim 4
Dependent Claim 15 words
A method according to claim 1 , wherein the fluorine-containing etchant is XeF 2 .
Claim 5
Dependent Claim 19 words
A method according to claim 1 , further comprising the step of removing the mask and remaining protecting substance.
Claim 6
Dependent Claim 31 words
A method according to claim 1 , wherein the protecting substance is a fluorocarbon polymer of the general formula C Y F X , where X and Y are positive integers.
Claim 7
Dependent Claim 25 words
A method according to claim 5 , wherein the protecting substance is of the general formula n(CF 2 ), where n is a positive integer.
Claim 8
Dependent Claim 31 words
A method according to any one of the claim 1 , wherein the protecting substance is of the form C Y H X , where X and Y are positive integers.
Claim 9
Dependent Claim 25 words
A method according to claim 7 , wherein the protecting substance is of the general formula n(CH 2 ), wherein n is a positive integer.
Claim 10
Dependent Claim 11 words
A micromechanical device formed by the method of claim 1 .
Claim 11
Dependent Claim 17 words
A micromechanical device according to claim 9 , comprising a series of adjacent fingers separated by trenches.
Claim 12
Dependent Claim 14 words
A micromechanical device according to claim 10 , wherein the trenches are in communication.
Claim 13
Independent Claim 75 words
An apparatus for manufacturing a micromechanical device comprising: (a) means providing a flourine-containing etchant gas or vapour in the absence of a plasma for etching a substrate, having a mask thereon, to a desired depth; (b) means for depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask; (c) means for selectively removing the protecting substance; and (d) means for providing the fluorine-containing etchant for etching the unprotected areas.
Claim 14
Independent Claim 75 words
An apparatus for manufacturing a micromechanical device comprising: (a) means providing a flourine-containing etchant gas or vapour in the absence of a plasma for etching a substrate, having a mask thereon, to a desired depth; (b) means for depositing a layer of a protecting substance on the exposed surfaces of the substrate and mask; (c) means for selectively removing the protecting substance; and (d) means for providing the fluorine-containing etchant for etching the unprotected areas.
Claim 15
Dependent Claim 19 words
An apparatus according to claim 12 , further comprising means for removing the mask and the remaining protecting substance.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2005-03-11 2005-09-10 2006-03-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2009-03-11 2009-09-10 2010-03-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2013-03-11 2013-09-10 2014-03-12 $7700.00 Window Closed / Lapsed

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