US6319759B1
Expired / Lapsed
US
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Method for making oxide
Assignee: International Business Machines Corp
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Filing: 1998-08-10
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Granted: 2001-11-20
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Expires: 2018-08-10
Abstract
Abstract A method of forming oxide and gate oxide areas of differing thicknesses. The processes disclosed include using an electromagnetic wave light at differing exposure durations and/or different energy levels to create oxide of differing thicknesses on a layer. The electromagnetic wave is preferably a laser.
Inventors
- 👤 Toshiharu Furukawa
- 👤 Mark C. Hakey
- 👤 Steven J. Holmes
- 👤 David V. Horak
- 👤 William H. Ma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:45
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6302; H10P14/6304; H10P14/6306; H10P14/6308; H10P14/6309; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01332; H10D64/01336; H10D64/0134; H10D64/01346; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0144; H10D84/0151; H10D84/02; H10D84/03; H10D84/038; H10P34/00; H10P34/40; H10P34/42; H10P14/6319; H10P14/69; H10P14/692; H10P14/6921; H10P14/69215
Claims Analysis
Total Claims: 31
Claim 1
Independent Claim
101 words
A method of forming oxide, comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave and during a first exposure to form a first layer of oxide having a first thickness, wherein the electromagnetic wave has a first given power and is exposed to the first area for a first exposure duration; and exposing a second area of the layer upon which oxide is to be grown to an electromagnetic wave during a second exposure to form a second layer of oxide having a second thickness.
Claim 2
Independent Claim
101 words
A method of forming oxide, comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave and during a first exposure to form a first layer of oxide having a first thickness, wherein the electromagnetic wave has a first given power and is exposed to the first area for a first exposure duration; and exposing a second area of the layer upon which oxide is to be grown to an electromagnetic wave during a second exposure to form a second layer of oxide having a second thickness.
Claim 3
Dependent Claim
34 words
The method of claim 1 , further comprising: providing a first mask to pattern the electromagnetic wave during the first exposure and a second mask to pattern the electromagnetic wave during the second exposure.
Claim 4
Dependent Claim
28 words
The method of claim 1 , wherein the electromagnetic wave exposed to the second area has at least one of a second given power and second exposure duration.
Claim 5
Dependent Claim
15 words
The method of claim 1 , further comprising enclosing the substrate in a gaseous oxidant.
Claim 6
Dependent Claim
25 words
The method of claim 4 , wherein the gaseous oxidant is selected from the group consisting of: oxygen, steam, nitrous oxide, plasma oxygen and ozone.
Claim 7
Dependent Claim
16 words
The method of claim 1 , further comprising providing a mask to pattern the electromagnetic wave.
Claim 8
Dependent Claim
15 words
The method of claim 6 , wherein the mask is in non-contact with the layer.
Claim 9
Dependent Claim
24 words
The method of claim 6 , wherein the mask is selected from the group consisting of: interference silicon dioxide quartz, aluminum and stainless steel.
Claim 10
Dependent Claim
13 words
The method of claim 1 , wherein the electromagnetic wave is a laser.
Claim 11
Dependent Claim
21 words
The method of claim 9 , wherein the laser is an XeCl excimer laser having a wavelength of approximately 308 nm.
Claim 12
Dependent Claim
20 words
The method of claim 3 , wherein the first and second exposure duration range between 3 milliseconds and 10 minutes.
Claim 13
Dependent Claim
22 words
The method of claim 3 , wherein the first and second power range between 1 mj/cm 2 and 100 mJ/cm 2 .
Claim 14
Dependent Claim
24 words
The method of claim 1 , wherein the layer is selected from the group consisting of: silicon, silicon germanium, germanium and silicon on insulator.
Claim 15
Independent Claim
79 words
A method of forming oxide, comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave to form a first layer of oxide having a first thickness; and exposing at least one other area of the layer upon which oxide is to be grown to an electromagnetic wave to form a second layer of oxide having a differing thickness than the first layer of oxide.
Claim 16
Independent Claim
79 words
A method of forming oxide, comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave to form a first layer of oxide having a first thickness; and exposing at least one other area of the layer upon which oxide is to be grown to an electromagnetic wave to form a second layer of oxide having a differing thickness than the first layer of oxide.
Claim 17
Dependent Claim
28 words
The method of claim 14 , wherein the first area is exposed for a first predetermined time and the second area is exposed for a second predetermined time.
Claim 18
Dependent Claim
20 words
The method of claim 15 , wherein the first and second predetermined time range between 3 milliseconds to 10 minutes.
Claim 19
Dependent Claim
36 words
The method of claim 14 , wherein the first area is exposed to an electromagnetic wave of a first power and the second area is exposed to one of an electromagnetic wave of a second power.
Claim 20
Dependent Claim
22 words
The method of claim 17 , wherein the first and second power range between 1 mJ/cm 2 and 100 mj/cm 2 .
Claim 21
Dependent Claim
48 words
The method of claim 14 , wherein the first area is exposed to an electromagnetic wave for one of a first predetermined time and a first predetermined power and the second area is exposed for at least one of a second predetermined time and a second predetermined power.
Claim 22
Dependent Claim
15 words
The method of claim 14 , further comprising enclosing the layer in a gaseous oxidant.
Claim 23
Dependent Claim
25 words
The method of claim 20 , wherein the gaseous oxidant is selected from the group consisting of: oxygen, steam, nitrous oxide, plasma oxygen, and ozone.
Claim 24
Dependent Claim
16 words
The method of claim 14 , further comprising providing a mask to pattern the electromagnetic wave.
Claim 25
Dependent Claim
15 words
The method of claim 22 , wherein the mask is in non-contact with the layer.
Claim 26
Dependent Claim
24 words
The method of claim 22 , wherein the mask is selected from the group consisting of: interference silicon dioxide quartz, aluminum and stainless steel.
Claim 27
Dependent Claim
13 words
The method of claim 14 , wherein the electromagnetic wave is a laser.
Claim 28
Dependent Claim
21 words
The method of claim 25 , wherein the laser is an XeCl excimer laser having a wavelength of approximately 308 nm.
Claim 29
Dependent Claim
24 words
The method of claim 14 , wherein the layer is selected from the group comprising of: silicon, silicon germanium, germanium and silicon on insulator.
Claim 30
Independent Claim
87 words
A method of forming oxide comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave having a first power and first duration to form oxide of a first thickness; and exposing at least one other area of the layer upon which oxide is to be grown to an electromagnetic wave having at least one of a differing power and differing duration to form oxide having a thickness different than the first thickness.
Claim 31
Independent Claim
87 words
A method of forming oxide comprising the steps of: providing a layer; exposing a first area of the layer upon which oxide is to be grown to an electromagnetic wave having a first power and first duration to form oxide of a first thickness; and exposing at least one other area of the layer upon which oxide is to be grown to an electromagnetic wave having at least one of a differing power and differing duration to form oxide having a thickness different than the first thickness.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-11-19 | 2005-05-21 | 2005-11-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-11-19 | 2009-05-21 | 2009-11-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-11-19 | 2013-05-21 | 2013-11-20 | $7700.00 | Window Closed / Lapsed |