Patent US6229595B1 successfully refreshed from Google Patents.
US6229595B1
Expired / Lapsed
US
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Lithography system and method with mask image enlargement
Assignee: Goodrich Corp
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Filing: 1995-05-12
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Granted: 2001-05-08
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Expires: 2015-05-12
Abstract
Abstract A photolithography system includes a light source and illumination optics which receive light from the light source and project illumination light onto a mask. Light transmitted through the mask is received by projection optics which generate an enlarged image of the mask. The enlarged image is projected onto the surface of a substrate such as a semiconductor wafer or flat panel display. The system achieves a wafer or panel feature size of less than 10 μm, preferably 3 μm, while enlarging the image of the mask to produce large wafers and panels in a single exposure. A deformable substrate chuck is selectively deformable to ensure a flat substrate surface. An alignment subsystem ensures precise registration between exposure layers.
Inventors
- 👤 William G. McKinley
- 👤 Gerard M. Perron
- 👤 Berge Tatian
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 11:54
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70225; G03F7/70233; G03F7/70241; G03F7/70308; G03F7/70691; G03F7/707; G03F7/70708; G03F7/70791
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
80 words
A photolithography system comprising: a light source; illumination optics for illuminating a mask with light from the light source; and projection optics for receiving light transmitted through the mask and projecting an enlarged image of the mask onto a surface of a substrate, the projection optics including at least one optical element having an aspheric shaped surface described by a polynomial for a conic section with a plurality of additional terms defining non-zero surface deformations from the conic section shape.
Claim 2
Dependent Claim
80 words
A photolithography system comprising: a light source; illumination optics for illuminating a mask with light from the light source; and projection optics for receiving light transmitted through the mask and projecting an enlarged image of the mask onto a surface of a substrate, the projection optics including at least one optical element having an aspheric shaped surface described by a polynomial for a conic section with a plurality of additional terms defining non-zero surface deformations from the conic section shape.
Claim 3
Dependent Claim
19 words
The photolithography system of claim 1 wherein the image is projected at a resolution of less than 10 μm.
Claim 4
Dependent Claim
18 words
The photolithography system of claim 1 wherein the substrate is a flat panel for a flat panel display.
Claim 5
Dependent Claim
13 words
The photolithography system of claim 1 wherein the substrate is a semiconductor wafer.
Claim 6
Dependent Claim
24 words
The photolithography system of claim 1 wherein the projection optics include at least one reflective optical element and at least one refractive optical element.
Claim 7
Dependent Claim
20 words
The photolithography system of claim 1 wherein the projection optics include at least one optical element having an aspheric surface.
Claim 8
Dependent Claim
23 words
The photolithography system of claim 1 wherein the projection optics comprise at least one optical element having an optical surface of unusual shape.
Claim 9
Dependent Claim
15 words
The photolithography system of claim 1 wherein the projection optics include at least four mirrors.
Claim 10
Dependent Claim
19 words
The photolithography system of claim 8 wherein each of the four mirrors comprises an optical surface of unusual shape.
Claim 11
Dependent Claim
18 words
A photolithography system of claim 1 wherein the projection optics are telecentric at the surface of the substrate.
Claim 12
Dependent Claim
29 words
The photolithography system of claim 1 further comprising an adjustable substrate holder for holding the substrate and being adjustable to control the shape of the surface of the substrate.
Claim 13
Dependent Claim
20 words
The photolithography system of claim 11 further comprising a sensor for sensing the shape of the surface of the substrate.
Claim 14
Dependent Claim
19 words
The photolithography system of claim 12 wherein the sensor comprises a diffractive optical element for generating a Moire pattern.
Claim 15
Dependent Claim
20 words
The photolithography system of claim 11 wherein the adjustable substrate holder is adjustable to flatten the surface of the substrate.
Claim 16
Dependent Claim
24 words
The photolithography system of claim 1 further comprising an alignment system for aligning the surface of the substrate with the image of the mask.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-05-07 | 2004-11-06 | 2005-05-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-05-07 | 2008-11-06 | 2009-05-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-05-07 | 2012-11-06 | 2013-05-08 | $7700.00 | Window Closed / Lapsed |