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Patent US6197604B1 successfully refreshed from Google Patents.
US6197604B1
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Method for providing cooperative run-to-run control for multi-product and multi-process semiconductor fabrication
Assignee: GlobalFoundries Inc
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Filing: 1998-10-01
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Granted: 2001-03-06
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Expires: 2018-10-01
Abstract
Abstract A system and method of controlling multi-process, multi-product semiconductor fabrication tools. Individual, grouped, or composite controllers are designated to control various tool operations. First control parameters for a fabrication tool process are generated, where the first control parameters are based on first tool operation attributes. Second control parameters for the process are generated based on second tool operation attributes. The fabrication tool is then controlled by generating cooperative control parameters which are a function of the first and second control parameters. Disturbance information can be shared between controllers for use in generating the first and second control parameters while taking into account disturbance information already discovered and quantified.
Inventors
- 👤 Michael Lee Miller
- 👤 William Jarrett Campbell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 18:02
CPC Classifications
H; H10; H10P; H10P74/00; H10P74/23
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
69 words
A method for providing multi-product and multi-process run-to-run control of a semiconductor fabrication tool, comprising: generating first control parameters for a process to be performed by the fabrication tool, wherein the first control parameters are based on first tool operation attributes; generating second control parameters for the process based on second tool operation attributes; and controlling the fabrication tool as a function of the first and second control parameters.
Claim 2
Independent Claim
69 words
A method for providing multi-product and multi-process run-to-run control of a semiconductor fabrication tool, comprising: generating first control parameters for a process to be performed by the fabrication tool, wherein the first control parameters are based on first tool operation attributes; generating second control parameters for the process based on second tool operation attributes; and controlling the fabrication tool as a function of the first and second control parameters.
Claim 3
Dependent Claim
46 words
The method of claim 1 , wherein: generating first control parameters comprises analyzing the first tool operation attributes to identify first disturbance information affecting the process; and generating second control parameters comprises analyzing the second tool operation attributes to identify second disturbance information affecting the process.
Claim 4
Dependent Claim
29 words
The method of claim 2 , wherein generating second control parameters comprises generating the second control parameters at least in part as a function of the first disturbance information.
Claim 5
Dependent Claim
24 words
The method of claim 3 , further comprising storing the first disturbance information for subsequent retrieval and use in generating the second control parameters.
Claim 6
Dependent Claim
39 words
The method of claim 2 , wherein generating first control parameters comprises generating the first control parameters at least in part as a function of the first disturbance information previously identified in previous generation of the first control parameters.
Claim 7
Dependent Claim
28 words
The method of claim 1 , further comprising generating a plurality of additional control parameters for a corresponding number of additional processes operating on the semiconductor fabrication tool.
Claim 8
Dependent Claim
23 words
The method of claim 6 , wherein the additional control parameters are based on additional tool operation attributes of the semiconductor fabrication tool.
Claim 9
Dependent Claim
32 words
The method of claim 1 , wherein generating first control parameters comprises generating a plurality of first control parameters for a first plurality of processes using a corresponding plurality of independent controllers.
Claim 10
Dependent Claim
28 words
The method of claim 8 , wherein generating second control parameters comprises generating collective control parameters to collectively control a second plurality of processes using a grouped controller.
Claim 11
Dependent Claim
25 words
The method of claim 9 , wherein at least one of the second plurality of processes is also one of the first plurality of processes.
Claim 12
Independent Claim
141 words
A method for run-to-run control of multi-product and multi-process run-to-run control of a semiconductor manufacturing tool, comprising: individually controlling each of one or more first tool operations based on individual attributes of each of the respective first tool operations; collectively controlling each of a plurality of second tool operations with a unitary group controller which provides a common control signal to each of the plurality of second tool operations, wherein the common control signal is based on group attributes common to each of the second tool operations; determining disturbance information for each of the first and second tool operations; sharing the disturbance information of any one of the first and second tool operations with selected ones of the controlling functions of the first and second tool operations; and adjusting the individual and collective control in response to the shared disturbance information.
Claim 13
Independent Claim
141 words
A method for run-to-run control of multi-product and multi-process run-to-run control of a semiconductor manufacturing tool, comprising: individually controlling each of one or more first tool operations based on individual attributes of each of the respective first tool operations; collectively controlling each of a plurality of second tool operations with a unitary group controller which provides a common control signal to each of the plurality of second tool operations, wherein the common control signal is based on group attributes common to each of the second tool operations; determining disturbance information for each of the first and second tool operations; sharing the disturbance information of any one of the first and second tool operations with selected ones of the controlling functions of the first and second tool operations; and adjusting the individual and collective control in response to the shared disturbance information.
Claim 14
Dependent Claim
21 words
The method of claim 11 , wherein determining disturbance information comprises determining tool-based disturbance information affecting multiple operations or multiple products.
Claim 15
Dependent Claim
30 words
The method of claim 11 , wherein the first and second tool operations comprise processes for performing selected functions of a collective manufacturing operation performed by the semiconductor manufacturing tool.
Claim 16
Dependent Claim
41 words
The method of claim 11 , wherein the first and second tool operations comprise processes corresponding to differing products having differing characteristics, wherein each of the differing products is processed by one or more of the first and second tool operations.
Claim 17
Dependent Claim
24 words
The method of claim 11 , wherein individually controlling first tool processes comprises controlling each of the first tool processes with distinct, dedicated controllers.
Claim 18
Dependent Claim
30 words
The method of claim 11 , further comprising a plurality of the unitary group controllers, wherein each of the unitary group controllers collectively controls a predetermined group of tool processes.
Claim 19
Dependent Claim
28 words
The method of claim 11 , further comprising identifying the individual attributes that are substantially similar for each of the second tool operations to determine the group attributes.
Claim 20
Dependent Claim
37 words
The method of claim 11 , wherein sharing the disturbance information comprises storing the disturbance information in a commonly-accessible storage for subsequent retrieval by selected ones of the controlling functions of the first and second tool operations.
Claim 21
Dependent Claim
30 words
The method of claim 11 , wherein adjusting the individual control comprises modifying individual control parameters generated via the individual control of each of one or more first tool operations.
Claim 22
Dependent Claim
17 words
The method of claim 11 , wherein adjusting the collective control comprises modifying the common control signal.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-03-05 | 2004-09-04 | 2005-03-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-03-05 | 2008-09-04 | 2009-03-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-03-05 | 2012-09-04 | 2013-03-06 | $7700.00 | Window Closed / Lapsed |