Patent US2319378A successfully refreshed from Google Patents.
US6127101A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Alkylated aminoalkylpiperazine surfactants and their use in photoresist developers
Assignee: Air Products and Chemicals Inc
•
Filing: 2000-01-18
•
Granted: 2000-10-03
•
Expires: 2020-01-18
Abstract
Abstract This invention provides water-based compositions, particularly coating, ink, fountain solution, adhesive, agricultural and photoresist developing/electronics cleaning compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of certain alkylated aminoalkylpiperazine compounds of the structure ##STR1## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both or R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Inventors
- 👤 Kevin Rodney Lassila
- 👤 Richard V. C Carr
- 👤 Kristen Elaine Minnich
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 19:48
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
65 words
In an aqueous photoresist developer composition containing a surfactant, the improvement which comprises employing as the surfactant an alkylated aminoalkylpiperazine compound of the structure ##STR17## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Claim 2
Dependent Claim
65 words
In an aqueous photoresist developer composition containing a surfactant, the improvement which comprises employing as the surfactant an alkylated aminoalkylpiperazine compound of the structure ##STR17## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Claim 3
Dependent Claim
27 words
The developer composition of claim 1 in which one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H.
Claim 4
Dependent Claim
24 words
The developer composition of claim 1 in which one of R 1 and R 2 is a C6-C8 alkyl and the other is H.
Claim 5
Dependent Claim
20 words
The developer composition of claim 1 in which both R 1 and R 2 are C5 to C8 alkyl groups.
Claim 6
Dependent Claim
11 words
The developer composition of claim 1 in which n is 2.
Claim 7
Dependent Claim
11 words
The developer composition of claim 3 in which n is 2.
Claim 8
Dependent Claim
55 words
The developer composition of claim 1 in which the alkylated aminoalkylpiperazine is the monoalkylation product of aminoethylpiperazine and methylisobutylketone, the dialkylation product of aminoethylpiperazine and methylisobutylketone, the monoalkylation product of aminoethylpiperazine and methylamylketone, the dialkylation product of aminoethylpiperazine and methylamylketone, the monoalkylation product of aminoethylpiperazine and methylisoamylketone or the dialkylation product of aminoethylpiperazine and methylisoamylketone.
Claim 9
Dependent Claim
10 words
The developer composition of claim 1 which contains tetramethylammonium hydroxide.
Claim 10
Dependent Claim
10 words
The developer composition of claim 3 which contains tetramethylammonium hydroxide.
Claim 11
Dependent Claim
10 words
The developer composition of claim 7 which contains tetramethylammonium hydroxide.
Claim 12
Dependent Claim
84 words
In a process for developing a photoresist after exposure to radiation by applying to the photoresist surface a developer solution containing a surface tension lowering amount of a surfactant, the improvement which comprises using as the surfactant an alkylated aminoalkylpiperazine compound having structure ##STR18## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Claim 13
Dependent Claim
84 words
In a process for developing a photoresist after exposure to radiation by applying to the photoresist surface a developer solution containing a surface tension lowering amount of a surfactant, the improvement which comprises using as the surfactant an alkylated aminoalkylpiperazine compound having structure ##STR18## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Claim 14
Dependent Claim
26 words
The process of claim 11 in which one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group and the other is H.
Claim 15
Dependent Claim
23 words
The process of claim 11 in which one of R 1 and R 2 is a C6-C8 alkyl and the other is H.
Claim 16
Dependent Claim
19 words
The process of claim 11 in which both R 1 and R 2 are C5 to C8 alkyl groups.
Claim 17
Dependent Claim
10 words
The process of claim 11 in which n is 2.
Claim 18
Dependent Claim
10 words
The process of claim 13 in which n is 2.
Claim 19
Dependent Claim
54 words
The process of claim 11 in which the alkylated aminoalkylpiperazine is the monoalkylation product of aminoethylpiperazine and methylisobutylketone, the dialkylation product of aminoethylpiperazine and methylisobutylketone, the monoalkylation product of aminoethylpiperazine and methylamylketone, the dialkylation product of aminoethylpiperazine and methylamylketone, the monoalkylation product of aminoethylpiperazine and methylisoamylketone or the dialkylation product of aminoethylpiperazine and methylisoamylketone.
Claim 20
Dependent Claim
9 words
The process of claim 11 which contains tetramethylammonium hydroxide.
Claim 21
Dependent Claim
9 words
The process of claim 13 which contains tetramethylammonium hydroxide.
Claim 22
Dependent Claim
9 words
The process of claim 17 which contains tetramethylammonium hydroxide.
Claim 23
Dependent Claim
83 words
An aqueous electronics cleaning composition comprising in water the following components 0.1 to 3 wt % tetramethylammonium hydroxide, 0 to 4 wt % phenolic compound; and 10 to 10,000 ppm alkyl aminoalkylpiperazine, the alkyl aminoalkylpiperazine compound having the structure ##STR19## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group, preferably C6-C8 alkyl, and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
Claim 24
Dependent Claim
83 words
An aqueous electronics cleaning composition comprising in water the following components 0.1 to 3 wt % tetramethylammonium hydroxide, 0 to 4 wt % phenolic compound; and 10 to 10,000 ppm alkyl aminoalkylpiperazine, the alkyl aminoalkylpiperazine compound having the structure ##STR19## where one of R 1 and R 2 is a C5-C14 alkyl or cycloalkyl group, preferably C6-C8 alkyl, and the other is H, or both of R 1 and R 2 are C5 to C8 alkyl groups, and n is 2 or 3.
References Cited (Backward Citations)
US3007929A
Cited
US4628023A
Cited
US4741989A
Cited
US4828965A
Cited
US5039595A
Cited
US4997748A
Cited
JPH0362034A
Cited
US5252436A
Cited
US5098478A
Cited
JPH06134542A
Cited
JP3062034B2
Cited
US5562762A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-10-03 | 2004-04-03 | 2004-10-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-10-03 | 2008-04-03 | 2008-10-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-10-03 | 2012-04-03 | 2012-10-03 | $7700.00 | Window Closed / Lapsed |