US5039595A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists
Assignee: BASF SE
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Filing: 1989-08-09
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Granted: 1991-08-13
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Expires: 2009-08-09
Abstract
Abstract An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R 1 to R 5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl. It is suitable for developing positive-working photoresists.
Inventors
- 👤 Reinhold Schwalm
- 👤 Horst Binder
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 21:10
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/005; G03C1/06; G03C1/42; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
106 words
A method for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution, which contains one or more water-soluble basic compounds, wherein the said compound is a compound of the formula (I) ##STR5## where R 1 to R 5 are identical or different and are each H, OH, hydroxyalkyl of 1 to 4 carbon atoms, alkoxy of 1 to 4 carbon atoms or alkyl of 1 to 4 carbon atoms and x is from 1 to 5.
Claim 2
Independent Claim
106 words
A method for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution, which contains one or more water-soluble basic compounds, wherein the said compound is a compound of the formula (I) ##STR5## where R 1 to R 5 are identical or different and are each H, OH, hydroxyalkyl of 1 to 4 carbon atoms, alkoxy of 1 to 4 carbon atoms or alkyl of 1 to 4 carbon atoms and x is from 1 to 5.
Claim 3
Dependent Claim
48 words
A method for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution as set forth in claim 1.
Claim 4
Dependent Claim
48 words
A method for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution as set forth in claim 1.
Claim 5
Dependent Claim
48 words
A method for developing a positive-working photoresist based on poly-(p-hydroxystyrene)/sulfonium salt, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution set forth in claim 1.
Claim 6
Dependent Claim
49 words
A method for developing a positive-working photoresist based on poly-(p-hydroxystyrene)/sulfonium salt, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution as set forth in claim 1.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-08-12 | 1995-02-11 | 1995-08-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-08-12 | 1999-02-11 | 1999-08-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-08-12 | 2003-02-11 | 2003-08-13 | $7700.00 | Window Closed / Lapsed |