Patent US6127097A successfully refreshed from Google Patents.
US6127097A
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Photoresist develop and strip solvent compositions and method for their use
Assignee: International Business Machines Corp
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Filing: 1997-03-18
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Granted: 2000-10-03
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Expires: 2017-03-18
Abstract
Abstract Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
Inventors
- 👤 Nageshwer Rao Bantu
- 👤 Anilkumar Chinuprasad Bhatt
- 👤 Ashwinkumar Chinuprasad Bhatt
- 👤 Joseph Alphonse Kotylo
- 👤 Gerald Walter Jones
- 👤 Robert John Owen
- 👤 Kostas Papathomas
- 👤 Anaya Kumar Vardya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 13:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/30; G03F7/32; G03F7/325
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
148 words
A method of stripping free radical, addition polymerizable photoresist, comprising: providing a film of the photoresist on a substrate; selectively exposing at least one predetermined area of the photoresist film to radiation to which it is sensitive for a time sufficient to effect a contrast in the extent of crosslinking in exposed and unexposed regions; developing the photoresist film in a developer containing benzyl alcohol; forming a desired circuit pattern on the substrate by plating copper thereon; and stripping the at least one predetermined area of photoresist exposed to radiation in a solution consisting of benzyl alcohol and about 0.1% up to about 10% by weight of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, methyl ethyl ketone, acetone and water at a temperature of about 50 to about 100 degrees C.
Claim 2
Independent Claim
148 words
A method of stripping free radical, addition polymerizable photoresist, comprising: providing a film of the photoresist on a substrate; selectively exposing at least one predetermined area of the photoresist film to radiation to which it is sensitive for a time sufficient to effect a contrast in the extent of crosslinking in exposed and unexposed regions; developing the photoresist film in a developer containing benzyl alcohol; forming a desired circuit pattern on the substrate by plating copper thereon; and stripping the at least one predetermined area of photoresist exposed to radiation in a solution consisting of benzyl alcohol and about 0.1% up to about 10% by weight of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, methyl ethyl ketone, acetone and water at a temperature of about 50 to about 100 degrees C.
Claim 3
Dependent Claim
53 words
The method recited in claim 1 wherein the stripping step is followed by a rinsing step in water at a water rinse pressure between about 15 to about 60 psi, in a rinse temperature between about 20 to about 60 degrees C. and a rinse time between about 5 to about 20 minutes.
Claim 4
Dependent Claim
34 words
The method recited in claim 1 wherein the stripping solution is maintained during the stripping step at a temperature of about 50 to about 100 degrees C. for about 6 to about 12 minutes.
Claim 5
Dependent Claim
87 words
The method recited in claim 1 wherein the stripping solution is maintained during the stripping step at a temperature of about 50 to about 100 degrees C., and a spray pressure of about 15 to about 90 psi, for about 6 to about 12 minutes, and the stripping step is followed by rinsing with water at a water rinse pressure between about 15 to about 60 psi, rinse temperature between about 20 to about 60 degrees C. and rinse time between about 5 to about 20 minutes.
Claim 6
Independent Claim
156 words
A method of manufacturing a printed circuit device comprising: providing a film of free radical, addition polymerizable photoresist on a printed circuit board substrate; selectively exposing at least one predetermined area of the photoresist film to radiation to which it is sensitive for a time sufficient to effect a contrast in the extent of crosslinking in exposed and unexposed regions; developing the photoresist film in a developer containing benzyl alcohol; forming a desired circuit pattern on the printed circuit board substrate by plating copper thereon; and stripping the at least one predetermined area of photoresist exposed to radiation in a solution consisting of benzyl alcohol and about 0.1% up to about 10% by weight of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, methyl ethyl ketone, acetone and water at a temperature of about 50 to about 100 degrees C.
Claim 7
Independent Claim
156 words
A method of manufacturing a printed circuit device comprising: providing a film of free radical, addition polymerizable photoresist on a printed circuit board substrate; selectively exposing at least one predetermined area of the photoresist film to radiation to which it is sensitive for a time sufficient to effect a contrast in the extent of crosslinking in exposed and unexposed regions; developing the photoresist film in a developer containing benzyl alcohol; forming a desired circuit pattern on the printed circuit board substrate by plating copper thereon; and stripping the at least one predetermined area of photoresist exposed to radiation in a solution consisting of benzyl alcohol and about 0.1% up to about 10% by weight of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, methyl ethyl ketone, acetone and water at a temperature of about 50 to about 100 degrees C.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-10-03 | 2004-04-03 | 2004-10-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-10-03 | 2008-04-03 | 2008-10-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-10-03 | 2012-04-03 | 2012-10-03 | $7700.00 | Window Closed / Lapsed |