Exposure apparatus

Claim 2

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, said first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive refracting power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said six lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, and wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object.

Claim 3

A projection optical system according to claim 1, wherein the first lens with positive refracting power in said intermediate lens group in said second lens group has a lens shape with a convex surface to the second object.

Claim 4

A projection optical system according to claim 2, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group.

Claim 5

A projection optical system according to claim 3, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 6

A projection optical system according to claim 4, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 7

A projection optical system according to claim 5, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 8

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 5, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 9

A projection optical system according to claim 6, wherein said sixth lens group comprises a lens placed as closest to the first object and having a convex surface opposed to the first object.

Claim 10

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 8, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 11

A projection optical system according to claim 1, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having a negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group.

Claim 12

A projection optical system according to claim 1, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 13

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 1, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 14

A projection optical system located between a first object and a second object, said projection optical system having a first lens group with positive refracting power, a second lens group with negative refracting power, a third lens group with positive refracting power, a fourth lens group with negative refracting power, a fifth lens group with positive refracting power, and a sixth lens group with positive refracting power in the named order from the first object toward the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object, and wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.2 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0.

Claim 15

A projection optical system located between a first object and a second object, said projection optical system having a first lens group with positive refracting power, a second lens group with negative refracting power, a third lens group with positive refracting power, a fourth lens group with negative refracting power, a fifth lens group with positive refracting power, and a sixth lens group with positive refracting power in the named order from the first object toward the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object, and wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.2 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0.

Claim 16

A projection optical system according to claim 13, wherein the following condition is satisfied when an axial distance from the first object to a first-object-side focal point of the whole of said projection optical system is I and the distance from the first object to the second object is L: 1.0<I/L. 15.

Claim 17

A projection optical system according to claim 14, therein the following condition is satisfied when a focal length of said third lens with negative refracting power in said second lens group is f 23 and a focal length of said fourth lens with negative refracting power in said intermediate lens group in said second lens group is f 24 : 0.07<f.sub.24 /f.sub.23 <7.

Claim 18

A projection optical system according to claim 15, wherein the following condition is satisfied when a focal length of said second lens with negative refracting power in said intermediate lens group in said second lens group is f 22 and a focal length of said third lens with negative refracting power in said intermediate lens group in said second lens group is f 23 : 0.01<f.sub.22 /f.sub.23 <10.

Claim 19

A projection optical system according to claim 16, wherein the following condition is satisfied when a focal length of said first lens with positive refracting power in said intermediate lens group in second lens group is f 21 and the distance from the first object to the second object is L: 0.230<f.sub.21 /L<0.40.

Claim 20

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 16, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 21

A projection optical system according to claim 13, wherein said intermediate lens group in said second lens group has negative refracting power.

Claim 22

A projection optical system according to claim 13, wherein the following condition is satisfied when the focal length of said second lens group is f 2 and the distance from the first object to the second object is L: -0.8<f.sub.2 /L<-0.050.

Claim 23

A projection optical system according to claim 13, wherein the following condition is satisfied when a focal length of said front lens placed as closest to the first object in said second lens group and having negative refracting power with a concave surface to the second object is f 2F and a focal length of said rear lens placed as closest to the second object in said second lens group and having negative refracting power with a concave surface to the first object is f 2R : 0≦f.sub.2F /f.sub.2R <18. 22.

Claim 24

A projection optical system according to claim 13, wherein the following condition is satisfied when a focal length of said third lens with negative refracting power in said second lens group is f 23 and a focal length of said fourth lens with negative refracting power in said intermediate lens group in said second lens group is f 24 : 0.07<f.sub.24 /f.sub.23 <7.

Claim 25

A projection optical system according to claim 13, wherein the following condition is satisfied when a focal length of said second lens with negative refracting power in said intermediate lens group in said second lens group is f 22 and a focal length of said third lens with negative refracting power in said intermediate lens group in said second lens group is f 23 : 0.1<f.sub.22 /f.sub.23 <10.

Claim 26

A projection optical system according to claim 13, wherein the following condition is satisfied when an axial distance from a second-object-side lens surface of said fourth lens with negative refracting power in said intermediate lens group in said second lens group to a first-object-side lens surface of said rear lens in said second lens group is D and the distance from the first object to the second object is L: 0.05<D/L<0.4. 25.

Claim 27

A projection optical system according to claim 13, wherein said first lens with positive refracting power in said intermediate lens group in said second lens group has a lens shape with a convex surface to the second object, and wherein the following condition is satisfied when the refracting power of a second-object-side lens surface of said first lens with positive refracting power in said intermediate lens group in said second lens group is Φ 21 and the distance from the first object to the second object is L: 0.54<1/(Φ.sub.21 ·L)<10.

Claim 28

A projection optical system according to claim 13, wherein the following condition is satisfied when a focal length of said first lens with positive refracting power in said intermediate lens group in said second lens group is f 21 and the distance from the first object to the second object is L: 0.230<f.sub.21 /L<0.40.

Claim 29

A projection optical system according to claim 13, wherein the following condition is satisfied when the focal length of said fourth lens group is f 4 and the distance from said the first object to the second object is L: -0.098<f.sub.4 /L<-0.005. 28.

Claim 30

A projection optical system according to claim 13, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group, and wherein the following condition is satisfied when a radius of curvature on the first object side in said rear lens placed as closest to the second object in said fourth lens group is r 4F and a radius of curvature on the second object side in said rear lens placed as closest to the second object in said fourth lens group is r 4R : -1.00≦(r.sub.4F -r.sub.4R)/(r.sub.4F +r.sub.4R)<0.

Claim 31

A projection optical system according to claim 13, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein the following condition is satisfied when a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group is r 5n and a radius of curvature of the convex surface opposed to the concave surface of said negative meniscus lens in said positive lens placed adjacent to the concave surface of said negative meniscus lens in said fifth lens group is r 5p : 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1.

Claim 32

A projection optical system according to claim 29, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 33

A projection optical system according to claim 13, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object, and wherein the following condition is satisfied when a radius of curvature on the first object side in said negative lens closest to the second object in said fifth lens group is r 5F and a radius of curvature on the second object side in said negative lens closest to the second object in said fifth lens group is r 5R : 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28.

Claim 34

A projection optical system according to claim 13, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object and said sixth lens group comprises a lens placed as closest to the first object and having a convex surface opposed to the first object, and wherein the following condition is satisfied when a radius of curvature on the second object side, of said negative lens placed as closest to the second object in said fifth lens group is r 5R and a radius of curvature on the first object side, of said lens placed as closest to the first object in said sixth lens group is r 6F : -0.90<(r.sub.5R -r.sub.6F)/(r.sub.5R +r.sub.6F)<-0.001. 33.

Claim 35

A projection optical system according to claim 13, wherein the following condition is satisfied when a lens group separation between said fifth lens group and said sixth lens group is d 56 and the distance from the first object to the second object is L: d.sub.56 /L<0.017.

Claim 36

A projection optical system according to claim 13, wherein the following condition is satisfied when a radius of curvature of a lens surface closest to the first object in said sixth lens group is r 6F and an axial distance from the lens surface closest to the first object in said sixth lens group to the second object is d 6 : 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 37

A projection optical system according to claim 13, wherein said sixth lens group comprises three or less lenses having at least one surface satisfying the following condition: 1/|φL|<20, where Φ: refracting power of the lens surface; L: object-image distance from the first object to the second object.

Claim 38

A projection optical system according to claim 13, wherein a magnification of said projection optical system is 5:1.

Claim 39

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 13, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 40

A projection optical system according to claim 13, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 41

A projection optical system according to claim 38, wherein the following condition is satisfied when a lens group separation between said fifth lens group and said sixth lens group is d 56 and the distance from the first object to the second object is L: d.sub.56 /L<0.017. 40.

Claim 42

A projection optical system according to claim 38, wherein the following condition is satisfied when a radius of curvature of a lens surface closest to the first object in said sixth lens group is r 6F and an axial distance from the lens surface closest to the first object in said sixth lens group to the second object is d 6 : 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 43

A projection optical system according to claim 38, wherein said sixth lens group comprises three or less lenses having at least one surface satisfying the following condition: 1/|ΦL|<20. where Φ: refracting power of the lens surface; L: object-image distance from the first object to the second object.

Claim 44

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern on a mask onto the substrate; and a projecting optical system for projecting an image of the mask, on the substrate surface, said projecting optical system having: a first lens group with positive refracting power, said first lens group being placed between the mask and the main surface of said stage; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the main surface of said stage; a third lens group with positive refracting power, said third lens groups being placed between said second lens group and the main surface of said stage; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the main surface of said stage; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the main surface of said stage; and a sixth lens group, said sixth lens group being placed between said fifth lens group and the main surface of said stage, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having a negative refracting power with a concave surface to the second object, a rear lens as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, and wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object.

Claim 45

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern on a mask onto the substrate; and a projecting optical system for projecting an image of the mask, on the substrate surface, said projecting optical system having: a first lens group with positive refracting power, said first lens group being placed between the mask and the main surface of said stage; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the main surface of said stage; a third lens group with positive refracting power, said third lens groups being placed between said second lens group and the main surface of said stage; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the main surface of said stage; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the main surface of said stage; and a sixth lens group, said sixth lens group being placed between said fifth lens group and the main surface of said stage, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having a negative refracting power with a concave surface to the second object, a rear lens as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, and wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object.

Claim 46

An exposure apparatus according to claim 42, wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.1 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0. 44.

Claim 47

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, said first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said six lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, and wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 48

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, said first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said six lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, and wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 49

A projection optical system according to claim 44, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 50

A projection optical system according to claim 45, wherein the following condition is satisfied when an axial distance from the first object to a first-object-side focal point of the whole of said projection optical system is I and the distance from the first object to the second object is L: 1.0<I/L. 47.

Claim 51

A projection optical system according to claim 46, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group.

Claim 52

A projection optical system according to claim 47, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object, and wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.2 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0.

Claim 53

A projection optical system according to claim 48, wherein the following condition is satisfied when a focal length of said third lens with negative refracting power in said second lens group is f 23 and a focal length of said fourth lens with negative refracting power in said intermediate lens group in said second lens group is f 24 : 0.07<f.sub.24 /f.sub.23 <7.

Claim 54

A projection optical system according to claim 49, wherein the following condition is satisfied when a focal length of said second lens with negative refracting power in said intermediate lens group in said second lens group is f 22 and a focal length of said third lens with negative refracting power in said intermediate lens group in said second lens group is f 23 : 0.01<f.sub.22 /f.sub.23 <10.

Claim 55

A projection optical system according to claim 49, wherein the following condition is satisfied when a focal length of said second lens with negative refracting power in said intermediate lens group in said second lens group is f 22 and a focal length of said third lens with negative refracting power in said intermediate lens group in said second lens group is f 23 : 0.01<f.sub.22 /f.sub.23 <10.

Claim 56

A projection optical system according to claim 50, wherein the following condition is satisfied when a focal length of said first lens with positive refracting power in said intermediate lens group in second lens group is f 21 and the distance from the first object to the second object is L: 0.230<f.sub.21 /L<0.40.

Claim 57

A projection optical system according to claim 50, wherein the following condition is satisfied when a focal length of said first lens with positive refracting power in said intermediate lens group in second lens group is f 21 and the distance from the first object to the second object is L: 0.230<f.sub.21 /L<0.40.

Claim 58

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 50, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 59

A projection optical system according to claim 46, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object, and wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.2 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0.

Claim 60

A projection optical system according to claim 55, wherein the following condition is satisfied when a focal length of said third lens with negative refracting power in said second lens group is f 23 and a focal length of said fourth lens with negative refracting power in said intermediate lens group in said second lens group is f 24 : 0.07<f.sub.24 /f.sub.23 <7.

Claim 61

A projection optical system according to claim 47, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 62

A projection optical system according to claim 57, wherein the following condition is satisfied when a radius of curvature of a lens surface closest to the first object in said sixth lens group is r 6F and an axial distance from the lens surface closest to the first object in said sixth lens group to the second object is d 6 : 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 63

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 58, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 64

A projection optical system according to claim 58, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, wherein said intermediate lens group has a first lens with positive refracting power, a second lens with negative refracting power, a third lens with negative refracting power, and a fourth lens with negative refracting power in the named order from the first object toward the second object, and wherein the following conditions are satisfied when a focal length of said first lens group is f 1 , a focal length of said second lens group is f 2 , a focal length of said third lens group is f 3 , a focal length of said fourth lens group is f 4 , a focal length of said fifth lens group is f 5 , a focal length of said sixth lens group is f 6 , an overall focal length of said second lens to said fourth lens in said intermediate lens group in said second lens group is f n , and a distance from the first object to the second object is L: 0.1<f.sub.1 /f.sub.3 <17 0.1<f.sub.2 /f.sub.4 <14 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 0.01<f.sub.n /f.sub.2 <2.0.

Claim 65

A projection optical system according to claim 60, wherein the following condition is satisfied when a focal length of said third lens with negative refracting power in said second lens group is f 23 and a focal length of said fourth lens with negative refracting power in said intermediate lens group in said second lens group is f 24 : 0.07<f.sub.24 /f.sub.23 <7.

Claim 66

A projection optical system according to claim 61, wherein the following condition is satisfied when a focal length of said second lens with negative refracting power in said intermediate lens group in said second lens group is f 22 and a focal length of said third lens with negative refracting power in said intermediate lens group in said second lens group is f 23 : 0.01<f.sub.22 /f.sub.23 <10.

Claim 67

A projection optical system according to claim 62, wherein the following condition is satisfied when a focal length of said first lens with positive refracting power in said intermediate lens group in second lens group is f 21 and the distance from the first object to the second object is L: 0.230<f.sub.21 /L<0.40. 64.

Claim 68

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 44, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 69

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, said first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive refracting power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said sixth lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group, and wherein the following condition is satisfied when a radius of curvature on the first object side in said rear lens placed as closest to the second object in said fourth lens group is r 4F and a radius of curvature on the second object side in said rear lens placed as closest to the second object in said fourth lens group is r 4R : -1.00≦(r.sub.4F -r.sub.4R)/(r.sub.4F +r.sub.4R)<0.

Claim 70

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, said first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive refracting power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said sixth lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group, and wherein the following condition is satisfied when a radius of curvature on the first object side in said rear lens placed as closest to the second object in said fourth lens group is r 4F and a radius of curvature on the second object side in said rear lens placed as closest to the second object in said fourth lens group is r 4R : -1.00≦(r.sub.4F -r.sub.4R)/(r.sub.4F +r.sub.4R)<0.

Claim 71

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 65, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 72

A projection optical system according to claim 65, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein the following condition is satisfied when a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group is r 5n and a radius of curvature of the convex surface opposed to the concave surface of said negative meniscus lens in said positive lens placed adjacent to the concave surface of said negative meniscus lens in said fifth lens group is r 5p : 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1.

Claim 73

A projection optical system according to claim 67, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 74

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 68, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 75

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern on a mask onto said substrate; and a projecting optical system for projecting an image of the pattern on said mask onto said substrate, said projecting optical system being provided between said mask and said substrate and having: a first lens group with positive refracting power, said first lens group being placed between said mask and said substrate; a second lens group with negative refracting power, said second lens group being placed between said first lens group and said substrate; a third lens group with positive refracting power, said third lens group being placed between said second lens group and said substrate; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and said substrate; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and said substrate; and a sixth lens group with positive refracting power, said sixth lens group being placed between said fifth lens group and said substrate, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, and wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 76

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern on a mask onto said substrate; and a projecting optical system for projecting an image of the pattern on said mask onto said substrate, said projecting optical system being provided between said mask and said substrate and having: a first lens group with positive refracting power, said first lens group being placed between said mask and said substrate; a second lens group with negative refracting power, said second lens group being placed between said first lens group and said substrate; a third lens group with positive refracting power, said third lens group being placed between said second lens group and said substrate; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and said substrate; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and said substrate; and a sixth lens group with positive refracting power, said sixth lens group being placed between said fifth lens group and said substrate, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, and wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 77

An exposure apparatus according to claim 70, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 78

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, and first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive refracting power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said six lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, and wherein said intermediate lens group includes a positive lens and a negative lens.

Claim 79

A projection optical system located between a first object and a second object, for projecting an image of the first object onto the second object, said projection optical system having: a first lens group with positive refracting power, and first lens group being placed between the first and second objects; a second lens group with negative refracting power, said second lens group being placed between said first lens group and the second object; a third lens group with positive refracting power, said third lens group being placed between said second lens group and the second object; a fourth lens group with negative refracting power, said fourth lens group being placed between said third lens group and the second object; a fifth lens group with positive refracting power, said fifth lens group being placed between said fourth lens group and the second object; and a sixth lens group with positive refracting power, said six lens group being placed between said fifth lens group and the second object, wherein said first lens group includes at least two positive lenses, said third lens group includes at least three positive lenses, said fourth lens group includes at least three negative lenses, said fifth lens group includes at least five positive lenses and at least one negative lens, and said sixth lens group includes at least one positive lens, wherein said second lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and an intermediate lens group placed between said front and rear lenses in said second lens group, and wherein said intermediate lens group includes a positive lens and a negative lens.

Claim 80

A projection optical system according to claim 72, wherein the following condition is satisfied when an axial distance from the first object to a first-object-side focal point of the whole of said projection optical system is I and the distance from the first object to the second object is L: 1.0<I/L.

Claim 81

A projection optical system according to claim 73, wherein said fourth lens group comprises a front lens placed as closest to the first object and having negative refracting power with a concave surface to the second object, a rear lens placed as closest to the second object and having negative refracting power with a concave surface to the first object, and at least one negative lens placed between said front lens in said fourth lens group and said rear lens in said fourth lens group.

Claim 82

A projection optical system according to claim 73, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 83

A projection optical system according to claim 75, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 84

A projection optical system according to claim 76, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 85

A projection optical system according to claim 77, wherein said sixth lens group comprises a lens placed as closest to the first object and having a convex surface opposed to the first object.

Claim 86

A projection optical system according to claim 74, wherein said fifth lens group comprises a negative meniscus lens, and a positive lens placed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens.

Claim 87

A projection optical system according to claim 79, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are placed between positive lenses in said fifth lens group.

Claim 88

A projection optical system according to claim 80, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 89

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 80, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 90

A projection optical system according to claim 81, wherein said sixth lens group comprises a lens placed as closest to the first object and having a convex surface opposed to the first object.

Claim 91

A method for fabricating at least semiconductor devices or liquid crystal display devices by using a projection optical system according to claim 72, comprising the steps of: illuminating a mask prepared as said first object with light of a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.