US5835285A — Projection optical system and exposure apparatus …

Claim 1

Independent Claim 306 words

A projection optical system provided between a first object and a second object, for projecting an image of a first object onto a second object, said projection optical system comprising a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said first object, wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said first object, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said first object, and wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said first object to said second object, the following conditions are satisfied: f.sub.1 /L<0.8 -0.033 <f.sub.2 /L 0.01 <f.sub.3 /L<1.0 f.sub.4 /L<-0.005 0.01 <f.sub.5 /L<0.9 0.02 <f.sub.6 /L<1.6.

Claim 2

Dependent Claim 306 words

A projection optical system provided between a first object and a second object, for projecting an image of a first object onto a second object, said projection optical system comprising a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said first object, wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said first object, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said first object, and wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said first object to said second object, the following conditions are satisfied: f.sub.1 /L<0.8 -0.033 <f.sub.2 /L 0.01 <f.sub.3 /L<1.0 f.sub.4 /L<-0.005 0.01 <f.sub.5 /L<0.9 0.02 <f.sub.6 /L<1.6.

Claim 3

Dependent Claim 50 words

A projection optical system according to claim 1, wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied: 1.0 <I/L.

Claim 4

Dependent Claim 160 words

A projection optical system according to claim 1, wherein said fourth lens group comprises: a front lens group disposed as closest to the first object, said front lens group having two negative meniscus lenses each shaped with a concave surface to said second object; a rear lens group disposed as closest to the second object, said rear lens group having a negative lens with a concave surface to said first object; and an intermediate lens group disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, said intermediate lens group having first and second negative lenses in order from the side of said first object, and wherein when f 4A is a focal length of said first negative lens in said fourth lens group and f 4B is a focal length of said second negative lens in said fourth lens group, the following condition is satisfied: 0.05<f.sub.4A /f.sub.4B <20.

Claim 5

Dependent Claim 56 words

A projection optical system according to claim 1, wherein when r 2Ff is a radius of curvature of a first-object-side surface of said front lens and r 2Fr is a radius of curvature of a second-object-side surface of said front lens, the front lens in said second lens group satisfies the following condition: 1.00≦(r.sub.2Ff -r.sub.2Fr)/(r.sub.2Ff +r.sub.2Fr)<5.0.

Claim 6

Dependent Claim 218 words

A projection optical system according to claim 1, wherein said fourth lens group has: a front lens group having a negative lens disposed as closest to said first object and shaped with a concave surface to said second object; a rear lens group having a negative lens disposed as closest to the second object and shaped with a concave surface to said first object; and an intermediate lens group having a negative lens and a positive lens with a convex surface adjacent to a concave surface of said negative lens is disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, and wherein when r 4N is a radius of curvature of said concave surface of the negative lens in said intermediate lens group and r 4P is a radius of curvature of said convex surface of the positive lens in said intermediate lens group, the following condition is satisfied: -0.9<(r.sub.4N -r.sub.4P) / (r.sub.4N +r.sub.4P)<0.9, provided that when L is the distance from said first object to said second object, said concave surface of said negative lens in said intermediate lens group or said convex surface of said positive lens in said intermediate lens group satisfies at least one of the following conditions: |r.sub.4N /L|<2.0 |r.sub.4P /L|<2.0.

Claim 7

Dependent Claim 59 words

A projection optical system according to claim 1, wherein when f 22 is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied: 0.1<f.sub.22 /f.sub.23 <10.

Claim 8

Dependent Claim 124 words

A projection optical system according to claim 1, wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied: 0<(r.sub.5P -r.sub.5n)/(r.sub.5P +r.sub.5n)<1.

Claim 9

Dependent Claim 51 words

A projection optical system according to claim 7, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.

Claim 10

Dependent Claim 124 words

A projection optical system according to claim 1, wherein said fifth lens group has a negative lens disposed as closest to the second object and shaped with a concave surface to the second object and the sixth lens group has a lens disposed as closest to the first object and shaped with a convex surface to the first object, and wherein when r 5R is a radius of curvature of a second-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group and r 6F is a radius of curvature of a first-object-side surface of the lens disposed as closest to the first object in said sixth lens group, the following condition is satisfied: -0.90<(r.sub.5R -r.sub.6F)/(r.sub.5R +r.sub.5F)<-0.001.

Claim 11

Dependent Claim 48 words

A projection optical system according to claim 1, wherein when d 56 is a lens group separation between said fifth lens group and said sixth lens group and L is the distance from said first object to said second object, the following condition is satisfied: d.sub.56 /L <0.017.

Claim 12

Dependent Claim 64 words

A projection optical system according to claim 1, wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied: 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 13

Dependent Claim 100 words

A projection optical system according to claim 1, wherein said fifth lens group has a negative lens disposed as closest to the second object and shaped with a concave surface to the second object, and wherein when r 5F is a radius of curvature of a first-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group and r 5R is a radius of curvature of a second-object-side surface of the negative lens disposed as closest to the second object in said fifth lens group, the following condition is satisfied: 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28.

Claim 14

Dependent Claim 55 words

A projection optical system according to claim 1, wherein when f 2 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Claim 15

Dependent Claim 93 words

A projection optical system according to claim 1, wherein when f 2F is a focal length of the front lens with the negative refracting power disposed as closest to the first object in said second lens group and shaped with the concave surface to said second object and f 2R is a focal length of the rear lens with the negative refracting power disposed as closest to the second object in said second lens group and shaped with the concave surface to said first object, the following condition is satisfied: 0<f.sub.2F /f.sub.2R <18.

Claim 16

Dependent Claim 23 words

A projection optical system according to claim 1, wherein the intermediate lens group in said second lens group has a negative refracting power.

Claim 17

Dependent Claim 66 words

A projection optical system according to claim 1, wherein said first lens group has at least two positive lenses, said third lens group has at least three positive lenses, said fourth lens group has at least three negative lenses, said fifth lens group has at least five positive lenses and at least one negative lens, and said sixth lens group has at least one positive lens.

Claim 18

Dependent Claim 51 words

A projection optical system according to claim 1, wherein said sixth lens group comprises three or less lenses having at least one lens surface satisfying the following condition: 1/|φL|<20 where φ: a refractive power of said lens surface, and L: the object-to-image distance from said first object to said second object.

Claim 19

Dependent Claim 18 words

A projection optical system according to claim 1, wherein a magnification of said projection optical system is 1/5.

Claim 20

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of; supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 1; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 21

Dependent Claim 34 words

A projection optical system according to claim 1, wherein said fifth lens group comprises a negative lens placed as closet to the second object and having a concave surface opposed to the second object.

Claim 22

Dependent Claim 47 words

A projection optical system according to claim 20, wherein when d 56 is a lens group separation between said fifth lens group and said sixth lens group and L is the distance from said first object to said second object, the following condition is satisfied: d.sub.56 /L<0.017.

Claim 23

Dependent Claim 66 words

A projection optical system according to claim 20, wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied: 0.50<d 6 /r 6F <1.50.

Claim 24

Dependent Claim 51 words

A projection optical system according to claim 20, wherein said sixth lens group comprises three or less lenses having at least one lens surface satisfying the following condition: 1/|φL|<20 where φ: a refractive power of said lens surface, and L: the object-to-image distance from said first object to said second object.

Claim 25

Dependent Claim 49 words

A projection optical system according to claim 16, wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied: 1.0<I/L.

Claim 26

Dependent Claim 125 words

A projection optical system according to claim 24, wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied: 0<(r.sub.5p -r.sub.5n) /(r.sub.5p +r.sub.5n)<1.

Claim 27

Dependent Claim 51 words

A projection optical system according to claim 25, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.

Claim 28

Dependent Claim 34 words

A projection optical system according to claim 26, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 29

Dependent Claim 64 words

A projection optical system according to claim 27, wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied: 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 30

Dependent Claim 59 words

A projection optical system according to claim 28, wherein when f 22 is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied: 0.1<f.sub.22 /f.sub.23 <10.

Claim 31

Dependent Claim 55 words

A projection optical system according to claim 29, wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Claim 32

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of: supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 30; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 33

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of: supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 28; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 34

Dependent Claim 160 words

A projection optical system according to claim 24, wherein said fourth lens group comprises: a front lens group disposed as closest to the first object, said front lens group having two negative meniscus lenses each shaped with a concave surface to said second object; a rear lens group disposed as closest to the second object, said rear lens group having a negative lens with a concave surface to said first object; and an intermediate lens group disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, said intermediate lens group having first and second negative lenses in order from the side of said first object, and wherein when f 4A is a focal length of said first negative lens in said fourth lens group and f 4B is a focal length of said second negative lens in said fourth lens group, the following condition is satisfied: 0.05<f.sub.4A /f.sub.4B <20.

Claim 35

Dependent Claim 57 words

A projection optical system according to claim 24, wherein when r Ff is a radius of curvature of a first-object-side surface of said front lens and r Fr is a radius of curvature of a second-object-side surface of said front lens, the front lens in said second lens group satisfies the following condition: 1.00<(r.sub.2Ff -r.sub.2Fr)/ (r.sub.2Ff +r.sub.2Fr)<5.0

Claim 36

Dependent Claim 217 words

A projection optical system according to claim 24, wherein said fourth lens group has: a front lens group having a negative lens disposed as closest to said first object and shaped with a concave surface to said second object; a rear lens group having a negative lens disposed as closest to the second object and shaped with a concave surface to said first object; and an intermediate lens group having a negative lens and a positive lens with a convex surface adjacent to a concave surface of said negative lens is disposed between said front lens group in said fourth lens group and said rear lens group in said fourth lens group, and wherein when r 4N is a radius of curvature of said concave surface of the negative lens in said intermediate lens group and r 4P is a radius of curvature of said convex surface of the positive lens in said intermediate lens group, the following condition is satisfied: -0.9<(r.sub.4N -r.sub.4P) /(r.sub.4N +r.sub.4P)<0.9, provided that when L is the distance from said first object to said second object, said concave surface of said negative lens in said intermediate lens group or said convex surface of said positive lens in said intermediate lens group satisfies at least one of the following conditions: |r.sub.4N /L|<2.0 |r.sub.4P /L|<2.0.

Claim 37

Dependent Claim 34 words

A projection optical system according to claim 24, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 38

Dependent Claim 64 words

A projection optical system according to claim 36, wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied: 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 39

Dependent Claim 59 words

A projection optical system according to claim 37, wherein when f 22 s a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied: 0.1<f.sub.22 /f.sub.23 <10.

Claim 40

Dependent Claim 55 words

A projection optical system according to claim 38, wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Claim 41

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of: supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 39; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 42

Dependent Claim 60 words

A projection optical system according to claim 24, wherein when f 22 , is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied: 0.1<f.sub.22 /f.sub.23 <10.

Claim 43

Dependent Claim 55 words

A projection optical system according to claim 41, wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Claim 44

Dependent Claim 55 words

A projection optical system according to claim 24, wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Claim 45

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of: supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 24; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 46

Dependent Claim 125 words

A projection optical system according to claim 16, wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied: 0<(r.sub.5p -r.sub.5n) /(r.sub.5p +r.sub.5n)<1.

Claim 47

Dependent Claim 51 words

A projection optical system according to claim 45, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.

Claim 48

Dependent Claim 85 words

A method for manufacturing integrated circuits, said method including an exposure process of projecting an image of a pattern on a mask onto a photosensitive substrate with an exposure light of a predetermined wavelength, said exposure process comprising the steps of: supplying said exposure light; introducing said exposure light to said mask; making said exposure light passing through said mask incident on a projection optical system according to claim 46; and introducing said exposure light passing through said projection optical system onto said photosensitive substrate.

Claim 49

Dependent Claim 331 words

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern of a mask onto said substrate; and a projection optical system provided between said mask and said substrate, said projection optical system including a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said mask, wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said mask, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said mask, and wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said mask to said substrate, the following conditions are satisfied: f 1 /L<0.8 -0.033<f 2 /L 0.01<f 3 /L<1.0 f 4 /L<-0.005 0.01<f 5 /L<0.9 0.02<f 6 /L<1.6.

Claim 50

Dependent Claim 331 words

An exposure apparatus comprising: a stage allowing a photosensitive substrate to be held on a main surface thereof; an illumination optical system for emitting exposure light of a predetermined wavelength and transferring a predetermined pattern of a mask onto said substrate; and a projection optical system provided between said mask and said substrate, said projection optical system including a first lens group with a positive refracting power, a second lens group with a negative refracting power, a third lens group with a positive refracting power, a fourth lens group with a negative refracting power, a fifth lens group with a positive refracting power, and a sixth lens group with a positive refracting power in order from the side of said mask, wherein said second lens group comprises a front lens with a negative refracting power disposed as closest to said first object and shaped with a concave surface to said second object, a rear lens of a negative meniscus shape disposed as closest to said second object and shaped with a concave surface to said mask, and an intermediate lens group disposed between said front lens and said rear lens, said intermediate lens group having a first lens with a positive refracting power, a second lens with a negative refracting power, and a third lens with a negative refracting power in order from the side of said mask, and wherein when f 1 is a focal length of said first lens group, f 2 is a focal length of said second lens group, f 3 is a focal length of said third lens group, f 4 is a focal length of said fourth lens group, f 5 is a focal length of said fifth lens group, f 6 is a focal length of said sixth lens group, and L is a distance from said mask to said substrate, the following conditions are satisfied: f 1 /L<0.8 -0.033<f 2 /L 0.01<f 3 /L<1.0 f 4 /L<-0.005 0.01<f 5 /L<0.9 0.02<f 6 /L<1.6.

Claim 51

Dependent Claim 17 words

An exposure apparatus according to claim 48, wherein a magnification of said projection optical system is 1/5.

Claim 52

Dependent Claim 65 words

An exposure apparatus according to claim 48, wherein said first lens group has at least two positive lenses, said third lens group has at least three positive lenses, said fourth lens group has at least three negative lenses, said fifth lens group has at least five positive lenses and at least one negative lens, and said sixth lens group has at least one positive lens.

Claim 53

Dependent Claim 48 words

An exposure apparatus according to claim 50, wherein when I is an axial distance from said first object to a first-object-side focal point of said entire projection optical system and L is the distance from said first object to said second object, the following condition is satisfied: 1.0<I/L.

Claim 54

Dependent Claim 124 words

An exposure apparatus according to claim 51, wherein said fifth lens group has a negative meniscus lens, and a positive lens disposed as adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, and wherein when r 5n is a radius of curvature of the concave surface of said negative meniscus lens in said fifth lens group and r 5P is a radius of curvature of the convex surface, opposed to the concave surface of the negative meniscus lens, of the positive lens disposed as adjacent to the concave surface of said negative meniscus lens in said fifth lens group, the following condition is satisfied: 0<(r.sub.5p -r.sub.5n) /(r.sub.5P +r.sub.5n)<1.

Claim 55

Dependent Claim 50 words

An exposure apparatus according to claim 52, wherein said negative meniscus lens and said positive lens adjacent to the concave surface of said negative meniscus lens are disposed between at least one positive lens in said fifth lens group and at least one positive lens in said fifth lens group.

Claim 56

Dependent Claim 33 words

An exposure apparatus according to claim 51, wherein said fifth lens group comprises a negative lens placed as closest to the second object and having a concave surface opposed to the second object.

Claim 57

Dependent Claim 63 words

An exposure apparatus according to claim 54, wherein when r 6F is a radius of curvature of a lens surface closest to the first object in said sixth lens group and d 6 is an axial distance from the lens surface closest to the first object in said sixth lens group to the second object, the following condition is satisfied: 0.50<d.sub.6 /r.sub.6F <1.50.

Claim 58

Dependent Claim 58 words

An exposure apparatus according to claim 51, wherein when f 22 is a focal length of the second lens with the negative refracting power in said second lens group and f 23 is a focal length of the third lens with the negative refracting power in said second lens group, the following condition is satisfied: 0.1<f.sub.22 /f.sub.23 <10.

Claim 59

Dependent Claim 54 words

An exposure apparatus according to claim 51, wherein when f 21 is a focal length of the first lens with the positive refracting power in the intermediate lens group in said second lens group and L is the distance from said first object to said second object, the following condition is satisfied: 0.230<f.sub.21 /L<0.40.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2001-11-09	2002-05-11	2002-11-10	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2005-11-09	2006-05-11	2006-11-10	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2009-11-09	2010-05-11	2010-11-10	$7700.00	Window Closed / Lapsed

Projection optical system and exposure apparatus using the same

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