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US6103014A Expired / Lapsed US ⏱️ 0.0 years remaining

Chemical vapor deposition chamber

Assignee: Applied Materials Inc
•
Filing: 1996-02-23
•
Granted: 2000-08-15
•
Expires: 2016-02-23
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Abstract

Abstract Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providing uniform temperatures across the susceptor mount for a substrate. A purge gas line is connected to openings in the susceptor outside of the periphery of the substrate to prevent edge and backside contamination of the substrate. A vacuum feed line mounts the substrate to the susceptor plate during processing. A refractory purge guide, or a plurality of placement pins, maintain a fixed gap passage for the purge gases to pass alongside the edge of the wafer and into the processing area of the chamber. An exhaust pumping plate improves the uniformity of exhaustion of spent gases from the chamber.

Inventors

  • 👤 Lawrence Chung-Lai Lei
  • 👤 Ilya Perlov
  • 👤 Karl Anthony Littau
  • 👤 Alan Ferris Morrison
  • 👤 Mei Chang
  • 👤 Ashok K. Sinha

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 22:17
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45519; C23C16/4412; C23C16/45521; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4585; C23C16/46; H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0432; H10P72/50; H10P72/70; H10P72/76; H10P72/7604; H10P72/7606; H10P72/7608; H10P72/7611; H10P72/7614; H10P72/7624; H10P72/7626; Y; Y10; Y10S; Y10S438/00; Y10S438/935

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 50 words
An exhaust system for a processing area in a deposition chamber, comprising: an exhaust plate having a channel extending about the processing area; a plurality of openings in the exhaust plate extending between the processing area and said channel; and an exhaust manifold disposed adjacent a portion of said channel.
Claim 2
Dependent Claim 50 words
An exhaust system for a processing area in a deposition chamber, comprising: an exhaust plate having a channel extending about the processing area; a plurality of openings in the exhaust plate extending between the processing area and said channel; and an exhaust manifold disposed adjacent a portion of said channel.
Claim 3
Dependent Claim 16 words
The exhaust system of claim 1, wherein said openings are evenly spaced about the enclosure wall.
Claim 4
Dependent Claim 15 words
The exhaust system of claim 1, wherein holes extend between said channel and said manifold.
Claim 5
Dependent Claim 13 words
The exhaust system of claim 3, wherein said exhaust plate comprises said holes.
Claim 6
Dependent Claim 19 words
The exhaust system of claim 1, wherein said openings are restrictive and are evenly spaced around the processing area.
Claim 7
Dependent Claim 62 words
An exhaust system for a processing area in a deposition chamber, comprising: an exhaust plate having a channel surrounding the processing area; an exhaust manifold disposed adjacent a portion of the channel; a plurality of evenly spaced openings disposed in said exhaust plate between said processing area and said channel; and holes providing fluid communication between said channel and said exhaust manifold.
Claim 8
Dependent Claim 62 words
An exhaust system for a processing area in a deposition chamber, comprising: an exhaust plate having a channel surrounding the processing area; an exhaust manifold disposed adjacent a portion of the channel; a plurality of evenly spaced openings disposed in said exhaust plate between said processing area and said channel; and holes providing fluid communication between said channel and said exhaust manifold.
Claim 9
Dependent Claim 16 words
The exhaust system of claim 6, wherein said manifold is interrupted by a slit valve opening.
Claim 10
Dependent Claim 16 words
The exhaust system of claim 6, wherein said openings are evenly spaced about the processing area.
Claim 11
Dependent Claim 13 words
The exhaust system of claim 6, wherein the exhaust plate comprises said holes.
Claim 12
Dependent Claim 19 words
The exhaust system of claim 6, wherein said openings are restrictive and are evenly spaced around the processing area.
Claim 13
Independent Claim 59 words
A method for exhausting a processing area in a deposition chamber, comprising: evacuating an exhaust manifold; and withdrawing a processing gas from said processing area through a plurality of spaced openings extending through an exhaust plate having a channel, wherein said processing area and said exhaust manifold communicate through said channel and the manifold partially extends below the channel.
Claim 14
Independent Claim 59 words
A method for exhausting a processing area in a deposition chamber, comprising: evacuating an exhaust manifold; and withdrawing a processing gas from said processing area through a plurality of spaced openings extending through an exhaust plate having a channel, wherein said processing area and said exhaust manifold communicate through said channel and the manifold partially extends below the channel.
Claim 15
Dependent Claim 15 words
The method of claim 11, wherein said openings are evenly spaced around the processing area.
Claim 16
Dependent Claim 27 words
The method of claim 11, wherein said spaced openings extend between the processing area and the channel, and holes extend between the channel and said exhaust manifold.
Claim 17
Dependent Claim 18 words
The method of claim 13, wherein said openings are restrictive and are evenly spaced around the processing area.
Claim 18
Dependent Claim 13 words
The method of claim 14, wherein said holes extend through said exhaust plate.

References Cited (Backward Citations)

JPS612319A Cited
US4892753A Cited
US4951601A Cited
US4820371A Cited
US4976217A Cited
JPH03211823A Cited
US5108792A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-08-15 2004-02-14 2004-08-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-08-15 2008-02-14 2008-08-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-08-15 2012-02-14 2012-08-15 $7700.00 Window Closed / Lapsed

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