US4976217A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Epitaxy reactor having an improved gas collector
Assignee: US Philips Corp
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Filing: 1989-09-26
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Granted: 1990-12-11
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Expires: 2009-09-26
Abstract
Abstract An epitaxy reactor of the type having a planetary platform for semiconductor wafers. At the periphery of this planetary support (4), a baffle plate (17) for gas distribution is disposed, which is provided with regularly distributed holes (12). According to the invention, this baffle plate comprises two cylinders or quasi cylinders, i.e. an upper cylinder (17) and a lower cylinder (3) sliding one into the other and forming parts of the same conduit having the form of a passage (16) surrounding the platform, the other parts (18) of this conduit acting as a spring, which tends to cause the upper cylinder (17) to rise with respect to the lower cylinder (3) bearing on the platform.
Inventors
- 👤 Peter Frijlink
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 09:08
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/14
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
136 words
An epitaxy reactor comprising a space containing a platform supporting semiconductor wafers with a circulation of gas between the center and the periphery of the platform, which space is closed by a cover which is substantially flat and is parallel to the platform during operation, while a gas-collecting crown comprises a baffle plate, which surrounds the platform and is provided with inlets regularly distributed along the periphery of the platform, characterized in that the baffle plate comprises a high part and a low part, the lower edge of the high part being pressed against the upper edge of the low part such that two parts are capable of sliding motion, while elastic means tend to cause the high part to rise with respect to the low part in order to press this part against the cover.
Claim 2
Dependent Claim
136 words
An epitaxy reactor comprising a space containing a platform supporting semiconductor wafers with a circulation of gas between the center and the periphery of the platform, which space is closed by a cover which is substantially flat and is parallel to the platform during operation, while a gas-collecting crown comprises a baffle plate, which surrounds the platform and is provided with inlets regularly distributed along the periphery of the platform, characterized in that the baffle plate comprises a high part and a low part, the lower edge of the high part being pressed against the upper edge of the low part such that two parts are capable of sliding motion, while elastic means tend to cause the high part to rise with respect to the low part in order to press this part against the cover.
Claim 3
Dependent Claim
61 words
A reactor as claimed in claim 1, characterized in that the crown is a conduit surrounding the platform and comprising an elastic plate having on the side of the platform, two plate edges, which are joined without being fixed together and constitute said lower edge of the high part and said upper edge of the low part of the baffle plate.
Claim 4
Dependent Claim
57 words
A reactor as claimed in claim 2, characterized in that the conduit is formed from a single plate folded in itself along horizontal folding lines in order to constitute a closed conduit having a polygonal section and along vertical folding lines regularly spaced apart, the conduit thus having the general form of a polygon surrounding the platform.
Claim 5
Dependent Claim
26 words
A reactor as claimed in claim 2, characterized in that the conduit has an inclined roof, whose ridge is situated on the side of the platform.
Claim 6
Dependent Claim
17 words
A reactor as claimed in claim 2, characterized in that the plate is a plate of molybdenum.
Claim 7
Dependent Claim
42 words
A reactor as claimed in claim 1, characterized in that the crown comprises a horizontal part connected to the low part of the baffle plate and said crown is placed on the edge of the platform by means of said horizontal part.
References Cited (Backward Citations)
US4607591A
Cited
FR2596070A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-10 | 1994-06-11 | 1994-12-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-10 | 1998-06-11 | 1998-12-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-10 | 2002-06-11 | 2002-12-11 | $7700.00 | Window Closed / Lapsed |