US4607591A
Expired / Lapsed
US
⏱️ 0.0 years remaining
CVD heater control circuit
Assignee: SPECTRUM CVD Inc PHOENIX ARIZONA A CORP OF DE
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Filing: 1985-08-06
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Granted: 1986-08-26
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Expires: 2005-08-06
Abstract
Abstract Chemical vapor deposition on a semiconductor wafer is obtained in a plasma reactor having a plurality of lamps for radiantly heating the wafer. Calibrated temperature sensing means remote from the wafer is used to control the heating of the wafer. Gases are supplied by way of a plurality of tubes extending radially inwardly from the sides of the chamber. A baffle is provided to form an antechamber which aids in the uniformity of the deposition. The plasma is ignited for less than the whole deposition cycle for deposition of tungsten disilicide.
Inventors
- 👤 Robert W. Stitz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 12:53
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/14; C23; C23C; C23C16/00; C23C16/44; C23C16/52; C30B25/10; C30B25/105
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
104 words
Apparatus for chemical vapor deposition comprising: an evacuable chamber having a thermally translucent window; heater means positioned outside said chamber and adjacent said window, said heater means comprising at least one incandescent lamp; temperature sensing means, located in said heater means, for producing an electrical signal indicative of temperature; transducer means for converting the signal from said sensing means into a digital signal; control means connected to said transducer means and to said at least one lamp for initially applying full power to said lamp and then a lower, temperature sustaining power to said lamp during a chemical vapor deposition process in said chamber.
Claim 2
Dependent Claim
104 words
Apparatus for chemical vapor deposition comprising: an evacuable chamber having a thermally translucent window; heater means positioned outside said chamber and adjacent said window, said heater means comprising at least one incandescent lamp; temperature sensing means, located in said heater means, for producing an electrical signal indicative of temperature; transducer means for converting the signal from said sensing means into a digital signal; control means connected to said transducer means and to said at least one lamp for initially applying full power to said lamp and then a lower, temperature sustaining power to said lamp during a chemical vapor deposition process in said chamber.
Claim 3
Dependent Claim
16 words
The apparatus as set forth in claim 1 wherein said transducer means comprises threshold sensing means.
Claim 4
Dependent Claim
15 words
The apparatus as set forth in claim 1 wherein said digital signal comprises two bits.
Claim 5
Dependent Claim
43 words
The apparatus as set forth in claim 3 wherein said transducer means comprises two threshold sensing means for sensing a first signal level indicating full power is to be applied and a second signal level indicating a sustaining power is to be applied.
Claim 6
Dependent Claim
54 words
The apparatus as set forth in claim 1 wherein said control means comprises programmed microprocessor means for receiving said digital signal as a data input; interface means connected to a data output of said microprocessor; and switch means connected to said interface means and to said lamp for controlling the current through said lamp.
References Cited (Backward Citations)
US4223048A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-08-25 | 1990-02-24 | 1990-08-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-08-25 | 1994-02-24 | 1994-08-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-08-25 | 1998-02-24 | 1998-08-26 | $7700.00 | Window Closed / Lapsed |