US6077353A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Pedestal insulator for a pre-clean chamber
Assignee: Applied Materials Inc
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Filing: 1998-06-02
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Granted: 2000-06-20
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Expires: 2018-06-02
Abstract
Abstract The invention generally provides an apparatus that reduces backside sputtering of the substrate in a pre-clean chamber and other etch chambers. The invention also provides an apparatus that reduces flaking of material from the film formed on the surfaces of the process kit and extends the specified lifetime of a process kit. One aspect of the invention provides an apparatus for supporting a substrate, comprising a support pedestal contacting a central portion of the substrate and an insulator surrounding the support pedestal, the insulator having a beveled portion extending from a circumferential edge of the substrate.
Inventors
- 👤 Mohamed A. Al-Sharif
- 👤 Bradley O. Stimson
- 👤 Debabrata Ghosh
- 👤 Barney M. Cohen
- 👤 Kenny King-Tai Ngan
- 👤 Murali Narasimhan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:19
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/20; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01J2237/00; H01J2237/02; H01J2237/022
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
53 words
An apparatus for supporting a substrate, comprising: a) a support pedestal having a central substrate supporting portion; and b) an insulator surrounding at least a portion of the support pedestal, the insulator having a beveled portion extending downwardly from a circumferential edge having a diameter substantially equal to a diameter of a substrate.
Claim 2
Independent Claim
53 words
An apparatus for supporting a substrate, comprising: a) a support pedestal having a central substrate supporting portion; and b) an insulator surrounding at least a portion of the support pedestal, the insulator having a beveled portion extending downwardly from a circumferential edge having a diameter substantially equal to a diameter of a substrate.
Claim 3
Dependent Claim
11 words
The apparatus of claim 1, wherein the support pedestal comprises titanium.
Claim 4
Dependent Claim
36 words
The apparatus of claim 1, wherein the beveled portion of the insulator is sloped downwardly at an angle of between about 10 degrees and about 60 degrees from a plane formed by the substrate supporting portion.
Claim 5
Dependent Claim
31 words
The apparatus of claim 1, wherein the beveled portion of the insulator is sloped downwardly at an angle of about 45 degrees from a plane formed by the substrate supporting portion.
Claim 6
Dependent Claim
26 words
The apparatus of claim 1, wherein a gap is formed between an upper annular flat surface of the insulator and a lower surface of a substrate.
Claim 7
Dependent Claim
12 words
The apparatus of claim 5 wherein the gap is about 0.015 inches.
Claim 8
Dependent Claim
26 words
The apparatus of claim 1, wherein the insulator has a lower annular flat surface extending from a lower edge of the beveled portion of the insulator.
Claim 9
Dependent Claim
10 words
The apparatus of claim 1 wherein the insulator comprises quartz.
Claim 10
Independent Claim
69 words
An apparatus for processing a substrate, comprising: a) a processing chamber; and b) a substrate support member disposed within the processing chamber, comprising: i) a support pedestal having a central substrate supporting portion; and ii) an insulator surrounding at least a portion of the support pedestal, the insulator having a beveled portion extending downwardly from a circumferential edge having a diameter substantially equal to a diameter of a substrate.
Claim 11
Independent Claim
69 words
An apparatus for processing a substrate, comprising: a) a processing chamber; and b) a substrate support member disposed within the processing chamber, comprising: i) a support pedestal having a central substrate supporting portion; and ii) an insulator surrounding at least a portion of the support pedestal, the insulator having a beveled portion extending downwardly from a circumferential edge having a diameter substantially equal to a diameter of a substrate.
Claim 12
Dependent Claim
13 words
The apparatus of claim 9 wherein the processing chamber is an etch chamber.
Claim 13
Dependent Claim
13 words
The apparatus of claim 9 wherein the processing chamber is a pre-clean chamber.
Claim 14
Dependent Claim
11 words
The apparatus of claim 9 wherein the support pedestal comprises titanium.
Claim 15
Dependent Claim
36 words
The apparatus of claim 9 wherein the beveled portion of the insulator is sloped downwardly at an angle of between about 10 degrees and about 60 degrees from a plane formed by the substrate supporting portion.
Claim 16
Dependent Claim
31 words
The apparatus of claim 9 wherein the beveled portion of the insulator is sloped downwardly at an angle of about 45 degrees from a plane formed by the substrate supporting portion.
Claim 17
Dependent Claim
26 words
The apparatus of claim 9 wherein a gap is formed between an upper annular flat surface of the insulator and a lower surface of the substrate.
Claim 18
Dependent Claim
12 words
The apparatus of claim 15 wherein the gap is about 0.015 inches.
Claim 19
Dependent Claim
26 words
The apparatus of claim 9 wherein the insulator has a lower annular flat surface extending from a lower edge of the beveled portion of the insulator.
Claim 20
Dependent Claim
10 words
The apparatus of claim 9 wherein the insulator comprises quartz.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-06-20 | 2003-12-20 | 2004-06-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-06-20 | 2007-12-20 | 2008-06-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-06-20 | 2011-12-20 | 2012-06-20 | $7700.00 | Window Closed / Lapsed |