Processing method and processing equipment

Abstract

Abstract PURPOSE: To form a hydrophilic resist film without effecting the concentration of a developer by forming a hydrophilic film consisting of a neutral substance before the surface of the resist film applied onto a bode to be treated is developed and treated. CONSTITUTION: A neutral and hydrophilic liquid stored in a tank 62 is fed through a nozzle 60 from the upper section of a body to be treated W supported under a horizontal state by a spin chuck 26. A PVA aqueous solution (an aqueous polyvinyl alcohol solution) having viscosity of less than 10cp, favorably 2-3cp or an aqueous saccharose solution is used as the liquid. Accordingly, the upper section of a resist film A is supplied with a fixed quantity of the neutral and hydrophilic liquid on the top face of the body to be treated W under a stationary state. The liquid is spread on the top face of the body to be treated W, the whole surface of the resist film A, by centrifugal force, thus forming a hydrophilic film B.

Inventors

• 👤 Keizo Hasebe
• 👤 圭蔵 長谷部
• 👤 Nobuo Konishi
• 👤 信夫 小西
• 👤 Shinji Nagashima
• 👤 慎二 永嶋
• 👤 Norio Senba
• 👤 教雄 千場

Bibliographic Details