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US6060736A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor device and method of manufacturing the same

Assignee: Fujitsu Semiconductor Ltd
•
Filing: 1998-07-29
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Granted: 2000-05-09
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Expires: 2018-07-29
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Abstract

Abstract The present invention is a semiconductor device having a capacitor employing ferroelectrics as a capacitor insulating film. The semiconductor device comprises a semiconductor substrate 11, an insulating film 12 formed on the semiconductor substrate 11, and a capacitor including (a) a lower electrode formed on the insulating film and made of a refractory metal whose face orientation (111) appears on an upper surface thereof, (b) a capacitor insulating film formed on the lower electrode and made of at least two layers consisting of a ferroelectrics film including Pb having a face orientation (111) and a ferroelectrics film including Pb having a face orientation (100), and (c) an upper electrode 15 formed on the capacitor insulating film 14.

Inventors

  • 👤 Hideyuki Noshiro

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:11
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/682; H10D1/684; H10D1/692; H10D1/696

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 98 words
A semiconductor device comprising: (i) a semiconductor substrate; (ii) an insulating film formed on the semiconductor substrate; and (iii) a capacitor including, (a) a lower electrode formed on the insulating film and made of a refractory metal whose face orientation (111) appears on an upper surface thereof, (b) a capacitor insulating film formed on the lower electrode and made of at least two layers consisting of a ferroelectrics film including Pb having a face orientation (111) and a ferroelectrics film including Pb having a face orientation (100), and (c) an upper electrode formed on the capacitor insulating film.
Claim 2
Dependent Claim 98 words
A semiconductor device comprising: (i) a semiconductor substrate; (ii) an insulating film formed on the semiconductor substrate; and (iii) a capacitor including, (a) a lower electrode formed on the insulating film and made of a refractory metal whose face orientation (111) appears on an upper surface thereof, (b) a capacitor insulating film formed on the lower electrode and made of at least two layers consisting of a ferroelectrics film including Pb having a face orientation (111) and a ferroelectrics film including Pb having a face orientation (100), and (c) an upper electrode formed on the capacitor insulating film.
Claim 3
Dependent Claim 46 words
A semiconductor device according to claim 1, wherein a ratio of one or more elements including Pb oriented at A sites of a perovskite crystal structure, which are constituent elements of the ferroelectrics film, to other constituent elements is in a range of 0.9 to 1.4.
Claim 4
Dependent Claim 74 words
A semiconductor device according to claim 2, wherein a ratio of one or more elements including Pb oriented at the A sites relative to other constituent elements is more than one in the ferroelectrics film including Pb having the face orientation (100), and a ratio of elements including Pb oriented at the A sites relative to other constituent elements is less than one in the ferroelectrics film including Pb having the face orientation (111).
Claim 5
Dependent Claim 20 words
A semiconductor device according to claim 1, wherein material of the ferroelectrics film is Pb(Zr,Ti)O 3 or (Pb,La)(Zr,Ti)O 3 .
Claim 6
Dependent Claim 28 words
A semiconductor device according to claim 1, wherein material of the lower electrode and the upper electrode provided in contact with the ferroelectrics film is a Pt film.
Claim 7
Dependent Claim 47 words
A semiconductor device according to claim 1, wherein the ferroelectrics film including Pb having the face orientation (111) is a lowermost layer in the capacitor insulating film, and the ferroelectrics film including Pb having the face orientation (100) is an uppermost layer in the capacitor insulating film.

References Cited (Backward Citations)

US5453294A Cited
US5650362A Cited
US5719417A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-05-09 2003-11-08 2004-05-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-05-09 2007-11-08 2008-05-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-05-09 2011-11-08 2012-05-09 $7700.00 Window Closed / Lapsed

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