US6007684A
Expired / Lapsed
US
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Process for forming improved titanium-containing barrier layers
Assignee: Applied Materials Inc
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Filing: 1997-11-12
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Granted: 1999-12-28
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Expires: 2017-11-12
Abstract
Abstract An improved titanium nitride barrier layer that prevents spiking between an overlying aluminum layer and a silicon substrate is formed by first sputter depositing a titanium layer onto the substrate, forming an oxygen-containing titanium layer thereover, and sputter depositing a titanium nitride layer over the oxygen-containing layer. The oxygen-containing layer can be formed in an oxygen-containing plasma, or titanium can be sputtered in the presence of oxygen. The titanium-containing layers can be deposited in a single sputtering chamber fitted with a source of RF power to the substrate support to form the plasma. An aluminum contact layer is sputter deposited over the titanium nitride layer.
Inventors
- 👤 Jianming Fu
- 👤 Fusen Chen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:39
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10P14/44; C; C23; C23C; C23C14/00; C23C14/58; C23C14/5846; C23C14/5853; C23C14/06; C23C14/0641; C23C14/0676; C23C14/14; C23C14/16; C23C14/165; H10P14/60; H10P14/69; H10P14/692; H10P14/6938; H10P14/6939; H10P14/69394; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/033; H10W20/047; H10W20/048
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
49 words
A process for depositing a titanium nitride barrier layer in a sputtering chamber comprising the steps of a) sputter depositing a titanium layer onto an exposed surface of a substrate, b) forming a titanium oxide layer over the titanium layer and c) sputter depositing a titanium nitride layer thereover.
Claim 2
Dependent Claim
49 words
A process for depositing a titanium nitride barrier layer in a sputtering chamber comprising the steps of a) sputter depositing a titanium layer onto an exposed surface of a substrate, b) forming a titanium oxide layer over the titanium layer and c) sputter depositing a titanium nitride layer thereover.
Claim 3
Dependent Claim
22 words
A process according to claim 1 wherein the titanium oxide layer is formed by adding an oxygen-containing gas to said sputtering chamber.
Claim 4
Dependent Claim
23 words
A process according to claim 1 wherein said titanium oxide layer is formed by sputtering titanium in the presence of an oxygen-containing gas.
Claim 5
Dependent Claim
17 words
A process according to claim 3 wherein said oxygen-containing gas is a mixture of oxygen and argon.
Claim 6
Dependent Claim
26 words
A process according to claim 1 wherein after the formation of the titanium oxide layer, sputtering is continued in the same chamber to deposit titanium nitride.
Claim 7
Dependent Claim
32 words
A process according to claim 1 wherein the formation of the titanium oxide layer is continued until the titanium oxide layer is deposited that is up to about 20 angstroms in thickness.
Claim 8
Dependent Claim
18 words
A process according to claim 1 wherein oxygen is added to argon during the titanium layer sputtering step.
Claim 9
Dependent Claim
18 words
A process according to claim 5 wherein nitrogen is added to argon during the titanium nitride sputtering step.
Claim 10
Dependent Claim
19 words
A process according to claim 1 wherein steps a), b) and c) are performed in a single sputtering chamber.
Claim 11
Dependent Claim
27 words
A process according to claim 1 wherein steps a) and b) are performed in one sputtering chamber and step c) is performed in a second sputtering chamber.
Claim 12
Dependent Claim
27 words
A process according to claim 1 wherein step a) is performed in one sputtering chamber and steps b) and c) are performed in a second sputtering chamber.
Claim 13
Dependent Claim
15 words
A process according to claim 1 wherein aluminum is sputtered over the titanium nitride layer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-27 | 2003-06-28 | 2003-12-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-27 | 2007-06-28 | 2007-12-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-27 | 2011-06-28 | 2011-12-28 | $7700.00 | Window Closed / Lapsed |