Patent US5988104A successfully refreshed from Google Patents.
US5988104A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma treatment system
Assignee: Renesas Electronics Corp
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Filing: 1997-07-29
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Granted: 1999-11-23
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Expires: 2017-07-29
Abstract
Abstract The present invention provides a plasma treatment system having a reaction chamber in which a plasma is generated to be irradiated onto a sample held on a sample holder in the reaction chamber. The reaction chamber has a top covered by a dielectric plate. The plasma treatment system also has an opposite electrode having a plurality of windows through which microwave is transmitted into the reaction chamber for causing the plasma, wherein the opposite electrode is provided over a top surface of the dielectric plate so that the opposite electrode is separated by the dielectric plate from the plasma generated in the reaction chamber.
Inventors
- 👤 Hidetaka Nambu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:31
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32238; H10; H10P; H10P50/00; H01J37/32266
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
105 words
An opposite electrode structure provided in a plasma treatment system having a reaction chamber in which a plasma is generated to be irradiated onto a sample held on a sample holder in said reaction chamber, said reaction chamber having a top covered by a dielectric plate, said opposite electrode structure comprising an opposite electrode having a plurality of windows through which microwave is transmitted into said reaction chamber for causing said plasma, wherein said opposite electrode is provided over a top surface of said dielectric plate so that said opposite electrode is separated by said dielectric plate from said plasma generated in said reaction chamber.
Claim 2
Dependent Claim
105 words
An opposite electrode structure provided in a plasma treatment system having a reaction chamber in which a plasma is generated to be irradiated onto a sample held on a sample holder in said reaction chamber, said reaction chamber having a top covered by a dielectric plate, said opposite electrode structure comprising an opposite electrode having a plurality of windows through which microwave is transmitted into said reaction chamber for causing said plasma, wherein said opposite electrode is provided over a top surface of said dielectric plate so that said opposite electrode is separated by said dielectric plate from said plasma generated in said reaction chamber.
Claim 3
Dependent Claim
21 words
The opposite electrode structure as claimed in claim 1, further comprising at least an internal heater provided within said opposite electrode.
Claim 4
Dependent Claim
23 words
The opposite electrode structure as claimed in claim 2, wherein said internal heater is provided to be entirely distributed over said opposite electrode.
Claim 5
Dependent Claim
38 words
The opposite electrode structure as claimed in claim 1, further comprising at least an internal heater provided within a center region of said opposite electrode and a peripheral heater provided on a peripheral region of said opposite electrode.
Claim 6
Dependent Claim
45 words
The opposite electrode structure as claimed in claim 1, further comprising an air-type temperature controller provided over said dielectric plate for blowing a temperature-controlled air to said opposite electrode and the top surface of said dielectric plate for controlling a temperature of said dielectric plate.
Claim 7
Dependent Claim
43 words
The opposite electrode structure as claimed in claim 1, further comprising a liquid-type temperature controller provided over said dielectric plate and under said opposite electrode for flowing a temperature-controlled liquid in said liquid-type temperature controller for controlling a temperature of said dielectric plate.
Claim 8
Dependent Claim
56 words
The opposite electrode structure as claimed in claim 1, further comprising: an air-type temperature controller provided over said dielectric plate for blowing a temperature-controlled air to said opposite electrode and the top surface of said dielectric plate for controlling a temperature of said dielectric plate; and at least an internal heater provided within said opposite electrode.
Claim 9
Dependent Claim
54 words
The opposite electrode structure as claimed in claim 1, further comprising: a liquid-type temperature controller provided over said dielectric plate and under said opposite electrode for flowing a temperature-controlled liquid in said liquid-type temperature controller for controlling a temperature of said dielectric plate; and at least an internal heater provided within said opposite electrode.
Claim 10
Dependent Claim
100 words
A plasma treatment system having a reaction chamber in which a plasma is generated to be irradiated onto a sample held on a sample holder in said reaction chamber, said reaction chamber having a top covered by a dielectric plate, said plasma treatment system also having an opposite electrode having a plurality of windows through which microwave is transmitted into said reaction chamber for causing said plasma, wherein said opposite electrode is provided over a top surface of said dielectric plate so that said opposite electrode is separated by said dielectric plate from said plasma generated in said reaction chamber.
Claim 11
Dependent Claim
100 words
A plasma treatment system having a reaction chamber in which a plasma is generated to be irradiated onto a sample held on a sample holder in said reaction chamber, said reaction chamber having a top covered by a dielectric plate, said plasma treatment system also having an opposite electrode having a plurality of windows through which microwave is transmitted into said reaction chamber for causing said plasma, wherein said opposite electrode is provided over a top surface of said dielectric plate so that said opposite electrode is separated by said dielectric plate from said plasma generated in said reaction chamber.
Claim 12
Dependent Claim
21 words
The plasma treatment system as claimed in claim 9, further comprising at least an internal heater provided within said opposite electrode.
Claim 13
Dependent Claim
23 words
The plasma treatment system as claimed in claim 10, wherein said internal heater is provided to be entirely distributed over said opposite electrode.
Claim 14
Dependent Claim
38 words
The plasma treatment system as claimed in claim 9, further comprising at least an internal heater provided within a center region of said opposite electrode and a peripheral heater provided on a peripheral region of said opposite electrode.
Claim 15
Dependent Claim
45 words
The plasma treatment system as claimed in claim 9, further comprising an air-type temperature controller provided over said dielectric plate for blowing a temperature-controlled air to said opposite electrode and the top surface of said dielectric plate for controlling a temperature of said dielectric plate.
Claim 16
Dependent Claim
43 words
The plasma treatment system as claimed in claim 9, further comprising a liquid-type temperature controller provided over said dielectric plate and under said opposite electrode for flowing a temperature-controlled liquid in said liquid-type temperature controller for controlling a temperature of said dielectric plate.
Claim 17
Dependent Claim
56 words
The plasma treatment system as claimed in claim 9, further comprising: an air-type temperature controller provided over said dielectric plate for blowing a temperature-controlled air to said opposite electrode and the top surface of said dielectric plate for controlling a temperature of said dielectric plate; and at least an internal heater provided within said opposite electrode.
Claim 18
Dependent Claim
54 words
The plasma treatment system as claimed in claim 9, further comprising: a liquid-type temperature controller provided over said dielectric plate and under said opposite electrode for flowing a temperature-controlled liquid in said liquid-type temperature controller for controlling a temperature of said dielectric plate; and at least an internal heater provided within said opposite electrode.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-11-22 | 2003-05-24 | 2003-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-11-22 | 2007-05-24 | 2007-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-11-22 | 2011-05-24 | 2011-11-23 | $7700.00 | Window Closed / Lapsed |