US5614025A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing apparatus
Assignee: Renesas Electronics Corp
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Filing: 1994-12-07
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Granted: 1997-03-25
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Expires: 2014-12-07
Abstract
Abstract A plasma processing apparatus for processing wafers or similar objects with neutral particles produced from plasma. A microwave is introduced into the apparatus via a dielectric path, or waveguide, having a broad radiation area. The microwave, therefore, generates uniform and dense plasma over a broad area. Neutral particles are produced from the plasma by two electrodes. As a result, an object is processed at a high speed by a beam of uniformly distributed neutral particles.
Inventors
- 👤 Takeshi Akimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 20:09
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32431; H01J37/32697
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
148 words
A plasma processing apparatus for processing an object with neutral particles produced from plasma, comprising: a plasma generating chamber; a processing chamber accommodating the object to be processed; a dielectric path member facing said plasma generating chamber; a microwave generator for feeding a microwave to said dielectric path member; a first electrode member formed between said plasma generating chamber and said processing chamber and having a plurality of minute aperture; a second electrode member mounted on said dielectric path member within said plasma generating chamber and having a plurality of radiation ports for radiating the microwave therethrough; and a power source for applying a voltage to between said first electrode member and said second electrode member; whereby said plasma chamber produces plasma including ion particles between said first electrode member and said second electrode member, and said first electrode member converts said ion particles to said neutral particles.
Claim 2
Dependent Claim
148 words
A plasma processing apparatus for processing an object with neutral particles produced from plasma, comprising: a plasma generating chamber; a processing chamber accommodating the object to be processed; a dielectric path member facing said plasma generating chamber; a microwave generator for feeding a microwave to said dielectric path member; a first electrode member formed between said plasma generating chamber and said processing chamber and having a plurality of minute aperture; a second electrode member mounted on said dielectric path member within said plasma generating chamber and having a plurality of radiation ports for radiating the microwave therethrough; and a power source for applying a voltage to between said first electrode member and said second electrode member; whereby said plasma chamber produces plasma including ion particles between said first electrode member and said second electrode member, and said first electrode member converts said ion particles to said neutral particles.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-03-24 | 2000-09-23 | 2001-03-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-03-24 | 2004-09-23 | 2005-03-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-03-24 | 2008-09-23 | 2009-03-25 | $7700.00 | Window Closed / Lapsed |