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US5986824A Expired / Lapsed US ⏱️ 0.0 years remaining

Large NA projection lens system with aplanatic lens element for excimer laser lithography

Assignee: Nikon Corp
•
Filing: 1998-06-04
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Granted: 1999-11-16
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Expires: 2018-06-04
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Abstract

Abstract Projection lens systems for transferring a pattern on a reticle onto a wafer having an aplanatic lens element. The aplanatic lens element has a shape factor between 0.1 and 0.224, the projection lens system satisfies the condition: -2.0<f ap /F<-0.6251, where f ap is the focal length of the aplanatic lens element and F is the focal length of the projection optical lens system. The projection optical lens system further satisfies the condition 2.6<|f G3 /f G |<4.64.

Inventors

  • 👤 Romeo I. Mercado

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 23:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70241; G02; G02B; G02B13/00; G02B13/24

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 90 words
A projection exposure apparatus for transferring a pattern on a reticle onto a wafer, the apparatus comprising a projection optical lens system comprising in order from an object side to an image side: a first group of lens elements having a positive refractive power; a second group of lens elements having a negative refractive power; a third group of lens elements having a positive refractive power; and a fourth group of lens elements having a positive refractive power, the fourth group of lens elements including a substantially aplanatic lens element.
Claim 2
Dependent Claim 90 words
A projection exposure apparatus for transferring a pattern on a reticle onto a wafer, the apparatus comprising a projection optical lens system comprising in order from an object side to an image side: a first group of lens elements having a positive refractive power; a second group of lens elements having a negative refractive power; a third group of lens elements having a positive refractive power; and a fourth group of lens elements having a positive refractive power, the fourth group of lens elements including a substantially aplanatic lens element.
Claim 3
Dependent Claim 74 words
The projection exposure apparatus of claim 1 wherein the substantially aplanatic lens element satisfies the following condition: 0.1<(R.sub.1 -R.sub.2)/(R.sub.1 +R.sub.2)<0.224, where R 1 is the radius of curvature of a surface of the substantially aplanatic lens element facing an object side of the projection optical lens system and R 2 is the radius of curvature of a surface of the substantially aplanatic lens element facing an image side of the projection optical lens system.
Claim 4
Dependent Claim 43 words
The projection exposure apparatus of claim 2 wherein the projection optical lens system satisfies the following condition: -2.0<f.sub.ap /F<-0.6251, where f ap is a focal length of the aplanatic lens element and F is the focal length of the projection optical lens system.
Claim 5
Dependent Claim 48 words
The projection exposure apparatus of claim 1 wherein the projection optical lens system satisfies the following condition: 2.6<|f.sub.G3 /f.sub.G2 |<4.64, where f G2 is the focal length of the second group of lens elements and f G3 is the focal length of the third group of lens elements.
Claim 6
Dependent Claim 29 words
The projection exposure apparatus of claim 4 wherein the fourth group of lens elements includes at least one meniscus lens element having a concave surface facing the image side.
Claim 7
Dependent Claim 30 words
The projection exposure apparatus of claim 5 wherein the fourth group of lens elements includes more than one meniscus lens element each having a concave surface facing the image side.
Claim 8
Dependent Claim 23 words
The projection exposure apparatus of claim 6 wherein the substantially aplanatic lens element is a meniscus lens element having a negative refractive power.
Claim 9
Dependent Claim 49 words
The projection exposure apparatus of claim 7 wherein the fourth group of lens elements include a triplet sub-group of lens elements made up of a lens element having a positive refractive power, a lens element having a negative refractive power, and a lens element having a positive refractive power.
Claim 10
Dependent Claim 43 words
The projection exposure apparatus of claim 1 wherein the projection optical lens system satisfies the following condition: -2.0<f.sub.ap /F<-0.6251, where f ap is a focal length of the substantially aplanatic lens element and F is focal length of the projection optical lens system.

References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2002-11-15 2003-05-17 2003-11-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2006-11-15 2007-05-17 2007-11-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2010-11-15 2011-05-17 2011-11-16 $7700.00 Window Closed / Lapsed

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