Split-gate memory device and method for accessing the same

Claim 2

A split-gate memory device, comprising: a body of semiconductor material having a major surface; a source region in the body of semiconductor material; a drain region in the body of semiconductor material; a channel region in the body of semiconductor material separating the source region from the drain region; a dielectric layer on the major surface overlying a first portion of the channel region adjacent the drain region; a dielectric stack on the major surface overlying a second portion of the channel region adjacent the source region; a first conductive layer over the dielectric layer, the first conductive layer having a first sidewall adjacent the drain region and a second sidewall opposite to the first sidewall; a second conductive layer over the dielectric stack, the second conductive layer having a first sidewall adjacent the source region and a second sidewall opposite to the first sidewall; an insulating layer over the major surface between the second sidewall of the first conductive layer and the second sidewall of the second conductive layer; and a dielectric spacer over the second conductive layer and over a portion of the major surface adjacent the first sidewall of the second conductive layer, wherein the source region is substantially aligned with the dielectric spacer, and the drain region is substantially aligned with the first sidewall of the first conductive layer.

Claim 3

The split-gate memory device of claim 1, wherein the dielectric stack includes: a bottom dielectric layer on the major surface; a nitride layer on the bottom dielectric layer; and a top dielectric layer on the nitride layer, the top dielectric layer having a thickness between approximately 5 nanometers (nm) and approximately 15 nm.

Claim 4

The split-gate memory device of claim 1, wherein the first conductive layer and the second conductive layer are polycrystalline silicon layers.

Claim 5

The split-gate memory device of claim 1, wherein the second conductive layer is a sidewall spacer adjacent the second sidewall of the first conductive layer.

Claim 6

The split-gate memory device of claim 1, further comprising a silicide structure overlying the first conductive layer.

Claim 7

A split-gate memory device, comprising: an array of memory cells arranged in a plurality of columns and a plurality of rows on a semiconductor substrate having a major surface, each memory cell in the array including: a source region, a channel region, and a drain region in the semiconductor substrate, the channel region separating the source region from the drain region; a first dielectric layer over the major surface of the semiconductor substrate overlying a first portion of the channel region adjacent the drain region; a second dielectric layer over the major surface of the semiconductor substrate overlying a second portion of the channel region adjacent the source region; a control gate over the second dielectric layer; a select gate over the first dielectric layer; and an insulating layer between the control gate and the select gate; a first bit line coupled to the drain region of each memory cell in a first column of the plurality of columns in the array; a second bit line coupled to the drain region of each memory cell in a second column of the plurality of columns in the array; a first select line coupled to the select gate of each memory cell in a first row of the plurality of rows in the array; a second select line coupled to the select gate of each memory cell in a second row of the plurality of rows in the array; a first control line coupled to the control gate of each memory cell in the first row; a second control line coupled to the control gate of each memory cell in the second row; and a first source line coupled to the source region of each memory cell in the first row and the second row.

Claim 8

A split-gate memory device, comprising: an array of memory cells arranged in a plurality of columns and a plurality of rows on a semiconductor substrate having a major surface, each memory cell in the array including: a source region, a channel region, and a drain region in the semiconductor substrate, the channel region separating the source region from the drain region; a first dielectric layer over the major surface of the semiconductor substrate overlying a first portion of the channel region adjacent the drain region; a second dielectric layer over the major surface of the semiconductor substrate overlying a second portion of the channel region adjacent the source region; a control gate over the second dielectric layer; a select gate over the first dielectric layer; and an insulating layer between the control gate and the select gate; a first bit line coupled to the drain region of each memory cell in a first column of the plurality of columns in the array; a second bit line coupled to the drain region of each memory cell in a second column of the plurality of columns in the array; a first select line coupled to the select gate of each memory cell in a first row of the plurality of rows in the array; a second select line coupled to the select gate of each memory cell in a second row of the plurality of rows in the array; a first control line coupled to the control gate of each memory cell in the first row; a second control line coupled to the control gate of each memory cell in the second row; and a first source line coupled to the source region of each memory cell in the first row and the second row.

Claim 9

The split-gate memory device of claim 6, wherein the second dielectric layer includes: a first silicon dioxide layer on the major surface having a thickness between approximately 5 nanometers (nm) and approximately 15 nm; a silicon nitride layer on the first silicon dioxide layer having a thickness between approximately 5 nm and approximately 15 nm; and a second silicon dioxide layer on the silicon nitride layer having a thickness between approximately 5 nm and approximately 15 nm.

Claim 10

The split-gate memory device of claim 6, wherein: the select gate is a polycrystalline silicon gate; and the control gate is a polycrystalline silicon sidewall spacer adjacent the select gate.

Claim 11

The split-gate memory device of claim 6, each memory cell in the array of memory cells further including: a dielectric spacer over the control gate and over a portion of the major surface adjacent the control gate, wherein the source region is substantially aligned with the dielectric spacer; and a silicide structure overlying the select gate.

Claim 12

The split-gate memory device of claim 6, further comprising: a third select line coupled to the select gate of each memory cell in a third row of the plurality of rows in the array; a fourth select line coupled to the select gate of each memory cell in a fourth row of the plurality of rows in the array; a third control line coupled to the control gate of each memory cell in the third row; a fourth control line coupled to the control gate of each memory cell in the fourth row; and a second source line coupled to the source region of each memory cell in the third row and the fourth row.

Claim 13

The split-gate memory device of claim 10, wherein the first control line is coupled to the second control line and wherein the third control line is coupled to the fourth control line.

Claim 14

The split-gate memory device of claim 10, wherein the first source line is coupled to the second source line.