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US5729035A Expired / Lapsed US ⏱️ 0.0 years remaining

Non-volatile semiconductor device with multi-layered capacitor insulating film

Assignee: Mitsubishi Electric Corp
•
Filing: 1996-09-10
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Granted: 1998-03-17
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Expires: 2016-09-10
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Abstract

Abstract A structure and a manufacturing method of a semiconductor device which prevents leakage of electric charges from a floating gate electrode to outside. The semiconductor device includes a capacitor insulating film at an upper surface and opposing sidewall surfaces of the floating gate electrode, which film includes a first silicon nitride film, a first silicon oxide film, a second silicon nitride film and a second silicon oxide film stocked in this order from the bottom. In such a structure, the capacitor insulating film prevents electric charges accumulated in the floating gate electrode as information from leaking outside from the vicinity of its end portion A.

Inventors

  • 👤 Masatoshi Anma

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 21:46
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/60; H10D64/66; H10D64/68; H10D64/681; H10D30/00; H10D30/60; H10D30/68; H10D30/6891

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 178 words
A semiconductor device, comprising: a first gate electrode formed on a semiconductor substrate with an insulating film interposed therebetween; a pair of impurity regions formed at said semiconductor substrate on both sides of said first gate electrode; a multi-layered film formed on an upper surface and opposing side surfaces of said first gate electrode so as to continuously extend from one of the opposing side surfaces to the other of the opposing side surfaces via the upper surface, the multi-layered film including a nitride film and an oxide film; and a second gate electrode formed on said multi-layered film and having opposing side surfaces; wherein said multi-layered film has opposing side surfaces substantially in parallel to the opposing side surfaces of said first gate electrode, and an upper surface substantially in parallel to the upper surface of said first gate electrode, said second gate electrode is formed only on the upper surface of said multi-layered film, and said opposing side surfaces of said second gate electrode are substantially coplanar with said opposing side surfaces of said multi-layered film.
Claim 2
Dependent Claim 178 words
A semiconductor device, comprising: a first gate electrode formed on a semiconductor substrate with an insulating film interposed therebetween; a pair of impurity regions formed at said semiconductor substrate on both sides of said first gate electrode; a multi-layered film formed on an upper surface and opposing side surfaces of said first gate electrode so as to continuously extend from one of the opposing side surfaces to the other of the opposing side surfaces via the upper surface, the multi-layered film including a nitride film and an oxide film; and a second gate electrode formed on said multi-layered film and having opposing side surfaces; wherein said multi-layered film has opposing side surfaces substantially in parallel to the opposing side surfaces of said first gate electrode, and an upper surface substantially in parallel to the upper surface of said first gate electrode, said second gate electrode is formed only on the upper surface of said multi-layered film, and said opposing side surfaces of said second gate electrode are substantially coplanar with said opposing side surfaces of said multi-layered film.
Claim 3
Dependent Claim 38 words
The semiconductor device according to claim 1, wherein said multi-layered film includes a first nitride film, a first oxide film, a second nitride film, and a second oxide film formed on said first gate electrode in this order.

References Cited (Backward Citations)

US5252846A Cited
JPH02188970A Cited
US5304829A Cited
JPH0371674A Cited
US5289026A Cited
JPH05267684A Cited
US5379253A Cited
US5475251A Cited
US5554869A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-03-16 2001-09-15 2002-03-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-03-16 2005-09-15 2006-03-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-03-16 2009-09-15 2010-03-17 $7700.00 Window Closed / Lapsed

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