Patent US5935648A successfully refreshed from Google Patents.
US5935648A
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High surface area molybdenum nitride electrodes
Assignee: United States Department of the Air Force
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Filing: 1997-03-28
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Granted: 1999-08-10
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Expires: 2017-03-28
Abstract
Abstract High surface area Mo2N or MoN electrodes for use in high energy density energy storage devices, and processes for fabricating the electrodes, are described wherein a precursor molybdenum solution is applied to a metallic foil substrate which is heated to produce a MoO3 coating on the substrate, which coating is converted to Mo2N and MoN by reaction with ammonia. Mo2N and MoN electrodes are also produced in a chemical vapor deposition process in which molybdenum pentachloride carried by an inert gas and ammonia are the reaction gases for producing Mo2N and MoN films.
Inventors
- 👤 Scott L. Roberson
- 👤 Duane Finello
- 👤 Robert F. Davis
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:17
CPC Classifications
H; H01; H01G; H01G9/00; H01G9/004; H01G9/04; H01G9/042; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; Y; Y02; Y02T; Y02T10/00; Y02T10/60; Y02T10/70
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
90 words
A process for fabricating a high surface area molybdenum nitride electrode, comprising the steps of: (a) providing a substrate for receiving a vapor deposited film; (b) providing a source of molybdenum pentachloride vapor and a source of gaseous anhydrous ammonia; (c) flowing a mixture of said molybdenum pentachloride vapor and said gaseous anhydrous ammonia onto said substrate; and (d) heating said substrate in the presence of said mixture of said molybdenum pentachloride vapor and said gaseous anhydrous ammonia to produce a vapor deposited film of molybdenum nitride on said substrate.
Claim 2
Dependent Claim
90 words
A process for fabricating a high surface area molybdenum nitride electrode, comprising the steps of: (a) providing a substrate for receiving a vapor deposited film; (b) providing a source of molybdenum pentachloride vapor and a source of gaseous anhydrous ammonia; (c) flowing a mixture of said molybdenum pentachloride vapor and said gaseous anhydrous ammonia onto said substrate; and (d) heating said substrate in the presence of said mixture of said molybdenum pentachloride vapor and said gaseous anhydrous ammonia to produce a vapor deposited film of molybdenum nitride on said substrate.
Claim 3
Dependent Claim
17 words
The process of claim 1 wherein said substrate comprises aluminum, titanium, zirconium, molybdenum, tantalum or stainless steel.
Claim 4
Dependent Claim
42 words
The process of claim 1 wherein the step of heating said substrate in the presence of said mixture of said molybdenum pentachloride vapor and said gaseous anhydrous ammonia is performed at a temperature in the range of about 230 to 800° C.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-08-09 | 2003-02-08 | 2003-08-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-08-09 | 2007-02-08 | 2007-08-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-08-09 | 2011-02-08 | 2011-08-10 | $7700.00 | Window Closed / Lapsed |