Patent US5933204A successfully refreshed from Google Patents.
US5933204A
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Display device and production method thereof with insulating members between pixel electrodes for smooth surface
Assignee: Canon Inc
•
Filing: 1996-06-27
•
Granted: 1999-08-03
•
Expires: 2016-06-27
Abstract
Abstract Disclosed herein is a method of producing a display device comprising a substrate and a plurality of conductive members provided on the substrate, said conductive members each having a substantially even surface and making up pixels, wherein the conductive members are smoothed by means of chemical mechanical polishing.
Inventors
- 👤 Yoshihiko Fukumoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-10 02:03
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1335; G02F1/133553; G02F1/136; G02F1/1362; G02F1/136277; G02F1/1337; G02F1/13373; G02F1/136281; G02F2201/00; G02F2201/48
Claims Analysis
Total Claims: 133
Claim 1
Independent Claim
86 words
A display device comprising a substrate and a plurality of conductive members provided on the substrate, each of said conductive members having a substantially even surface which acts as a pixel electrode connected to a switching element comprising a silicon layer, wherein insulating members each having a substantially even surface and comprising silicon atoms are provided at ends of their corresponding conductive members in such a manner that the substantially even surface of the insulating member ranges with the substantially even surface of the conductive member.
Claim 2
Dependent Claim
86 words
A display device comprising a substrate and a plurality of conductive members provided on the substrate, each of said conductive members having a substantially even surface which acts as a pixel electrode connected to a switching element comprising a silicon layer, wherein insulating members each having a substantially even surface and comprising silicon atoms are provided at ends of their corresponding conductive members in such a manner that the substantially even surface of the insulating member ranges with the substantially even surface of the conductive member.
Claim 3
Dependent Claim
13 words
The display device according to claim 1, wherein the conductive members comprise electrodes.
Claim 4
Dependent Claim
78 words
A display device comprising an active matrix substrate, in which a switching transistor containing a silicon layer is provided for each pixel electrode, an electrode substrate opposite to the active matrix substrate and a liquid crystal held between these substrates, wherein the surfaces of pixel electrodes are on the same level with each other, and at least a part of a side wall of each of the pixel electrodes comes into contact with an insulator containing silicon atoms.
Claim 5
Dependent Claim
78 words
A display device comprising an active matrix substrate, in which a switching transistor containing a silicon layer is provided for each pixel electrode, an electrode substrate opposite to the active matrix substrate and a liquid crystal held between these substrates, wherein the surfaces of pixel electrodes are on the same level with each other, and at least a part of a side wall of each of the pixel electrodes comes into contact with an insulator containing silicon atoms.
Claim 6
Dependent Claim
22 words
The display device according to claim 3, wherein the switching transistor-arranged on the active matrix substrate is comprised of a monocrystalline semiconductor.
Claim 7
Dependent Claim
18 words
The display device according to claim 3, wherein the switching transistor is comprised of a polycrystal line semiconductor.
Claim 8
Dependent Claim
25 words
The display device according to any one of claims 3 to 5, wherein the active matrix substrate is constructed by using a monocrystalline semiconductor substrate.
Claim 9
Dependent Claim
24 words
The display device according to any one of claims 3 to 5, wherein the active matrix substrate is constructed by using a transparent substrate.
Claim 10
Independent Claim
90 words
A method of producing a display device having a substrate and a plurality of conductive members provided on the substrate, said conductive members each having a substantially even surface which acts as a pixel electrode, comprising the steps of: providing an insulating layer on the substrate; patterning the insulating layer to leave a separation region between said pixel electrodes to be formed; forming a conductive material on said patterned insulating layer; and smoothing the surface of said conductive material by means of chemical mechanical polishing to obtain said conductive members.
Claim 11
Independent Claim
90 words
A method of producing a display device having a substrate and a plurality of conductive members provided on the substrate, said conductive members each having a substantially even surface which acts as a pixel electrode, comprising the steps of: providing an insulating layer on the substrate; patterning the insulating layer to leave a separation region between said pixel electrodes to be formed; forming a conductive material on said patterned insulating layer; and smoothing the surface of said conductive material by means of chemical mechanical polishing to obtain said conductive members.
Claim 12
Dependent Claim
12 words
The method according to claim 8, wherein the conductive members comprise electrodes.
Claim 13
Independent Claim
114 words
A method of producing a display device comprising an active matrix substrate, in which a switching transistor is provided for each pixel electrode, a common electrode substrate opposite to the active matrix substrate and a liquid crystal held between these substrates, wherein the active matrix substrate is produced by the following steps: preparing a substrate; forming a plurality of transistors on the substrate; forming an insulating layer on said transistors; patterning the insulating layer to leave a separation region between said pixel electrodes to be formed; forming a conductive material on said patterned insulating layer; and smoothing the surface of said conductive material by means of chemical mechanical polishing to obtain said pixel electrodes.
Claim 14
Independent Claim
114 words
A method of producing a display device comprising an active matrix substrate, in which a switching transistor is provided for each pixel electrode, a common electrode substrate opposite to the active matrix substrate and a liquid crystal held between these substrates, wherein the active matrix substrate is produced by the following steps: preparing a substrate; forming a plurality of transistors on the substrate; forming an insulating layer on said transistors; patterning the insulating layer to leave a separation region between said pixel electrodes to be formed; forming a conductive material on said patterned insulating layer; and smoothing the surface of said conductive material by means of chemical mechanical polishing to obtain said pixel electrodes.
Claim 15
Dependent Claim
58 words
The method according to claim 10, wherein after a first insulating layer under pixel electrodes is patterned, a film is formed with a material for the pixel electrodes on the whole surface of the active matrix substrate, and the film for the pixel electrodes are polished by chemical mechanical polishing to form the surfaces of the pixel electrodes.
Claim 16
Dependent Claim
85 words
The method according to claim 10, wherein after a first insulating layer under pixel electrodes is patterned, a film is formed with a material for the pixel electrodes on the whole surface of the active matrix substrate and then patterned, and then a second insulating layer is further formed, and the second insulating layer is polished by chemical mechanical polishing to remove the second insulating layer at portions on the pixel electrodes, and at the same time, to polish the surfaces of the pixel electrodes.
Claim 17
Dependent Claim
93 words
An active matrix substrate comprising: a substrate; a plurality of switching elements provided on said substrate; a plurality of conductive members comprised in a plurality of pixels, with each of said switching elements containing a silicon layer, and each of said conductive members provided on said substrate and having a substantially even surface and being connected to said switching element; and insulating members each comprising silicon atoms provided at ends of their corresponding conductive members in such a manner that said insulating member ranges with the substantially even surface of said conductive member.
Claim 18
Dependent Claim
93 words
An active matrix substrate comprising: a substrate; a plurality of switching elements provided on said substrate; a plurality of conductive members comprised in a plurality of pixels, with each of said switching elements containing a silicon layer, and each of said conductive members provided on said substrate and having a substantially even surface and being connected to said switching element; and insulating members each comprising silicon atoms provided at ends of their corresponding conductive members in such a manner that said insulating member ranges with the substantially even surface of said conductive member.
Claim 19
Dependent Claim
26 words
An active matrix substrate according to claim 13, wherein a surface of said insulating member ranging with said end of said conductive member is substantially even.
Claim 20
Dependent Claim
24 words
An active matrix substrate according to claim 14, wherein said even surfaces of said conductive and insulating members are smoothed by chemical mechanical polishing.
Claim 21
Dependent Claim
20 words
An active matrix substrate according to claim 15, wherein the even surface of said conductive member comprises a specular surface.
Claim 22
Dependent Claim
22 words
An active matrix substrate according to claim 13, wherein an insulating layer is located between said insulating member and said switching element.
Claim 23
Dependent Claim
17 words
An active matrix substrate according to claim 13, wherein said insulating member is comprised of phosphosilicate glass.
Claim 24
Dependent Claim
25 words
An active matrix substrate according to claim 17, wherein said insulating layer functions as an etching stopper when said insulating member is formed by patterning.
Claim 25
Dependent Claim
17 words
An active matrix substrate according to claim 19, wherein said insulating layer is comprised of silicon nitride.
Claim 26
Dependent Claim
21 words
An active matrix substrate according to claim 13, wherein said conductive member is comprised of a metal or compound of metal.
Claim 27
Dependent Claim
31 words
An active matrix substrate according to claim 21, wherein said conductive member is comprised of a material selected from a group consisting of Al, Ti, Ta, W, and Indium Thin Oxide.
Claim 28
Dependent Claim
25 words
An active matrix substrate according to claim 21, wherein said conductive member is formed so as to attain a thickness of 10,000 Å or more.
Claim 29
Dependent Claim
17 words
An active matrix substrate according to claim 13, wherein said substrate is comprised of a semiconductor substrate.
Claim 30
Dependent Claim
17 words
An active matrix substrate according to claim 24, wherein said semiconductor substrate is a single-crystal silicon substrate.
Claim 31
Dependent Claim
17 words
An active matrix substrate according to claim 13, wherein said substrate is comprised of a transparent substrate.
Claim 32
Dependent Claim
18 words
An active matrix substrate according to claim 26, wherein said transparent substrate is comprised of a quartz substrate.
Claim 33
Dependent Claim
17 words
An active matrix substrate according to claim 13, wherein said switching element is comprised of a transistor.
Claim 34
Dependent Claim
18 words
An active matrix substrate according to claim 28, wherein said transistor is formed by using a single-crystal silicon.
Claim 35
Dependent Claim
18 words
An active matrix substrate according to claim 28, wherein said transistor is formed by using a polycrystal silicon.
Claim 36
Dependent Claim
46 words
An active matrix substrate according to claim 25, wherein pixel capacitance is formed between an impurity region formed in said single-crystal silicon substrate and a pixel capacitance electrode formed so as to make an oxide film exist between the pixel capacitance electrode and said impurity region.
Claim 37
Dependent Claim
34 words
An active matrix substrate according to claim 26, wherein a light-shielding layer is located on said switching element so as to make an insulating layer exist between said light-shielding layer and said switching element.
Claim 38
Dependent Claim
27 words
An active matrix substrate according to claim 32, wherein said light-shielding layer is comprised of a material selected from a group consisting of Ti, Ta and W.
Claim 39
Dependent Claim
22 words
An active matrix substrate according to claim 32, wherein a pixel capacitance is formed between said light-shielding layer and said conductive member.
Claim 40
Independent Claim
126 words
A method of producing an active matrix substrate comprising a substrate, a plurality of switching elements provided on said substrate, and a plurality of conductive members comprised in a plurality of pixels, with each of the conductive members being provided on the substrate and having a substantially even surface and being connected to the switching element, said method comprising the steps of: preparing a substrate; forming the switching elements on the substrate; forming an insulating layer on the switching elements; patterning the insulating layer to leave a separation region for the pixels between the pixels to be formed; forming a conductive material on the patterned insulating layer; and smoothing the surface of the conductive material by means of chemical mechanical polishing to obtain the conductive members.
Claim 41
Independent Claim
126 words
A method of producing an active matrix substrate comprising a substrate, a plurality of switching elements provided on said substrate, and a plurality of conductive members comprised in a plurality of pixels, with each of the conductive members being provided on the substrate and having a substantially even surface and being connected to the switching element, said method comprising the steps of: preparing a substrate; forming the switching elements on the substrate; forming an insulating layer on the switching elements; patterning the insulating layer to leave a separation region for the pixels between the pixels to be formed; forming a conductive material on the patterned insulating layer; and smoothing the surface of the conductive material by means of chemical mechanical polishing to obtain the conductive members.
Claim 42
Dependent Claim
37 words
A method of producing an active matrix substrate according to claim 35, wherein the surface of the conductive material and a surface of the separation region comprised of the insulating layer are smoothed by chemical mechanical polishing.
Claim 43
Dependent Claim
29 words
A method of producing an active matrix substrate according to claim 35, wherein the even surface of the conductive member is treated so as to comprise a specular surface.
Claim 44
Dependent Claim
25 words
A method of producing an active matrix substrate according to claim 35, wherein an insulating layer comprising silicon atoms is used as the insulating layer.
Claim 45
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 38, wherein the insulating layer is formed by a layer-forming method.
Claim 46
Dependent Claim
21 words
A method of producing an active matrix substrate according to claim 39, wherein phospho-silicate glass is used as the insulating layer.
Claim 47
Dependent Claim
36 words
A method of producing an active matrix substrate according to claim 35, wherein prior to the formation of the insulating layer, a first insulating layer different from the insulating layer is formed on the switching element.
Claim 48
Dependent Claim
31 words
A method of producing an active matrix substrate according to claim 41, wherein the first insulating layer is used as an etching stopper in the step of patterning the insulating layer.
Claim 49
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 42, wherein silicon nitride is used as the first insulating layer.
Claim 50
Dependent Claim
24 words
A method of producing an active matrix substrate according to claim 43, wherein the silicon nitride is formed into a layer by using plasma.
Claim 51
Dependent Claim
23 words
A method of producing an active matrix substrate according to claim 42, wherein the patterning is comprised of a step of dry etching.
Claim 52
Dependent Claim
31 words
A method of producing an active matrix substrate according to claim 35, wherein the chemical mechanical polishing uses an abrasive capable of polishing and containing a chemical ingredient capable of etching.
Claim 53
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 35, wherein the conductive material is formed by a layer-forming method.
Claim 54
Dependent Claim
27 words
A method of producing an active matrix substrate according to claim 47, wherein a sputtering method or vapor deposition method is used as the layer forming method.
Claim 55
Dependent Claim
26 words
A method of producing an active matrix substrate according to claim 35, wherein a metal or a compound of metal is used as the conductive material.
Claim 56
Dependent Claim
35 words
A method of producing an active matrix substrate according to claim 49, wherein the conductive material is comprised of a material selected from a group consisting of Al, Ti, Ta, W, and Indium Thin Oxide.
Claim 57
Dependent Claim
32 words
A method of producing an active matrix substrate according to claim 47, wherein the conductive material is formed into a layer so as to attain a thickness of 10,000 Å or more.
Claim 58
Dependent Claim
21 words
A method of producing an active matrix substrate according to claim 35, wherein a semiconductor substrate is used as the substrate.
Claim 59
Dependent Claim
21 words
A method of producing an active matrix substrate according to claim 52, wherein the semiconductor substrate is a single-crystal silicon substrate.
Claim 60
Dependent Claim
21 words
A method of producing an active matrix substrate according to claim 35, wherein a transparent substrate is used as the substrate.
Claim 61
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 54, wherein the transparent substrate is comprised of a quartz substrate.
Claim 62
Dependent Claim
21 words
A method of producing an active matrix substrate according to claim 35, wherein the switching element is comprised of a transistor.
Claim 63
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 56, wherein the transistor is formed by using a single-crystal silicon.
Claim 64
Dependent Claim
22 words
A method of producing an active matrix substrate according to claim 56, wherein the transistor is formed by using a polycrystal silicon.
Claim 65
Dependent Claim
56 words
A method of producing an active matrix substrate according to claim 53, wherein an impurity region is formed in the single-crystal silicon substrate, and a pixel capacitance is formed between the impurity region and a pixel capacitance electrode formed so as to make an oxide film exist between the pixel capacitance electrode and the impurity region.
Claim 66
Dependent Claim
38 words
A method of producing an active matrix substrate according to claim 54, wherein a light-shielding layer is formed on the switching element so as to make an insulating layer exist between the light-shielding layer and the switching element.
Claim 67
Dependent Claim
31 words
A method of producing an active matrix substrate according to claim 60, wherein the light-shielding layer is comprised of a material selected from a group consisting of Ti, Ta and W.
Claim 68
Dependent Claim
26 words
A method of producing an active matrix substrate according to claim 60, wherein a pixel capacitance is formed between the light-shielding layer and the conductive member.
Claim 69
Dependent Claim
122 words
A display device comprising: an active matrix substrate comprising a substrate; a plurality of switching elements provided on said substrate; a plurality of conductive members comprised in a plurality of pixels, with each of said switching elements containing a silicon layer, and each of said conductive members being provided on said substrate and having a substantially even surface and being connected to said switching element; an opposite substrate comprising an electrode opposite to said pixels; a liquid crystal material held between said active matrix substrate and said opposite substrate; and insulating members each comprising silicon atoms provided at ends of their corresponding conductive members in such a manner that said insulating member ranges with the substantially even surface of said conductive member.
Claim 70
Dependent Claim
122 words
A display device comprising: an active matrix substrate comprising a substrate; a plurality of switching elements provided on said substrate; a plurality of conductive members comprised in a plurality of pixels, with each of said switching elements containing a silicon layer, and each of said conductive members being provided on said substrate and having a substantially even surface and being connected to said switching element; an opposite substrate comprising an electrode opposite to said pixels; a liquid crystal material held between said active matrix substrate and said opposite substrate; and insulating members each comprising silicon atoms provided at ends of their corresponding conductive members in such a manner that said insulating member ranges with the substantially even surface of said conductive member.
Claim 71
Dependent Claim
25 words
A display device according to claim 63, wherein a surface of said insulating member ranging with said end of said conductive member is substantially even.
Claim 72
Dependent Claim
23 words
A display device according to claim 64, wherein said even surfaces of said conductive and insulating members are smoothed by chemical mechanical polishing.
Claim 73
Dependent Claim
19 words
A display device according to claim 65, wherein the even surface of said conductive member comprises a specular surface.
Claim 74
Dependent Claim
21 words
A display device according to claim 63, wherein an insulating layer is located between said insulating member and said switching element.
Claim 75
Dependent Claim
16 words
A display device according to claim 63, wherein said insulating member is comprised of phospho-silicate glass.
Claim 76
Dependent Claim
24 words
A display device according to claim 67, wherein said insulating layer functions as an etching stopper when said insulating member is formed by patterning.
Claim 77
Dependent Claim
16 words
A display device according to claim 69, wherein said insulating layer is comprised of silicon nitride.
Claim 78
Dependent Claim
20 words
A display device according to claim 63, wherein said conductive member is comprised of a metal or compound of metal.
Claim 79
Dependent Claim
30 words
A display device according to claim 71, wherein said conductive member is comprised of a material selected from a group consisting of Al, Ti, Ta, W, and Indium Thin Oxide.
Claim 80
Dependent Claim
24 words
A display device according to claim 71, wherein said conductive member is formed so as to attain a thickness of 10,000 Å or more.
Claim 81
Dependent Claim
16 words
A display device according to claim 63, wherein said substrate is comprised of a semiconductor substrate.
Claim 82
Dependent Claim
16 words
A display device according to claim 74, wherein said semiconductor substrate is a single-crystal silicon substrate.
Claim 83
Dependent Claim
16 words
A display device according to claim 63, wherein said substrate is comprised of a transparent substrate.
Claim 84
Dependent Claim
17 words
A display device according to claim 76, wherein said transparent substrate is comprised of a quartz substrate.
Claim 85
Dependent Claim
16 words
A display device according to claim 63, wherein said switching element is comprised of a transistor.
Claim 86
Dependent Claim
17 words
A display device according to claim 78, wherein said transistor is formed by using a single-crystal silicon.
Claim 87
Dependent Claim
17 words
A display device according to claim 78, wherein said transistor is formed by using a polycrystal silicon.
Claim 88
Dependent Claim
45 words
A display device according to claim 75, wherein pixel capacitance is formed between an impurity region formed in said single-crystal silicon substrate and a pixel capacitance electrode formed so as to make an oxide film exist between the pixel capacitance electrode and said impurity region.
Claim 89
Dependent Claim
33 words
A display device according to claim 76, wherein a light-shielding layer is located on said switching element so as to make an insulating layer exist between the light-shielding layer and said switching element.
Claim 90
Dependent Claim
26 words
A display device according to claim 82, wherein said light-shielding layer is comprised of a material selected from a group consisting of Ti, Ta and W.
Claim 91
Dependent Claim
21 words
A display device according to claim 82, wherein a pixel capacitance is formed between said light-shielding layer and said conductive member.
Claim 92
Dependent Claim
18 words
A display device according to claim 63, wherein an orientation film is located on said active matrix substrate.
Claim 93
Dependent Claim
17 words
A display device according to claim 63, wherein a color filter is located on said opposite substrate.
Claim 94
Dependent Claim
17 words
A display device according to claim 63, wherein a black matrix is located on said opposite substrate.
Claim 95
Dependent Claim
21 words
A display device according to claim 63, wherein a spacer is located between said active matrix substrate and said opposite substrate.
Claim 96
Dependent Claim
17 words
A display device according to claim 63, which functions as a reflection type liquid crystal display device.
Claim 97
Dependent Claim
17 words
A display device according to claim 63, which functions as a transmission type liquid crystal display device.
Claim 98
Dependent Claim
42 words
A display device according to claim 75, wherein a side of said single-crystal silicon substrate opposite to the other side on which said conductive member has been located is partially removed by means of etching so that said substrate is partially transparentized.
Claim 99
Dependent Claim
17 words
A display device according to claim 91, which functions as a transmission type liquid crystal display device.
Claim 100
Independent Claim
153 words
A method of producing a display device comprising an active matrix substrate comprising a substrate, a plurality of switching elements provided on said substrate, and a plurality of conductive members comprised in a plurality of pixels, with each of the conductive members being provided on the substrate and having a substantially even surface and being connected to the switching element, an opposite substrate comprising an electrode opposite to the pixels, and a liquid crystal material held between the active matrix substrate and the opposite substrate, said method comprising the steps of: preparing a substrate; forming the switching elements on the substrate; forming an insulating layer on the switching elements; patterning the insulating layer to leave a separation region for the pixels between the pixels to be formed; forming a conductive material on the patterned insulating layer; and smoothing the surface of the conductive material by chemical mechanical polishing to obtain the conductive members.
Claim 101
Independent Claim
153 words
A method of producing a display device comprising an active matrix substrate comprising a substrate, a plurality of switching elements provided on said substrate, and a plurality of conductive members comprised in a plurality of pixels, with each of the conductive members being provided on the substrate and having a substantially even surface and being connected to the switching element, an opposite substrate comprising an electrode opposite to the pixels, and a liquid crystal material held between the active matrix substrate and the opposite substrate, said method comprising the steps of: preparing a substrate; forming the switching elements on the substrate; forming an insulating layer on the switching elements; patterning the insulating layer to leave a separation region for the pixels between the pixels to be formed; forming a conductive material on the patterned insulating layer; and smoothing the surface of the conductive material by chemical mechanical polishing to obtain the conductive members.
Claim 102
Dependent Claim
36 words
A method of producing a display device according to claim 93, wherein the surface of the conductive material and a surface of the separation region comprised of the insulating layer are smoothed by chemical mechanical polishing.
Claim 103
Dependent Claim
28 words
A method of producing a display device according to claim 93, wherein the even surface of the conductive member is treated so as to comprise a specular surface.
Claim 104
Dependent Claim
24 words
A method of producing a display device according to claim 93, wherein an insulating layer comprising silicon atoms is used as the insulating layer.
Claim 105
Dependent Claim
21 words
A method of producing a display device according to claim 96, wherein the insulating layer is formed by a layer-forming method.
Claim 106
Dependent Claim
20 words
A method of producing a display device according to claim 97, wherein phospho-silicate glass is used as the insulating layer.
Claim 107
Dependent Claim
35 words
A method of producing a display device according to claim 93, wherein prior to the formation of the insulating layer, a first insulating layer different from the insulating layer is formed on the switching element.
Claim 108
Dependent Claim
30 words
A method of producing a display device according to claim 99, wherein the first insulating layer is used as an etching stopper in the step of patterning the insulating layer.
Claim 109
Dependent Claim
21 words
A method of producing a display device according to claim 100, wherein silicon nitride is used as the first insulating layer.
Claim 110
Dependent Claim
23 words
A method of producing a display device according to claim 101, wherein the silicon nitride is formed into a layer by using plasma.
Claim 111
Dependent Claim
22 words
A method of producing a display device according to claim 100, wherein the patterning is comprised of a step of dry etching.
Claim 112
Dependent Claim
32 words
A method of producing a display device according to claim 93, wherein the chemical mechanical polishing is conducted using an abrasive capable of polishing and containing a chemical ingredient capable of etching.
Claim 113
Dependent Claim
21 words
A method of producing a display device according to claim 93, wherein the conductive material is formed by a layer-forming method.
Claim 114
Dependent Claim
26 words
A method of producing a display device according to claim 105, wherein a sputtering method or a vapor deposition method is used as the layer-forming method.
Claim 115
Dependent Claim
25 words
A method of producing a display device according to claim 93, wherein a metal or a compound of metal is used as the conductive material.
Claim 116
Dependent Claim
34 words
A method of producing a display device according to claim 107, wherein the conductive material is comprised of a material selected from a group consisting of Al, Ti, Ta, W, and Indium Thin Oxide.
Claim 117
Dependent Claim
31 words
A method of producing a display device according to claim 105, wherein the conductive material is formed into a layer so as to attain a thickness of 10,000 Å or more.
Claim 118
Dependent Claim
20 words
A method of producing a display device according to claim 93, wherein a semiconductor substrate is used as the substrate.
Claim 119
Dependent Claim
20 words
A method of producing a display device according to claim 110, wherein the semiconductor substrate is a single-crystal silicon substrate.
Claim 120
Dependent Claim
20 words
A method of producing a display device according to claim 93, wherein a transparent substrate is used as the substrate.
Claim 121
Dependent Claim
21 words
A method of producing a display device according to claim 112, wherein the transparent substrate is comprised of a quartz substrate.
Claim 122
Dependent Claim
20 words
A method of producing a display device according to claim 93, wherein the switching element is comprised of a transistor.
Claim 123
Dependent Claim
22 words
A method of producing a display device according to claim 114, wherein the transistor is formed by using a single crystal silicon.
Claim 124
Dependent Claim
21 words
A method of producing a display device according to claim 114, wherein the transistor is formed by using a polycrystal silicon.
Claim 125
Dependent Claim
55 words
A method of producing a display device according to claim 111, wherein an impurity region is formed in the single-crystal silicon substrate, and a pixel capacitance is formed between the impurity region and a pixel capacitance electrode formed so as to make an oxide film exist between the pixel capacitance electrode and the impurity region.
Claim 126
Dependent Claim
37 words
A method of producing a display device according to claim 112, wherein a light-shielding layer is formed on the switching element so as to make an insulating layer exist between the light-shielding layer and the switching element.
Claim 127
Dependent Claim
30 words
A method of producing a display device according to claim 118, wherein the light-shielding layer is comprised of a material selected from a group consisting of Ti, Ta and W.
Claim 128
Dependent Claim
25 words
A method of producing a display device according to claim 118, wherein a pixel capacitance is formed between the light-shielding layer and the conductive member.
Claim 129
Dependent Claim
22 words
A method of producing a display device according to claim 93, wherein an orientation film is located on the active matrix substrate.
Claim 130
Dependent Claim
21 words
A method of producing a display device according to claim 93, wherein a color filter is located on the opposite substrate.
Claim 131
Dependent Claim
21 words
A method of producing a display device according to claim 93, wherein a black matrix is located on the opposite substrate.
Claim 132
Dependent Claim
25 words
A method of producing a display device according to claim 93, wherein a spacer is located between the active matrix substrate and the opposite substrate.
Claim 133
Dependent Claim
53 words
A method of producing a display device according to claim 111, wherein after the liquid crystal material is located between the active matrix substrate and the opposite substrate, a side of the single-crystal silicon substrate opposite to the other side on which the conductive member has been located is partially removed by etching.
References Cited (Backward Citations)
US4024626A
Cited
JPH04115226A
Cited
US5244534A
Cited
EP0556822A2
Cited
JPH05303096A
Cited
US5209816A
Cited
US5394000A
Cited
US5537234A
Cited
GB2279797A
Cited
US5592318A
Cited
US5494857A
Cited
US5597223A
Cited
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| 3.5 Years (Year 4) | 2002-08-02 | 2003-02-01 | 2003-08-03 | $2000.00 | Window Closed / Lapsed |
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