Patent US5911104A successfully refreshed from Google Patents.
US5911104A
Expired / Lapsed
US
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Integrated circuit combining high frequency bipolar and high power CMOS transistors
Assignee: Texas Instruments Inc
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Filing: 1998-02-20
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Granted: 1999-06-08
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Expires: 2018-02-20
Abstract
Abstract A process flow which can be used to fabricate a high frequency bipolar transistor 147, a power transistor 146, and non-power MOS devices on a single substrate while maintaining superior performance. The process flow forms an initial high-voltage tank 170 in substrate 150. A thin epitaxial layer 156 is formed on the substrate which overlies the initial high voltage tank and Diffusion Under Film, DUF, region 154. The high voltage tank is extended through the epitaxial layer and power transistor 146 is formed in the high voltage tank and high frequency bipolar transistor 147 is formed in the epitaxial layer using the DUF region as a deep collector. Other types of low voltage devices 139 and 140 and mid voltage devices 141-145 and 148-149 are formed unaffected by the presence of epitaxial layer 156. A single chip transmitter 400 and a single chip receiver 410 is fabricated with high frequency transistors and power devices. A single chip disk controller 460 is fabricated with high frequency transistors and power devices.
Inventors
- 👤 Michael C. Smayling
- 👤 Ronald N. Parker
- 👤 Manuel L. Torreno, Jr., deceased
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 20:57
CPC Classifications
H; H10; H10B; H10B41/00; H10B41/40; H10B41/42
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
163 words
A method of fabricating a high voltage MOS device and a high frequency bipolar device in a semiconductor substrate, said method comprising the steps of: introducing a dopant of a second conductivity type into said substrate having a first conductivity type; diffusing said dopant to form an initial high-voltage tank; forming a thin epitaxial layer on an upper surface of said substrate such that said thin epitaxial layer overlies said tank, said epitaxial layer having the same conductivity type as said substrate; forming a high voltage tank extension by introducing a dopant of said second conductivity type into said epitaxial layer in a region directly above said initial high-voltage tank; forming a homogeneous high-voltage tank comprising said initial high-voltage tank and said high voltage tank extension by diffusing said tank extension, such that said homogeneous high voltage tank extends through said epitaxial layer and has an approximately uniform dopant distribution; and forming said high voltage MOS device in said homogeneous high voltage tank.
Claim 2
Independent Claim
163 words
A method of fabricating a high voltage MOS device and a high frequency bipolar device in a semiconductor substrate, said method comprising the steps of: introducing a dopant of a second conductivity type into said substrate having a first conductivity type; diffusing said dopant to form an initial high-voltage tank; forming a thin epitaxial layer on an upper surface of said substrate such that said thin epitaxial layer overlies said tank, said epitaxial layer having the same conductivity type as said substrate; forming a high voltage tank extension by introducing a dopant of said second conductivity type into said epitaxial layer in a region directly above said initial high-voltage tank; forming a homogeneous high-voltage tank comprising said initial high-voltage tank and said high voltage tank extension by diffusing said tank extension, such that said homogeneous high voltage tank extends through said epitaxial layer and has an approximately uniform dopant distribution; and forming said high voltage MOS device in said homogeneous high voltage tank.
Claim 3
Dependent Claim
83 words
The method of claim 1, further comprising: introducing a dopant of said second conductivity type into said substrate to form a Diffusion Under Film, DUF, region of good conductivity such that said DUF region is between said substrate and said thin epitaxial layer; and forming said high frequency bipolar device in said thin epitaxial layer in conjunction with said DUF region, in a manner that the high frequency characteristics of said bipolar device are enhanced by the thinness of said thin epitaxial layer.
Claim 4
Dependent Claim
110 words
The method of claim 1, wherein the step of forming a high voltage MOS device further comprises: introducing dopants of said first conductivity type and said second conductivity type in a region in said homogeneous high-voltage tank; diffusing said dopants of said first and said second conductivity type to form a second region within a third region, both within said homogeneous high-voltage tank, due to the different rates of diffusion of said dopants; forming a gate structure which overlaps said third region; forming a thick field oxide in said homogeneous high voltage tank; and forming a drain region in said homogeneous high voltage tank adjacent to said thick field oxide.
Claim 5
Dependent Claim
79 words
The method of claim 2, wherein the step of forming a high frequency device further comprises: introducing a dopant of said second conductivity type into said thin epitaxial layer to form a collector region that extends through said thin epitaxial layer and connects to said DUF region; forming an emitter region and a base region in said collector region; and forming a contact region of good conductivity through said thin epitaxial layer, said contact region connecting to said DUF.
Claim 6
Dependent Claim
12 words
The method of claim 1, wherein said first conductivity type is p-type.
Claim 7
Dependent Claim
12 words
The method of claim 5, wherein said second conductivity type is n-type.
Claim 8
Dependent Claim
20 words
The method of claim 6, wherein the introduction of dopants occurs by implanting an n-type dopant and a p-type dopant.
Claim 9
Dependent Claim
17 words
The method of claim 1, wherein said thin epitaxial layer is less than approximately 1.75 microns thick.
Claim 10
Dependent Claim
23 words
The method of claim 2, in which said high frequency bipolar transistor has an operating frequency that is greater than about 1 gigahertz.
Claim 11
Dependent Claim
29 words
The method of claim 1, in which said high voltage MOS transistor operates in a voltage range that is selected to be between approximately 30 volts to 60 volts.
Claim 12
Dependent Claim
56 words
The method of claim 2, further comprising: forming a third device in said thin epitaxial layer, said third device type is selected from the group consisting of: a) a sub micron CMOS device, b) an EEPROM device, c) an EPROM device, d) a high voltage CMOS device, e) a tunneling diode, and f) a Schottky diode.
Claim 13
Dependent Claim
31 words
The method of claim 1 wherein the step of forming a thin epitaxial layer forms a thin epitaxial layer having approximately a same crystal orientation and impurity concentration as said substrate.
Claim 14
Independent Claim
268 words
A method of fabricating an integrated circuit, comprising the steps of: forming an initial high-voltage tank in a semiconductive substrate; forming a thin epitaxial layer on top of said substrate and overlying said initial high-voltage tank, said epitaxial layer having approximately a same crystal orientation and impurity concentration as said substrate, wherein said substrate has a first conductivity type, said epitaxial layer has said first conductivity type, said initial high voltage tank has a second conductivity type; forming a tank extension having said second conductivity type in said epitaxial layer directly above said initial high voltage tank and in contact with said initial high voltage tank, so that a homogeneous high voltage tank is formed; forming a high frequency bipolar transistor, having an emitter, a base, and a collector in said thin epitaxial layer; forming a high voltage MOS transistor in said homogeneous high-voltage tank; wherein the step of forming a high voltage MOS transistor further comprises the steps of: forming a D-well in said homogenous high voltage tank, said D-well having a backgate region of said first conductivity type and a source region formed within said backgate region of said second conductivity type; forming a gate structure above a portion of said D-well and overlying said backgate region, said gate structure comprising a conductive gate and a gate insulation layer between said gate and said D-well; forming a thick field oxide in said homogenous high voltage tank; and forming a drain region of said second conductivity type in said homogenous high voltage tank, said thick field oxide being interposed between said drain region and said gate structure.
Claim 15
Independent Claim
268 words
A method of fabricating an integrated circuit, comprising the steps of: forming an initial high-voltage tank in a semiconductive substrate; forming a thin epitaxial layer on top of said substrate and overlying said initial high-voltage tank, said epitaxial layer having approximately a same crystal orientation and impurity concentration as said substrate, wherein said substrate has a first conductivity type, said epitaxial layer has said first conductivity type, said initial high voltage tank has a second conductivity type; forming a tank extension having said second conductivity type in said epitaxial layer directly above said initial high voltage tank and in contact with said initial high voltage tank, so that a homogeneous high voltage tank is formed; forming a high frequency bipolar transistor, having an emitter, a base, and a collector in said thin epitaxial layer; forming a high voltage MOS transistor in said homogeneous high-voltage tank; wherein the step of forming a high voltage MOS transistor further comprises the steps of: forming a D-well in said homogenous high voltage tank, said D-well having a backgate region of said first conductivity type and a source region formed within said backgate region of said second conductivity type; forming a gate structure above a portion of said D-well and overlying said backgate region, said gate structure comprising a conductive gate and a gate insulation layer between said gate and said D-well; forming a thick field oxide in said homogenous high voltage tank; and forming a drain region of said second conductivity type in said homogenous high voltage tank, said thick field oxide being interposed between said drain region and said gate structure.
Claim 16
Dependent Claim
28 words
The method of claim 13, in which the step of forming a thin epitaxial layer forms a thin epitaxial layer which is less than approximately 1.75 microns thick.
Claim 17
Dependent Claim
23 words
The method of claim 13, in which said high frequency bipolar transistor has an operating frequency that is greater than about 1 gigahertz.
Claim 18
Dependent Claim
69 words
The method of claim 13, comprising the steps of: forming a Diffusion Under Film, DUF, region in said substrate adjacent to said epitaxial layer, said DUF region being directly below said high frequency transistor and connected to said collector; and forming means for contacting said DUF region so that an electrical path having a low impedance is formed from said collector to an upper surface of said epitaxial layer.
Claim 19
Dependent Claim
77 words
The method of claim 16, wherein the step of forming a high frequency bipolar transistor further comprises the steps of: forming a region of said second conductivity type for said collector in said epitaxial layer such that said collector region overlies said DUF region and is in contact with said DUF region; forming said base of said first conductivity type within said collector region; and forming said emitter of said second conductivity type within said base region.
Claim 20
Dependent Claim
40 words
The method of claim 13, in which the step of forming a high voltage MOS transistor forms said high voltage MOS transistor which operates in a voltage range that is selected to be between approximately 30 volts to 60 volts.
Claim 21
Dependent Claim
58 words
The method of claim 13, further comprising the step of forming a third device in said epitaxial layer, said third device type is selected from the group consisting of: a) a sub micron CMOS device, b) an EEPROM device, c) an EPROM device, d) a high voltage CMOS device, e) a tunneling diode, and f) a Schottky diode.
References Cited (Backward Citations)
US4705759A
Cited
US4705759B1
Cited
US4546370A
Cited
US4914047A
Cited
US5047358A
Cited
US5045902A
Cited
US5179036A
Cited
GB2257296A
Cited
US5242841A
Cited
US5348895A
Cited
US5491105A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-06-07 | 2002-12-07 | 2003-06-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-06-07 | 2006-12-07 | 2007-06-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-06-07 | 2010-12-07 | 2011-06-08 | $7700.00 | Window Closed / Lapsed |