Patent US5876808A successfully refreshed from Google Patents.
US5876808A
Expired / Lapsed
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Plasma enhanced OMCVD of thin film coating for polymeric fibers
Assignee: Los Alamos National Security LLC
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Filing: 1997-03-13
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Granted: 1999-03-02
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Expires: 2017-03-13
Abstract
Abstract A plasma enhanced chemical vapor deposition process for depositing a titanium nitride film on a polymeric substrate is provided, the process including placing the polymeric substrate within a chemical vapor deposition chamber evacuated to a pressure within a range of from about 0.1 Torr to about 10 Torr, heating the polymeric substrate to a temperature within a range of from about 150 DEG C. to about 250 DEG C., introducing a vaporized organometallic compound and ammonia gas into the chamber, generating a plasma within the chamber, and, maintaining the polymeric substrate within the chamber for a time sufficient for a layer of titanium nitride to deposit upon the polymeric substrate.
Inventors
- 👤 Lauren A. Hall
- 👤 David J. Devlin
- 👤 David C. Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:49
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/34; D; D06; D06M; D06M10/00; D06M10/02; D06M10/025; D06M10/04; D06M10/06; D06M10/08; D06M11/00; D06M11/58
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
108 words
A plasma enhanced chemical vapor deposition process for depositing a titanium nitride film on a liquid crystalline polymeric fiber, said process comprising: placing said polymeric fiber within a chemical vapor deposition chamber evacuated to a pressure within a range of from about 0.1 Torr to about 10 Torr; heating said polymeric fiber to a temperature within a range of from about 150° C. to about 250° C.; introducing a vaporized organometallic compound and ammonia gas into said chamber; generating a plasma within said chamber; and, maintaining said polymeric fiber within said chamber for a time sufficient for a layer of titanium nitride to deposit upon said polymeric fiber.
Claim 2
Dependent Claim
108 words
A plasma enhanced chemical vapor deposition process for depositing a titanium nitride film on a liquid crystalline polymeric fiber, said process comprising: placing said polymeric fiber within a chemical vapor deposition chamber evacuated to a pressure within a range of from about 0.1 Torr to about 10 Torr; heating said polymeric fiber to a temperature within a range of from about 150° C. to about 250° C.; introducing a vaporized organometallic compound and ammonia gas into said chamber; generating a plasma within said chamber; and, maintaining said polymeric fiber within said chamber for a time sufficient for a layer of titanium nitride to deposit upon said polymeric fiber.
Claim 3
Dependent Claim
13 words
The process of claim 1 wherein said polymeric fiber is a polyaramid fiber.
Claim 4
Dependent Claim
14 words
The process of claim 1 wherein said organometallic compound is a tetrakis (dialkylamido) titanium.
Claim 5
Dependent Claim
14 words
The process of claim 1 wherein said organometallic compound is a tetrakis (dimethylamido) titanium.
Claim 6
Dependent Claim
14 words
The process of claim 1 wherein said plasma is generated by a microwave discharge.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-01 | 2002-08-31 | 2003-03-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-01 | 2006-08-31 | 2007-03-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-01 | 2010-08-31 | 2011-03-02 | $7700.00 | Window Closed / Lapsed |