US5811211A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Peripheral edge exposure method
Assignee: Nikon Corp
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Filing: 1996-08-01
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Granted: 1998-09-22
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Expires: 2016-08-01
Abstract
Abstract A photosensitive substrate is exposed with both a peripheral edge exposure apparatus which exposes the peripheral portion of the photosensitive substrate in a specified exposure width and a pattern exposure apparatus which transfers a scale pattern to the photosensitive substrate so that a dimension from the outer periphery of the photosensitive substrate is known. The accuracy (offset quantity) of the exposure width of the peripheral edge exposure apparatus is evaluated by reading out the resist image of the scale pattern which appears on the substrate after development.
Inventors
- 👤 Shouji Tanaka
- 👤 Masao Nakajima
- 👤 Toshichika Toma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 21:05
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70066; G03F7/20; G03F7/2022
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
90 words
A method of exposing, in a predetermined width, a peripheral region of a substrate having a sensitive layer, comprising the steps of: transferring an image of a scale pattern to the sensitive layer of the peripheral region of the substrate to provide a dimension for the peripheral region of said substrate; and exposing the sensitive layer in the peripheral region of said substrate in the predetermined width without exposing a part of the image of the scale pattern transferred to the sensitive layer in the peripheral region of said substrate.
Claim 2
Independent Claim
90 words
A method of exposing, in a predetermined width, a peripheral region of a substrate having a sensitive layer, comprising the steps of: transferring an image of a scale pattern to the sensitive layer of the peripheral region of the substrate to provide a dimension for the peripheral region of said substrate; and exposing the sensitive layer in the peripheral region of said substrate in the predetermined width without exposing a part of the image of the scale pattern transferred to the sensitive layer in the peripheral region of said substrate.
Claim 3
Dependent Claim
39 words
The method as set forth in claim 1, wherein said steps of transferring and exposing, respectively transfers the image of the scale pattern onto, and exposes the peripheral region along a circumference of the substrate which is substantially circular.
Claim 4
Dependent Claim
38 words
The method as set forth in claim 1, wherein said steps of transferring and exposing, respectively transfers the image of the scale pattern onto, and exposes the peripheral region on opposite edges of the substrate which is rectangular.
Claim 5
Independent Claim
94 words
A method of exposing, in a predetermined width, a peripheral region of a substrate having a sensitive layer, comprising the steps of: setting a plurality of separate exposure regions on the peripheral region of the substrate; exposing the sensitive layer in the plurality of separate exposure regions using different target exposure quantities; developing the plurality of separate exposure regions which have been exposed; and inspecting the sensitive layer at the separate exposure regions of the substrate for a remaining resist film to identify an appropriate exposure quantity based on the different target exposure quantities.
Claim 6
Independent Claim
94 words
A method of exposing, in a predetermined width, a peripheral region of a substrate having a sensitive layer, comprising the steps of: setting a plurality of separate exposure regions on the peripheral region of the substrate; exposing the sensitive layer in the plurality of separate exposure regions using different target exposure quantities; developing the plurality of separate exposure regions which have been exposed; and inspecting the sensitive layer at the separate exposure regions of the substrate for a remaining resist film to identify an appropriate exposure quantity based on the different target exposure quantities.
Claim 7
Dependent Claim
48 words
The method as set forth in claim 4, wherein said step of inspecting identifies the appropriate exposure quantity to be a value which is the product of a minimum target exposure quantity, where the remaining resist film of the sensitive layer becomes near zero, and a predetermined value.
Claim 8
Dependent Claim
28 words
The method as set forth in claim 4, wherein said step of setting sets the separate exposure regions along a circumference of the substrate which is substantially circular.
Claim 9
Dependent Claim
28 words
The method as set forth in claim 4, wherein said step of setting sets the separate exposure regions on two opposite edges of the substrate which is rectangular.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-09-21 | 2002-03-23 | 2002-09-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-09-21 | 2006-03-23 | 2006-09-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-09-21 | 2010-03-23 | 2010-09-22 | $7700.00 | Window Closed / Lapsed |