Abstract In an exposure method of the present invention, exposure light is radiated onto a peripheral portion of a substrate to be processed while the substrate is rotated, and the rotational speed of the substrate is selectively decreased when a specific peripheral portion reaches an exposure area, thereby performing predetermined exposure of the substrate. An exposure apparatus of the present invention includes a mounting table on which the substrate is mounted, a rotating mechanism for rotating the mounting table at a predetermined rotational speed, a light radiating element arranged to oppose a mounting surface of the mounting table, light amount control means for controlling the amount of light radiated from the light radiating element onto the substrate, and rotational speed control means for controlling the rotational speed of the mounting table in accordance with the radiation amount of light from the light radiating element.
Inventors
👤 Mamoru Sugita
Bibliographic Details
Application Number—
JurisdictionUS
Data Sourcegoogle_patents
Last Synchronized2026-11-02 22:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
111 words
An exposure apparatus comprising: a mounting table on which a substrate to be processed is mounted; a rotating mechanism for rotating said mounting table at a predetermined rotational speed; a light radiating element arranged to oppose a mounting surface of said mounting table; light amount control means for controlling an amount of light radiated from said light radiating element onto the substrate; a movable mechanism for reciprocating said light radiating element along an imaginary straight line extending through a center of the mounting surface; and rotational speed control means for controlling a rotational speed of said mounting table in accordance with a radiation amount of light from said light radiating element.
Claim 2
Dependent Claim
111 words
An exposure apparatus comprising: a mounting table on which a substrate to be processed is mounted; a rotating mechanism for rotating said mounting table at a predetermined rotational speed; a light radiating element arranged to oppose a mounting surface of said mounting table; light amount control means for controlling an amount of light radiated from said light radiating element onto the substrate; a movable mechanism for reciprocating said light radiating element along an imaginary straight line extending through a center of the mounting surface; and rotational speed control means for controlling a rotational speed of said mounting table in accordance with a radiation amount of light from said light radiating element.
Claim 3
Dependent Claim
30 words
An apparatus according to claim 1, wherein said movable mechanism is operated in response to a signal from end face detecting means for detecting a peripheral end of the substrate.
Claim 4
Dependent Claim
15 words
An apparatus according to claim 3, wherein said end face detecting means comprises a photosensor.
Claim 5
Dependent Claim
14 words
An apparatus according to claim 3, wherein said photosensor is a solid-state imaging element.