Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure

Claim 2

An exposure apparatus for producing devices, in which an original pattern is projected onto an object to be exposed, through a projection optical system, said exposure apparatus comprising: at least one optical element included in said projection optical system, the optical characteristics of each of the optical elements having been tested using a measuring beam having a first wavelength region, the optical elements having lower reflectance in a second wavelength region, selected independently of the first wavelength region, lower than in the first wavelength region; and an exposure light source for emitting a light beam, having the second wavelength region, to irradiate the original pattern with the beam from said exposure light source, so that an image pattern is projected onto the object, through the at least one optical element, thereby exposing the object to produce the device.

Claim 3

An exposure apparatus according to claim 1, further comprising an alignment light source for emitting a light beam, having a third wavelength region selected independently of the first wavelength, to irradiate the object with the beam from said alignment light source, wherein a beam returned from the object is detected through said projection optical system, for measuring the position of the body.

Claim 4

An exposure apparatus according to claim 2, wherein the first wavelength region is between the second and the third wavelength regions.

Claim 5

An exposure apparatus according to claim 2, wherein each of said at least one optical elements include low reflectance layers, said layers have such characteristics that the reflectance of the first wavelength region is higher than that of either of the second and third wavelength regions.

Claim 6

An exposure apparatus according to claim 3, wherein, in said low reflectance layers, the reflectance of the first wavelength region is not less than 2% and the reflectance of either of the second and third wavelength regions is not more than 1%.

Claim 7

An exposure apparatus according to claim 2, wherein the second wavelength region is in one of a range of g-line and a range of i-line.

Claim 8

An exposure apparatus according to claim 2, wherein said exposure light source comprises one of a krypton-fluorine excimer laser and an argon-fluorine excimer laser.

Claim 9

An exposure apparatus according to claim 2, wherein the third wavelength region is in one of a helium-neon laser wavelength region and a wavelength region in the neighborhood of 610 nm.

Claim 10

An exposure apparatus according to claim 2, wherein the measuring beam has a wavelength region of a laser beam oscillating at a single frequency.

Claim 11

An exposure apparatus according to claim 9, wherein the laser oscillating at the single frequency comprises one of an argon laser and a yttrium-aluminum-garnet-double-wave laser.

Claim 14

A method according to claim 11, wherein the first wavelength region is between the second and third wavelength regions.

Claim 15

A method according to claim 11, wherein each of the at least one optical elements include low reflectance layers, the layers having such characteristics that the reflectance of the first wavelength region is higher than that of either of the second and third wavelength regions.

Claim 16

A method according to claim 13, wherein, in the low reflectance layers, the reflectance of the first wavelength region is not less than 2% and the reflectance of either of the second and third wavelength regions is not more than 1%.

Claim 17

A method according to claim 11, wherein the second wavelength region is in a range of one of g-line and i-line.

Claim 18

A method according to claim 11, wherein said projecting step comprises projecting a light beam from one of a krypton-fluorine excimer laser and an argon-fluorine excimer laser.

Claim 19

A method according to claim 11, wherein the third wavelength region is in one of a helium-neon laser wavelength region and a wavelength region in the neighborhood of 610 nm.

Claim 20

A method according to claim 11, wherein the measuring beam has a wavelength region of a laser beam oscillating at a single frequency.

Claim 21

A method according to claim 18, wherein the laser oscillating at the single frequency comprises one of an argon laser and a yttrium-aluminum-garnet-double-wave laser.

Claim 22

An exposure apparatus for producing devices, in which an original pattern is projected onto an object to be exposed, through a projection optical system, said exposure apparatus comprising: a plurality of optical elements included in said projection optical system, the optical characteristics of each of the optical elements having been tested using a measuring beam having a first wavelength region, the optical elements having lower reflectance in a second wavelength region, selected independently of the first wavelength region, lower than in the first wavelength region; and an exposure light source for emitting a light beam, having the second wavelength region, to irradiate the original pattern with the beam from said exposure light source, so that an image pattern is projected onto the object, through the optical elements, thereby exposing the object to produce the device.

Claim 23

An exposure apparatus for producing devices, in which an original pattern is projected onto an object to be exposed, through a projection optical system, said exposure apparatus comprising: a plurality of optical elements included in said projection optical system, the optical characteristics of each of the optical elements having been tested using a measuring beam having a first wavelength region, the optical elements having lower reflectance in a second wavelength region, selected independently of the first wavelength region, lower than in the first wavelength region; and an exposure light source for emitting a light beam, having the second wavelength region, to irradiate the original pattern with the beam from said exposure light source, so that an image pattern is projected onto the object, through the optical elements, thereby exposing the object to produce the device.

Claim 26

An exposure apparatus for producing devices, in which an original pattern is projected onto an object to be exposed, through a projection optical system, said exposure apparatus comprising: a plurality of optical elements included in said projection optical system, each optical element including a layer having a higher transmittance and lower reflectance in each of a second wavelength region and a third wavelength region than in a first wavelength region, the first wavelength region being longer than the second wavelength region and shorter than the third wavelength region, the optical characteristics of each optical element having been tested using a measuring beam having the first wavelength region; an exposure light source for emitting a light beam having the second wavelength region to irradiate the original pattern with the beam from said exposure light source, so that an image of the pattern is projected onto the object through the plurality of optical elements, thereby exposing the object to produce the device; and an alignment light source for emitting a light beam having the third wavelength region to irradiate the object with the beam from said alignment light source, the position of the object being detected as the light beam is returned from the object through said projection optical system.

Claim 27

An exposure apparatus for producing devices, in which an original pattern is projected onto an object to be exposed, through a projection optical system, said exposure apparatus comprising: a plurality of optical elements included in said projection optical system, each optical element including a layer having a higher transmittance and lower reflectance in each of a second wavelength region and a third wavelength region than in a first wavelength region, the first wavelength region being longer than the second wavelength region and shorter than the third wavelength region, the optical characteristics of each optical element having been tested using a measuring beam having the first wavelength region; an exposure light source for emitting a light beam having the second wavelength region to irradiate the original pattern with the beam from said exposure light source, so that an image of the pattern is projected onto the object through the plurality of optical elements, thereby exposing the object to produce the device; and an alignment light source for emitting a light beam having the third wavelength region to irradiate the object with the beam from said alignment light source, the position of the object being detected as the light beam is returned from the object through said projection optical system.