US5138176A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection optical apparatus using plural wavelengths of light
Assignee: Nikon Corp
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Filing: 1991-06-06
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Granted: 1992-08-11
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Expires: 2011-06-06
Abstract
Abstract A projection optical apparatus comprising a projection optical system for projectively focusing a pattern image of a mask under illumination by light of first wavelength onto a sensitive substrate, a stage holding the sensitive substrate, a fiducial plate disposed on the stage, a first mark detector for illuminating light of second wavelength different from the first wavelength, through a first mark area formed on the mask and the projection optical system, onto the sensitive substrate or a second mark area formed on the fiducial plate, then detecting optical information produced from the second mark area, a fourth mark area formed on the sensitive substrate or the fiducial plate and arranged in a predetermined positional relationship relative to the second mark area, a third mark area formed on the mask and arranged in a predetermined positional relationship relative to the first mark area, a second mark detector for illuminating the light of first wavelength onto the fourth mark area through the third mark area and the projection optical system, and then detecting optical information produced from the fourth mark area, under a condition that the first mark detector is detecting the optical information produced from the second mark area, and an error detector for detecting detection errors due to a distortion at respective positions in the view field of the projection optical system where the first mark area and the second mark area are present, based on the detected results by the first mark detector and the second mark detector.
Inventors
- 👤 Kenji Nishi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 04:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70591; G03F7/706; G02; G02B; G02B6/00; G02B6/24; G02B6/42; G02B6/4201; G02B6/4219; G02B6/422; G02B6/4221; G02B6/4224; G03F7/70605; G03F7/70616; G03F7/70633; G03F9/00; G03F9/70; G03F9/7049
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
260 words
A projection optical apparatus comprising: a projection optical system for projectively focusing a pattern image of a mask under illumination by a light of first wavelength characteristic onto a sensitive substrate, a stage for holding said sensitive substrate, a fiducial plate disposed on said stage, first mark detection means for illuminating a light of second wavelength characteristic different from said first wavelength characteristic, through a first mark area formed on said mask and said projection optical system, onto said sensitive substrate or a second mark area formed on said fiducial plate, and then detecting optical information produced from said second mark area, a fourth mark area formed on said sensitive substrate or said fiducial plate and arranged in a predetermined positional relationship relative to said second mark area, a third mark area formed on said mask and arranged in a predetermined positional relationship relative to said first mark area, second mark detection means for illuminating said light of first wavelength characteristic onto said fourth mark area through said third mark area and said projection optical system, and then detecting optical information produced from said fourth mark area, under a condition that said first mark detection means is detecting the optical information produced from said second mark area, and error detection means for detecting detection errors due to a distortion at respective positions in the view field of said projection optical system where said first mark area and said second mark area are present, based on the detected results by said first mark detection means and said second mark detection means.
Claim 2
Dependent Claim
260 words
A projection optical apparatus comprising: a projection optical system for projectively focusing a pattern image of a mask under illumination by a light of first wavelength characteristic onto a sensitive substrate, a stage for holding said sensitive substrate, a fiducial plate disposed on said stage, first mark detection means for illuminating a light of second wavelength characteristic different from said first wavelength characteristic, through a first mark area formed on said mask and said projection optical system, onto said sensitive substrate or a second mark area formed on said fiducial plate, and then detecting optical information produced from said second mark area, a fourth mark area formed on said sensitive substrate or said fiducial plate and arranged in a predetermined positional relationship relative to said second mark area, a third mark area formed on said mask and arranged in a predetermined positional relationship relative to said first mark area, second mark detection means for illuminating said light of first wavelength characteristic onto said fourth mark area through said third mark area and said projection optical system, and then detecting optical information produced from said fourth mark area, under a condition that said first mark detection means is detecting the optical information produced from said second mark area, and error detection means for detecting detection errors due to a distortion at respective positions in the view field of said projection optical system where said first mark area and said second mark area are present, based on the detected results by said first mark detection means and said second mark detection means.
Claim 3
Dependent Claim
55 words
A projection optical apparatus according to claim 1, wherein: said first mark detection means has a first object lens system movable depending on position change of said first mark area on said mask, and the uniform mark pattern is formed in said second mark area over a movable range of said first object lens system.
Claim 4
Dependent Claim
185 words
A projection optical apparatus comprising: a projection optical system disposed between first and second planes such that said first and second planes are optically conjugate to each other under a first wavelength characteristic, alignment mark means including first and second mark means disposed on said first plane with a predetermined positional relationship therebetween, and third and fourth mark means disposed on said second plane with a predetermined positional relationship therebetween; first mark detection means for illuminating a light of second wavelength characteristic different from said first wavelength characteristic onto said second mark means through said first mark means and said projection optical system, and then detecting first optical information produced from said second mark means, second mark detection means for illuminating said light of first wavelength characteristic onto said fourth mark means through said third mark means and said projection optical system, and then detecting second optical information produced from said fourth mark means, and means for creating information of alignment errors developed between said first and second planes in the directions enough to define a plane, based on said first and second optical information.
Claim 5
Dependent Claim
185 words
A projection optical apparatus comprising: a projection optical system disposed between first and second planes such that said first and second planes are optically conjugate to each other under a first wavelength characteristic, alignment mark means including first and second mark means disposed on said first plane with a predetermined positional relationship therebetween, and third and fourth mark means disposed on said second plane with a predetermined positional relationship therebetween; first mark detection means for illuminating a light of second wavelength characteristic different from said first wavelength characteristic onto said second mark means through said first mark means and said projection optical system, and then detecting first optical information produced from said second mark means, second mark detection means for illuminating said light of first wavelength characteristic onto said fourth mark means through said third mark means and said projection optical system, and then detecting second optical information produced from said fourth mark means, and means for creating information of alignment errors developed between said first and second planes in the directions enough to define a plane, based on said first and second optical information.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-08-11 | 1996-02-10 | 1996-08-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-08-11 | 2000-02-10 | 2000-08-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-08-11 | 2004-02-10 | 2004-08-11 | $7700.00 | Window Closed / Lapsed |