US5381210A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposing apparatus
Assignee: Nikon Corp
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Filing: 1993-12-03
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Granted: 1995-01-10
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Expires: 2013-12-03
Abstract
Abstract An exposing apparatus which has an alignment apparatus for detecting the relative positional relation between a mask having a pattern for transfer formed thereon and a photosensitive substrate having an alignment mark thereon by applying alignment light to the alignment mark and which exposes the photosensitive substrate to exposure light transmitted through the pattern for transfer, through a projection optical system includes an alignment optical system for causing the alignment light to pass at least once through the projection optical system, the alignment light being of a wavelength in the vicinity of three times the wavelength of the exposure light.
Inventors
- 👤 Shigeru Hagiwara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 01:01
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
101 words
An exposing apparatus which has an alignment apparatus for detecting the relative positional relation between a mask having a pattern for transfer formed thereon and a photosensitive substrate having an alignment mark thereon by applying alignment light to said alignment mark and which exposes said photosensitive substrate to exposure light transmitted through said pattern for transfer, through a projection optical system, including: (a) an alignment optical system for causing said alignment light to pass at least once through said projection optical system; said alignment light being of a wavelength in the vicinity of three times the wavelength of said exposure light.
Claim 2
Dependent Claim
101 words
An exposing apparatus which has an alignment apparatus for detecting the relative positional relation between a mask having a pattern for transfer formed thereon and a photosensitive substrate having an alignment mark thereon by applying alignment light to said alignment mark and which exposes said photosensitive substrate to exposure light transmitted through said pattern for transfer, through a projection optical system, including: (a) an alignment optical system for causing said alignment light to pass at least once through said projection optical system; said alignment light being of a wavelength in the vicinity of three times the wavelength of said exposure light.
Claim 3
Dependent Claim
36 words
An exposing apparatus according to claim 1, wherein antireflection coating is formed on said projection optical system, and said antireflection coating has substantially equal antireflection effects for both of said exposure light and said alignment light.
Claim 4
Dependent Claim
41 words
An exposing apparatus according to claim 1, further comprising a correction optical system disposed between said mask and said photosensitive substrate for correcting on-axis chromatic aberration and/or chromatic difference of magnification created for said alignment light by said projection optical system.
Claim 5
Dependent Claim
34 words
An exposing apparatus according to claim 1, wherein said exposure light is KrF excimer laser of wavelength 248.4 nm, and said alignment light has its wavelength set to 745.2 nm by a tunable laser.
Claim 6
Dependent Claim
43 words
An exposing apparatus according to claim 1, wherein continuous spectral light having its wavelength narrowed within the range of width of ±50 nm about a wavelength three times as long as the wavelength of said exposure light is used as said alignment light.
Claim 7
Dependent Claim
31 words
An exposing apparatus according to claim 5, wherein said exposure light is KrF excimer laser of wavelength 248.4 nm, and said alignment light is a semiconductor laser of wavelength 750 nm.
Claim 8
Dependent Claim
40 words
An exposing apparatus according to claim 1, wherein a plurality of discrete spectral lights each having a wavelength within the range of width of ±50 nm about a wavelength three times as long as the wavelength of said exposure light.
Claim 9
Dependent Claim
44 words
An exposing apparatus according to claim 7, wherein said exposure light is KrF excimer laser of wavelength 248.4 nm, and said alignment light is from a halogen lamp as a light source and has its wavelength set to 745.2±50 nm by an interference filter.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-09 | 1998-07-11 | 1999-01-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-09 | 2002-07-11 | 2003-01-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-09 | 2006-07-11 | 2007-01-10 | $7700.00 | Window Closed / Lapsed |