US4812880A
Expired / Lapsed
US
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Exposure apparatus
Assignee: Panasonic Holdings Corp
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Filing: 1987-06-29
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Granted: 1989-03-14
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Expires: 2007-06-29
Abstract
Abstract Disclosed is an exposure apparatus used in photolithographic process in fabrication of semiconductor devices. More particularly, in an exposure apparatus using an excimer laser, the TTL alignment is achieved by using light with wavelengths of 300 to 400 nm, different from that of excimer laser for exposure, for the purpose of alignment.
Inventors
- 👤 Kazufumi Ogawa
- 👤 Masaru Sasago
- 👤 Masayuki Endo
- 👤 Takeshi Ishihara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 16:06
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F7/00; G03F7/20; G03F7/2002; G03F7/2004; G03F7/2006
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
141 words
An exposure apparatus for fabricating a semiconductor device from a wafer, said apparatus comprising: an XY wafer stage for supporting the wafer; an excimer laser means for emitting excimer laser light that travels along an optical path extending to the wafer supported on said stage whereby the wafer is exposed to the excimer laser light; a reticle stage for supporting a reticle in said optical path between said excimer laser means and the wafer; a reduction-projective lens disposed in said optical path and through which the excimer laser light passes before passing to the wafer; and an alignment optical system for facilitating an alignment of the reticle with the wafer, said alignment optical system including an alignment light source emitting alignment light having a wavelength of 300 nm˜400 nm that travels along an optical path through the reticle to the wafer.
Claim 2
Dependent Claim
141 words
An exposure apparatus for fabricating a semiconductor device from a wafer, said apparatus comprising: an XY wafer stage for supporting the wafer; an excimer laser means for emitting excimer laser light that travels along an optical path extending to the wafer supported on said stage whereby the wafer is exposed to the excimer laser light; a reticle stage for supporting a reticle in said optical path between said excimer laser means and the wafer; a reduction-projective lens disposed in said optical path and through which the excimer laser light passes before passing to the wafer; and an alignment optical system for facilitating an alignment of the reticle with the wafer, said alignment optical system including an alignment light source emitting alignment light having a wavelength of 300 nm˜400 nm that travels along an optical path through the reticle to the wafer.
Claim 3
Dependent Claim
34 words
An exposure apparatus as claimed in claim 1, wherein said alignment light source comprises a superhigh pressure mercury lamp and the alignment light is the i-line or j-line of light emitted by said lamp.
Claim 4
Dependent Claim
21 words
An exposure apparatus as claimed in claim 1, wherein said alignment light source comprises an HeCd laser emitting HeCd laser light.
Claim 5
Dependent Claim
37 words
An exposure apparatus as claimed in claim 1, wherein the optical path along which the excimer laser light travels to the wafer is offset from the optical path along which the alignment light travels to the wafer.
Claim 6
Dependent Claim
159 words
A reduction-projective exposure apparatus for fabricating semiconductor devices, said apparatus comprising: an XY wafer stage; a wafer from which a semiconductor device is fabricated supported by said XY wafer stage; an excimer exposure light source for emitting excimer light that travels along an optical path extending to said wafer supported on said XY wafer stage whereby an exposure process occurs in which said wafer is exposed to the excimer light; a reticle stage; a reticle supported by said reticle stage in said optical path between said excimer light source and said wafer; a reduction-projective lens disposed in said optical path and through which the excimer light passes before passing to said wafer; and an alignment optical system for facilitating an alignment of said reticle with said wafer; said alignment optical system including an alignment light source emitting alignment light having a wavelength of 300 nm˜400 nm that travels along an optical path through said reticle and to said wafer.
Claim 7
Dependent Claim
159 words
A reduction-projective exposure apparatus for fabricating semiconductor devices, said apparatus comprising: an XY wafer stage; a wafer from which a semiconductor device is fabricated supported by said XY wafer stage; an excimer exposure light source for emitting excimer light that travels along an optical path extending to said wafer supported on said XY wafer stage whereby an exposure process occurs in which said wafer is exposed to the excimer light; a reticle stage; a reticle supported by said reticle stage in said optical path between said excimer light source and said wafer; a reduction-projective lens disposed in said optical path and through which the excimer light passes before passing to said wafer; and an alignment optical system for facilitating an alignment of said reticle with said wafer; said alignment optical system including an alignment light source emitting alignment light having a wavelength of 300 nm˜400 nm that travels along an optical path through said reticle and to said wafer.
Claim 8
Dependent Claim
27 words
An exposure apparatus as claimed in claim 5, wherein said alignment optical system includes an alignment key on said reticle and an alignment key on said wafer.
Claim 9
Dependent Claim
17 words
An exposure apparatus as claimed in claim 5 wherein said wafer has a positive resist layer thereon.
Claim 10
Dependent Claim
23 words
An exposure apparatus as claimed in claim 5, wherein said resist layer includes a base polymer of a compound having the formula ##STR4##
Claim 11
Dependent Claim
23 words
An exposure apparatus as claimed in claim 5, wherein said resist layer includes a base polymer of a compound having the formula ##STR5##
Claim 12
Dependent Claim
23 words
An exposure apparatus as claimed in claim 5, wherein said resist layer includes a base polymer of a compound of the formula ##STR6##
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-03-13 | 1992-09-12 | 1993-03-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-03-13 | 1996-09-12 | 1997-03-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-03-13 | 2000-09-12 | 2001-03-14 | $7700.00 | Window Closed / Lapsed |