Alignment device

Claim 2

An alignment device, comprising: a light source for illuminating alignment marks formed on two members which are to be aligned with each other, said light source emitting a light beam of a wavelength in a short wavelength range; imaging means for forming images of the alignment marks of the two members illuminated by said light source; and means for converting the wavelength of the light rays constituting the images formed by said imaging means to light rays of a longer wavelength.

Claim 3

A device according to claim 1, wherein said converting means is disposed in an image plane of said imaging means.

Claim 4

A device according to claim 2, wherein said imaging means forms an enlarged image of each of the alignment marks.

Claim 5

A device according to claim 1, wherein said converting means comprises a fluorescent plate.

Claim 6

A device according to claim 1, wherein said light source comprises an excimer laser.

Claim 7

An alignment and exposure apparatus for use with a mask and a wafer having alignment marks, respectively, for the manufacture of semiconductor circuit devices, said apparatus comprising: an excimer laser for irradiating the mask to transfer a pattern of the mask onto the wafer, said excimer laser emitting a laser beam having a wavelength; imaging means for forming images of the alignment marks of the mask and the wafer irradiated by the laser beam from said excimer laser; and means for converting the wavelength of the laser light constituting the images of the alignment marks of the mask and the wafer to a longer wavelength, said converting means being disposed at a position optically conjugate with each of the mask and the wafer.

Claim 8

An alignment and exposure apparatus for use with a mask and a wafer having alignment marks, respectively, for the manufacture of semiconductor circuit devices, said apparatus comprising: an excimer laser for irradiating the mask to transfer a pattern of the mask onto the wafer, said excimer laser emitting a laser beam having a wavelength; imaging means for forming images of the alignment marks of the mask and the wafer irradiated by the laser beam from said excimer laser; and means for converting the wavelength of the laser light constituting the images of the alignment marks of the mask and the wafer to a longer wavelength, said converting means being disposed at a position optically conjugate with each of the mask and the wafer.

Claim 9

An apparatus according to claim 6, wherein said converting means comprises a fluorescent plate.

Claim 10

An apparatus according to claim 6, further comprising a projection optical system for transferring the pattern of the mask onto the wafer.

Claim 11

An apparatus according to claim 8, wherein said projection optical system is a reflection type projection optical system.

Claim 12

An apparatus according to claim 8, wherein said projection optical system is a refraction type projection optical system.

Claim 13

An apparatus according to claim 10, wherein said projection optical system is a reduction projection type projection optical system.

Claim 14

An alignment device, comprising: a light source for illuminating alignment marks formed on two members which are to be aligned with each other, said light source emitting light of a wavelength in an invisible wavelength range; imaging means for forming images of the alignment marks of the two members illuminated by said light source; and means for converting to a visible wavelength the wavelength of the light constituting the images of the alignment marks that are formed by said imaging means.

Claim 15

An alignment device, comprising: a light source for illuminating alignment marks formed on two members which are to be aligned with each other, said light source emitting light of a wavelength in an invisible wavelength range; imaging means for forming images of the alignment marks of the two members illuminated by said light source; and means for converting to a visible wavelength the wavelength of the light constituting the images of the alignment marks that are formed by said imaging means.

Claim 16

A device according to claim 12, wherein said converting means is disposed in an image plane of said imaging means.

Claim 17

A device according to claim 12, wherein said converting means comprises a fluorescent plate.

Claim 18

A device according to claim 12, wherein said light source comprises an excimer laser.