US5769689A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Compositions and methods for polishing silica, silicates, and silicon nitride
Assignee: DuPont Electronic Materials Holding Inc
•
Filing: 1996-02-28
•
Granted: 1998-06-23
•
Expires: 2016-02-28
Abstract
Abstract A composition is provided, which is suitable for polishing SiO 2 , silicates, and silicon nitride, comprising an aquesous slurry of submicron SiO 2 particles and a soluble inorganic salt or combination of soluble inorganic salts of total solution concentration below the critical coagulation concentration for the slurry, wherein the slurry pH is adjusted to within the range of about 9 to 10 by addition of a soluble amine or mixture of soluble amines. Optionally, the compositions of this invention may also comprise a polyhydric alcohol.
Inventors
- 👤 David Cossaboon
- 👤 Jiun-Fang Wang
- 👤 Lee Melbourne Cook
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 21:28
CPC Classifications
C; C09; C09G; C09G1/00; C09G1/02
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
56 words
A composition suitable for polishing SiO 2 , silicates, and silicon nitride comprising: water. submicron SiO 2 particles, a soluble inorganic salt at a concentration below the critical coagulation concentration for said composition, wherein the pH of said composition is adjusted to within the range of about 9 to 10 by addition of a soluble amine.
Claim 2
Dependent Claim
56 words
A composition suitable for polishing SiO 2 , silicates, and silicon nitride comprising: water. submicron SiO 2 particles, a soluble inorganic salt at a concentration below the critical coagulation concentration for said composition, wherein the pH of said composition is adjusted to within the range of about 9 to 10 by addition of a soluble amine.
Claim 3
Dependent Claim
21 words
A composition of claim 1 wherein said soluble inorganic salt is present at a concentration of about 0.01% to about 1.0%.
Claim 4
Dependent Claim
28 words
A composition of claim 2 wherein said soluble inorganic salt contains a cation from the group consisting of NH 4 + , Cs + and Ba 2+ .
Claim 5
Dependent Claim
13 words
A composition of claim 1, 2, or 3 also comprising a polyhydric alcohol.
Claim 6
Dependent Claim
12 words
A composition of claim 4 wherein said polyhydric alcohol is 1,2 propanediol.
Claim 7
Dependent Claim
31 words
A composition of claim 3 comprising about 0.05 weight percent barium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 8
Dependent Claim
37 words
A composition of claim 3 comprising about 0.3 weight percent ammonium nitrate, about 0.05 weight percent barium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 9
Dependent Claim
37 words
A composition of claim 3 comprising about 0.3 weight percent ammonium nitrate, about 0.5 weight percent cesium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 10
Dependent Claim
35 words
A composition of claim 3 comprising about 0.95 weight percent cesium nitrate, about 500 ppm 1,2propanediol and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 11
Independent Claim
70 words
A method for polishing a workpiece comprised of silicon dioxide, silicates, or silicon nitride wherein the surface of said workpiece is exposed to a polishing composition comprising; water, submicron SiO 2 particles, a soluble inorganic salt at a concentration below the critical coagulation concentration for said composition, wherein the pH of said composition is adjusted to within the range of about 9 to 10 by addition of a soluble amine.
Claim 12
Independent Claim
70 words
A method for polishing a workpiece comprised of silicon dioxide, silicates, or silicon nitride wherein the surface of said workpiece is exposed to a polishing composition comprising; water, submicron SiO 2 particles, a soluble inorganic salt at a concentration below the critical coagulation concentration for said composition, wherein the pH of said composition is adjusted to within the range of about 9 to 10 by addition of a soluble amine.
Claim 13
Dependent Claim
22 words
A method according to claim 10 wherein said soluble inorganic salt is present at a concentration of about 0.01% to about 1.0%.
Claim 14
Dependent Claim
29 words
A method according to claim 11 wherein said soluble inorganic salt contains a cation from the group consisting of NH 4 + , Cs + and Ba 2+ .
Claim 15
Dependent Claim
19 words
A method according to claim 10, 11, or 12 wherein said composition is also comprised of a polyhydric alcohol.
Claim 16
Dependent Claim
13 words
A method according to claim 13 wherein said polyhydric alcohol is 1,2 propanediol.
Claim 17
Dependent Claim
37 words
A method according to claim 12 wherein said composition is comprised of about 0.05 weight percent barium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 18
Dependent Claim
43 words
A method according to claim 12 wherein said composition is comprised of about 0.3 weight percent ammonium nitrate, about 0.05 weight percent barium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 19
Dependent Claim
43 words
A method according to claim 12 wherein said composition is comprised of about 0.3 weight percent ammonium nitrate, about 0.5 weight percent cesium nitrate and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
Claim 20
Dependent Claim
41 words
A method according to claim 12 wherein said composition is comprised of about 0.95 weight percent cesium nitrate, about 500 ppm 1,2-propanediol and about 13 weight percent fumed silica, wherein the pH is adjusted to about 9.6 by addition of monoethanolamime.
References Cited (Backward Citations)
US4169337A
Cited
US4462188A
Cited
US4983650A
Cited
US4956015A
Cited
US5352277A
Cited
US5230833A
Cited
US5244534A
Cited
US5637185A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-06-22 | 2001-12-22 | 2002-06-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-06-22 | 2005-12-22 | 2006-06-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-06-22 | 2009-12-22 | 2010-06-23 | $7700.00 | Window Closed / Lapsed |