US4983650A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fine polishing composition for wafers
Assignee: Pharmacia Searle Ltd
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Filing: 1988-12-29
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Granted: 1991-01-08
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Expires: 2008-12-29
Abstract
Abstract A fine polishing composition for wafers, comprising water, particulate amorphous silica and a polysaccharide polymer graft-polymerized with acrylamide alone or together with at least one vinyl monomer selected from the group consisting of acrylic acid, methacrylic acid and styrenesulfonic acid, and adjusted with an alkaline substance to a pH of from 8 to 12.
Inventors
- 👤 Shigeo Sasaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 22:48
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/12; H10P90/129; C; C09; C09G; C09G1/00; C09G1/02; C09G1/04; C09K; C09K3/00; C09K3/14; C09K3/1454; C09K3/1463
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
93 words
An aqueous based, slurried, fine polishing composition for wafers, comprising: a water medium containing at least 0.1% by weight particulate amorphous silica having an average particle size within the range of from 5 mμm to 10 μm and a polysaccharide polymer graft-polymerized with acrylamide alone or together with at least one vinyl monomer selected from the group consisting of acrylic acid, methacrylic acid and styrenesulfonic acid in a concentration of from 1 ppm to 1000 ppm, said aqueous composition being adjusted with an alkaline substance to a pH of from 8 to 12.
Claim 2
Dependent Claim
93 words
An aqueous based, slurried, fine polishing composition for wafers, comprising: a water medium containing at least 0.1% by weight particulate amorphous silica having an average particle size within the range of from 5 mμm to 10 μm and a polysaccharide polymer graft-polymerized with acrylamide alone or together with at least one vinyl monomer selected from the group consisting of acrylic acid, methacrylic acid and styrenesulfonic acid in a concentration of from 1 ppm to 1000 ppm, said aqueous composition being adjusted with an alkaline substance to a pH of from 8 to 12.
Claim 3
Dependent Claim
96 words
An aqueous based, fine polishing composition for wafers, comprising: a water medium containing at least 0.1% by weight particulate amorphous silica having an average particle size within the range of from 5 mμm to 10 μm and a polysaccharide polymer graft-polymerized with acrylamide alone or together with at least one vinyl monomer selected from the group consisting of acrylic acid, methacrylic acid and styrenesulfonic acid in a concentration of from 1 ppm to 1000 ppm, and a water-soluble salt, said aqueous composition being adjusted with an alkaline substance to a pH of from 8 to 12.
Claim 4
Dependent Claim
96 words
An aqueous based, fine polishing composition for wafers, comprising: a water medium containing at least 0.1% by weight particulate amorphous silica having an average particle size within the range of from 5 mμm to 10 μm and a polysaccharide polymer graft-polymerized with acrylamide alone or together with at least one vinyl monomer selected from the group consisting of acrylic acid, methacrylic acid and styrenesulfonic acid in a concentration of from 1 ppm to 1000 ppm, and a water-soluble salt, said aqueous composition being adjusted with an alkaline substance to a pH of from 8 to 12.
Claim 5
Dependent Claim
24 words
The fine polishing composition according to claim 2, wherein the amount of said water-soluble salt is at least 20 ppm in the aqueous medium.
Claim 6
Dependent Claim
20 words
The fine polishing composition according to claim 1, wherein the amount of said particulate amorphous silica is 2 wt %.
Claim 7
Dependent Claim
25 words
The fine polishing composition according to claim 1, wherein the maximum amount of said particulate amorphous silica is an amount which still maintains a slurry.
Claim 8
Dependent Claim
29 words
The fine polishing composition according to claim 1, wherein the polysaccharide polymer is at least one member selected from the group consisting of water-soluble gua gum and xanthane gum.
Claim 9
Dependent Claim
21 words
The fine polishing composition according to claim 1, wherein the alkaline substance is an alkali metal hydroxide, an amine or ammonia.
Claim 10
Dependent Claim
83 words
The fine polishing composition according to claim 2, wherein the water-soluble salt is at least one compound composed of a combination of a cation selected from the group consisting of lithium ion, sodium ion, potassium ion, cesium ion and ammonium ion and an anion selected from the group consisting of fluorine ion, chlorine ion, bromine ion, iodine ion, sulfuric acid ion, nitric acid ion, perchloric acid ion, carbonic acid ion, formic acid ion, acetic acid ion, acrylic acid ion and oxalic acid ion.
References Cited (Backward Citations)
US4260396A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1994-01-07 | 1994-07-09 | 1995-01-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-01-07 | 1998-07-09 | 1999-01-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-01-07 | 2002-07-09 | 2003-01-08 | $7700.00 | Window Closed / Lapsed |