Patent US3715827A successfully refreshed from Google Patents.
Patent US5766360A successfully refreshed from Google Patents.
US5766360A
Expired / Lapsed
US
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Substrate processing apparatus and substrate processing method
Assignee: Toshiba Corp
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Filing: 1993-03-25
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Granted: 1998-06-16
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Expires: 2013-03-25
Abstract
Abstract A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.
Inventors
- 👤 Yuusuke Sato
- 👤 Toshimitsu Ohmine
- 👤 Takaaki Honda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 23:49
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0451; H10P72/0452; H10P72/0454; C; C23; C23C; C23C16/00; C23C16/44; C23C16/4412; C23C16/52; C23C16/54; H10P72/0461; H10P72/0466; H10P72/06
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
171 words
A substrate processing apparatus, comprising: a process chamber for performing a prescribed process with respect to a substrate; an inspection chamber, connected to said process chamber, for performing a prescribed analysis with respect to said substrate; a transfer assembly to load and unload said substrate between said process chamber and said inspection chamber; an analytic information storage memory to store analytic information of said substrate received from said inspection chamber; and an analytic information analyzer which retrieves said analytic information from said analytic information storage memory and analyzes said analytic information while said substrate is transferred to the outside of said inspection chamber by said transfer assembly or after said substrate is transferred to the outside of said inspection chamber by said transfer assembly, wherein at least one of said process chamber and said inspection chamber includes a load lock chamber having a volume less than volumes of the other chambers for changing the atmosphere in said process chamber or inspection chamber into the atmospheric air atmosphere or a vacuum atmosphere.
Claim 2
Dependent Claim
171 words
A substrate processing apparatus, comprising: a process chamber for performing a prescribed process with respect to a substrate; an inspection chamber, connected to said process chamber, for performing a prescribed analysis with respect to said substrate; a transfer assembly to load and unload said substrate between said process chamber and said inspection chamber; an analytic information storage memory to store analytic information of said substrate received from said inspection chamber; and an analytic information analyzer which retrieves said analytic information from said analytic information storage memory and analyzes said analytic information while said substrate is transferred to the outside of said inspection chamber by said transfer assembly or after said substrate is transferred to the outside of said inspection chamber by said transfer assembly, wherein at least one of said process chamber and said inspection chamber includes a load lock chamber having a volume less than volumes of the other chambers for changing the atmosphere in said process chamber or inspection chamber into the atmospheric air atmosphere or a vacuum atmosphere.
Claim 3
Dependent Claim
34 words
The substrate processing apparatus as set forth in claim 1, further comprising: a closing assembly, disposed between said process chamber and said inspection chamber, for air-tightly closing said process chamber and said inspection chamber.
Claim 4
Dependent Claim
26 words
The substrate processing apparatus as set forth in claim 2, wherein said closing assembly is adapted to operate in an interlocking relationship with said transfer assembly.
Claim 5
Dependent Claim
30 words
The substrate processing apparatus as set forth in claim 1, wherein said transfer assembly is disposed in a transfer chamber disposed adjacent to said process chamber and said inspection chamber.
Claim 6
Dependent Claim
33 words
The substrate processing apparatus as set forth in claim 1, wherein said analytic information analyzer is adapted to analyze said analytic information while or after said substrate is processed in said process chamber.
Claim 7
Dependent Claim
161 words
The substrate processing apparatus as set forth in claim 1, wherein said process chamber is a thin film growth chamber for forming a thin film on the surface of said substrate, said thin film growth chamber having a gas supply unit and a gas exhaust unit, wherein said substrate processing apparatus further comprises an exhaust gas analyzing unit connected to said gas exhaust unit, for analyzing the amount, the composition, or both the amount and composition of an exhaust gas; and a reference memory; a record/analysis/determination unit to set the amount, the composition, or both the amount and composition of supply gas supplied to said thin film growth chamber and process conditions of said thin film growth chamber; wherein said record/analysis/determination unit evaluates a thin film of said substrate according to an exhaust gas analysis result received from said exhaust gas analyzing unit by comparing the exhaust gas analysis result with reference information which has been stored in said reference memory.
Claim 8
Dependent Claim
138 words
The substrate processing apparatus as set forth in claim 6, further comprising: a supply gas analyzing unit connected to said gas supply unit, for analyzing the amount and composition of said supply gas, wherein said thin film growth chamber includes a pressure gauge and a thermometer for measuring the pressure and temperature therein, wherein said supply gas analyzing unit, said pressure gauge, and said thermometer are connected to said record/analysis/determination unit, and wherein said record/analysis/determination unit evaluates a thin film of said substrate according to results of analysis of said supply gas and said exhaust gas and measurement results of said pressure gauge and said thermometer by comparing the results of analysis of the supply gas and the measurement results of the pressure gauge and the thermometer with reference information which has been stored in said reference memory.
Claim 9
Dependent Claim
109 words
The substrate processing apparatus as set forth in claim 7, wherein said thin film growth chamber includes a substrate holder and a rotation meter, said holder for holding said substrate, said rotation meter for measuring rotational speed of said substrate holder, wherein said rotation meter is connected to said record/analysis/determination unit, and wherein said record/analysis/determination unit evaluates a thin film of said substrate according to analytic results of said supply gas and said exhaust gas, the pressure and temperature in said thin film growth chamber, and the rotational speed of said substrate holder by comparing the rotational speed with reference information which has been stored in said reference memory.
Claim 10
Dependent Claim
77 words
The substrate processing apparatus as set forth in claim 1, wherein said transfer assembly is disposed in a plurality of transfer chambers, each of which is arranged adjacent to said process chamber and said inspection chamber, and wherein a load lock chamber having a load lock mechanism is disposed between said transfer chambers, said load lock mechanism being adapted to change the atmosphere in said load lock chamber into the atmospheric air atmosphere or a vacuum atmosphere.
Claim 11
Dependent Claim
24 words
The substrate processing apparatus as set forth in claim 9, wherein said load lock chamber has process function means with respect to said substrate.
Claim 12
Dependent Claim
26 words
The substrate processing apparatus as set forth in claim 9, wherein a volume of said load lock chamber is less than volumes of the other chambers.
Claim 13
Dependent Claim
101 words
A substrate processing apparatus, comprising: a process chamber for performing a prescribed process with respect to a substrate; an inspection chamber, connected to said process chamber, for performing prescribed analyses with respect to said substrate before and after performing the prescribed process; a transfer assembly to load and unload said substrate between said process chamber and said inspection chamber; and a controller which controls the process chamber, the inspection chamber and the transfer assembly and calculates properties of the substrate in accordance with analysis results from the inspection chamber with respect to the substrate before and after performing the prescribed process.
Claim 14
Dependent Claim
101 words
A substrate processing apparatus, comprising: a process chamber for performing a prescribed process with respect to a substrate; an inspection chamber, connected to said process chamber, for performing prescribed analyses with respect to said substrate before and after performing the prescribed process; a transfer assembly to load and unload said substrate between said process chamber and said inspection chamber; and a controller which controls the process chamber, the inspection chamber and the transfer assembly and calculates properties of the substrate in accordance with analysis results from the inspection chamber with respect to the substrate before and after performing the prescribed process.
Claim 15
Dependent Claim
63 words
The substrate processing apparatus as set forth in claim 12, wherein the process chamber performs a process with respect to the substrate; the inspection chamber performs thickness measurements with respect to the substrate before and after performing the process; and the control unit calculates the thickness difference of the substrate in accordance with the results of the thickness measurements from the inspection chamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-06-15 | 2001-12-15 | 2002-06-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-06-15 | 2005-12-15 | 2006-06-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-06-15 | 2009-12-15 | 2010-06-16 | $7700.00 | Window Closed / Lapsed |