EP0430079A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Chemical vapor deposition apparatus of in-line type
Assignee: Ulvac Inc
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Filing: 1990-11-22
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Granted: —
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Expires: 2010-11-22
Abstract
Abstract An in-line type chemical vapor deposition apparatus having an etching device (6) for cleaning at least substrate holders, which is provided downstream the substrate unloading station ( ) in which the processed substrates are removed from the substrate holders in an atmosphere. The etching device comprises a plasma etching means in which the substrate holders are positioned on an anode side or a dry-etching means in which the substrate holders are positioned on a cathode side, thereby reducing the down time of the apparatus without any influence of an exfoliation of an adhered film from the substrate holders or other portions.
Inventors
- 👤 Kyuzo Chiba Chozairyo Kenkyujo Nakamura
- 👤 Michio Chiba Chozairyo Kenkyujo Ishikawa
- 👤 Kazuyuki Chiba Chozairyo Kenkyujo Ito
- 👤 Noriaki Chiba Chozairyo Kenkyujo Tani
- 👤 Masanori Chiba Chozairyo Kenkyujo Hashimoto
- 👤 Yoshifumi Chiba Chozairyo Kenkyujo Ota
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 00:02
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/54; C23C16/02; C23C16/0227; C23C16/0245
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
141 words
An in-line type chemical vapor deposition (CVD) apparatus comprising a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under an atmosphere pressure, a preparatory chamber being evacuated in which the substrate is pre-treated, a processing chamber in which a desired film is formed on the substrate, a substrate withdrawing chamber, a substrate unloading chamber in which the processed substrate is dismounted from the substrate holder, an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate in a vacuum condition, the substrate unloading chamber being connected to the substrate loading chamber via the etching chamber, a plurality of gate valves each of which is provided between the adjacent chambers, and means for transporting at least the substrate holder sequentially through the respective chamber.
Claim 2
Dependent Claim
141 words
An in-line type chemical vapor deposition (CVD) apparatus comprising a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under an atmosphere pressure, a preparatory chamber being evacuated in which the substrate is pre-treated, a processing chamber in which a desired film is formed on the substrate, a substrate withdrawing chamber, a substrate unloading chamber in which the processed substrate is dismounted from the substrate holder, an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate in a vacuum condition, the substrate unloading chamber being connected to the substrate loading chamber via the etching chamber, a plurality of gate valves each of which is provided between the adjacent chambers, and means for transporting at least the substrate holder sequentially through the respective chamber.
Claim 3
Dependent Claim
24 words
An apparatus according to claim 1, wherein said etching chamber is provided with RF cathode members which are movable together with said substrate holders.
Claim 4
Dependent Claim
29 words
An apparatus according to claim 1, wherein said etching chamber is arranged to perform a plasma etching in which the substrate holders to be etched behave an anode electrode.
Claim 5
Dependent Claim
28 words
An apparatus according to claim 1, wherein said etching chamber station is arranged to perform a dry-etching of the cathode plate and the substrate holders simultaneously or separately.
Claim 6
Dependent Claim
22 words
An apparatus according to claim 1, wherein said etching chamber is provided with means for applying RF voltage to each cathode member.
Claim 7
Dependent Claim
59 words
An apparatus according to claim 1, wherein said transporting means comprises rollers attached to the each substrate holder and run on a pair of rails laid through all of the chambers, and rack and pinion gear systems each of which includes a rack provided on the underside of the substrate holder and pinions provided in each of the chambers.
Claim 8
Dependent Claim
24 words
An apparatus according to claim 1, wherein said transporting means comprises a plurality of upper and lower roller trains provided in the each chamber.
Claim 9
Dependent Claim
24 words
An apparatus according to claim 7, wherein said each upper and lower roller train supports vertically the substrate holders and the RF cathode members.
References Cited (Backward Citations)
No citation records indexed.
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