Abstract A method of depositing a film of titanium nitride on a substrate which includes, positioning the substrate within a chemical vapor deposition reactor chamber which is maintained at a predetermined temperature and pressure; combining a gaseous source of nitrogen with a gaseous source of titanium to form a reactant gas mixture having complementary reactant molecules; and delivering the complementary reactant molecules within the chemical vapor deposition reactor from a selected distance from the substrate of greater than 1 cm. which facilitates the formation of titanium nitride film on the substrate having a given surface roughness which is at least 50% rougher than the titanium nitride film deposited using the same gaseous sources of titanium and nitrogen and which are combined under the same temperature and pressure condition but which are delivered to the surface of the substrate from a distance of about 1 cm. The gaseous sources of nitrogen may include phenylhydrazine.
A method of depositing and controlling relative surface roughness of a titanium nitride layer comprising: selecting a relative titanium nitride layer surface roughness; positioning a substrate having an outer surface within a chemical vapor deposition reactor; providing a gas delivery shower head spaced from the outer surface at a selected distance greater than 1 cm and less than or equal to about 5 cm, said distance being determined at least in part by the selected titanium nitride layer surface roughness; injecting a gaseous titanium organometallic compound and at least one of ammonia and phenylhydrazine through the shower head to chemical vapor deposit a titanium nitride layer having the selected surface roughness over the outer surface.
Claim 2
Independent Claim
115 words
A method of depositing and controlling relative surface roughness of a titanium nitride layer comprising: selecting a relative titanium nitride layer surface roughness; positioning a substrate having an outer surface within a chemical vapor deposition reactor; providing a gas delivery shower head spaced from the outer surface at a selected distance greater than 1 cm and less than or equal to about 5 cm, said distance being determined at least in part by the selected titanium nitride layer surface roughness; injecting a gaseous titanium organometallic compound and at least one of ammonia and phenylhydrazine through the shower head to chemical vapor deposit a titanium nitride layer having the selected surface roughness over the outer surface.
Claim 3
Dependent Claim
75 words
A chemical vapor deposition method of controlling relative surface roughness of a titanium nitride layer comprising selecting a gas delivery shower head distance from a substrate surface which is greater than 1 cm and less than about 5 cm for achieving a selected surface roughness, and injecting a gaseous titanium organometallic compound and phenylhydrazine through the shower head to chemical vapor deposit a titanium nitride layer having the selected surface roughness on the substrate surface.
Claim 4
Dependent Claim
75 words
A chemical vapor deposition method of controlling relative surface roughness of a titanium nitride layer comprising selecting a gas delivery shower head distance from a substrate surface which is greater than 1 cm and less than about 5 cm for achieving a selected surface roughness, and injecting a gaseous titanium organometallic compound and phenylhydrazine through the shower head to chemical vapor deposit a titanium nitride layer having the selected surface roughness on the substrate surface.