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US5726458A Expired / Lapsed US ⏱️ 0.0 years remaining

Hot carrier injection test structure and technique for statistical evaluation

Assignee: Advanced Micro Devices Inc
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Filing: 1997-02-28
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Granted: 1998-03-10
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Expires: 2017-02-28
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Abstract

Abstract An improved transistor design and methods of construction and testing for same. The novel transistor design method includes the steps of providing a transistor with multiple common gate areas; connecting each gate area to a pad; and adjusting the ratio of the area of the pad to the total of the gate areas to provide a predetermined ratio. The ratio may be adjusted by adjusting the size of the gate, in a single gate implementation, or adjusting the number of gates in a multiple gate configuration. The novel transistor includes a substrate, at least one source disposed on the substrate; at least one drain disposed on the substrate; and at least one gate disposed on the substrate between the source and the drain. The gate has a first layer of at least partially conductive material of area A g connected to a pad of area A p . In accordance with the present teachings, the antenna ratio R of the area of the pad A p to the area of the gate A g is a predetermined number. In practice, the ratio R would be chosen to be a minimum so that deleterious plasma currents attracted to the gate area would be reduced. In a particular implementation, the transistor includes plural gates each having a layer of at least partially conductive material of area A gn where n is any integer between 1 and N and where N is the total number of gates. In this case, the plural gates are interconnected and the ratio R is a predetermined number equal to A p /A gtotal , where A gtotal is the sum of the areas A gn and n is any integer between 1 and N. The novel method for testing multiple gate transistors includes the steps of connecting a first terminal of each of said transistors to a ground; interconnecting a second terminal of each transistor and applying a first source of supply potential; and selectively applying a second source of supply potential to a third terminal of a selected transistor.

Inventors

  • 👤 Nguyen Duc Bui

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:39
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267; H10P50/268; H10W; H10W72/00; H10W72/90; H10W72/921; H10W72/923; H10W72/951; H10W72/981; H10W72/983

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 114 words
A transistor structure comprising: a substrate; at least one source disposed on the substrate; at least one drain disposed on the substrate; and at least one gate disposed on the substrate between the source and the drain, the gate having a first layer of at least partially conductive material of area A g connected to a pad of area A p wherein the ratio R of A p to A g is equal to a predetermined number, the predetermined number having been chosen to be a minimum required to deter attraction of plasma current to the first layer of at least partially conductive material thereby deterring plasma current induced damage in the transistor structure.
Claim 2
Dependent Claim 114 words
A transistor structure comprising: a substrate; at least one source disposed on the substrate; at least one drain disposed on the substrate; and at least one gate disposed on the substrate between the source and the drain, the gate having a first layer of at least partially conductive material of area A g connected to a pad of area A p wherein the ratio R of A p to A g is equal to a predetermined number, the predetermined number having been chosen to be a minimum required to deter attraction of plasma current to the first layer of at least partially conductive material thereby deterring plasma current induced damage in the transistor structure.
Claim 3
Dependent Claim 43 words
The structure of claim 1 wherein the transistor includes plural gates each having a layer of at least partially conductive material of area A gn where n is any integer between 1 and N and where N is the total number of gates.
Claim 4
Dependent Claim 40 words
The structure of claim 2 wherein the ratio R is a predetermined number equal to A p /A g total, where A g total is the sum of areas A gn and n is any integer between 1 and N.
Claim 5
Dependent Claim 11 words
The structure of claim 3 wherein the plural gates are interconnected.
Claim 6
Dependent Claim 18 words
The structure of claim 1 including plural layers of conductive material connected between the gate and the pad.
Claim 7
Dependent Claim 17 words
The structure of claim 5 wherein the area A p includes the areas of the conductive layers.
Claim 8
Independent Claim 73 words
A method for designing a transistor including the steps of: providing a transistor with multiple common gate areas; connecting each gate area to a pad; and adjusting the ratio of the area of the pad to the total of the gate areas to provide a predetermined ratio, the predetermined ratio having been chosen, at least in part to be a minimum required to deter attraction of plasma current to the gate during fabrication.
Claim 9
Independent Claim 73 words
A method for designing a transistor including the steps of: providing a transistor with multiple common gate areas; connecting each gate area to a pad; and adjusting the ratio of the area of the pad to the total of the gate areas to provide a predetermined ratio, the predetermined ratio having been chosen, at least in part to be a minimum required to deter attraction of plasma current to the gate during fabrication.
Claim 10
Dependent Claim 35 words
The method of claim 7 wherein the step of adjusting the ratio of the area of the pad to the total of the gate areas includes the step of adjusting the size of a gate.
Claim 11
Dependent Claim 34 words
The method of claim 7 wherein the step of adjusting the ratio of the area of the pad to the total of the gate areas includes the step of adjusting the number of gates.

References Cited (Backward Citations)

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EP0076006A2 Cited
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US4631571A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-03-09 2001-09-08 2002-03-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-03-09 2005-09-08 2006-03-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-03-09 2009-09-08 2010-03-10 $7700.00 Window Closed / Lapsed

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