US5726097A
Expired / Lapsed
US
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Method of forming multilevel interconnections using high density plasma metal clean
Assignee: Sony Corp
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Filing: 1995-07-25
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Granted: 1998-03-10
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Expires: 2015-07-25
Abstract
Abstract A method of manufacturing a semiconductor device having multilevel interconnections comprising the steps of forming a lower interconnecting layer on a semiconductor substrate, forming a second interlayer insulation film on the lower interconnecting layer and forming a contact hole so as to expose the surface of the lower interconnecting layer, removing a native oxide film formed to the surface of the lower interconnecting layer by a non-oxidative plasma processing by using a plasma processing device at a plasma density between 1x1011/cm3 and 1x1014/cm3 while applying a substrate bias voltage of 200 V or higher and lower than 800 V, forming an upper interconnecting layer so as to fill the contact hole after removal of the native oxide film.
Inventors
- 👤 Toshiharu Yanagida
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 18:45
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10W20/031; Y; Y10; Y10S; Y10S438/00; Y10S438/906
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
145 words
A method of manufacturing a semiconductor device having multilevel interconnections comprising: forming a lower interconnecting layer through a first interlayer insulation film on a semiconductor substrate wherein the lower interconnecting layer is an Al-based metal layer, forming a second interlayer insulation film on said lower interconnecting layer and forming a contact hole in said second interlayer insulation film so as to expose a portion of said lower interconnecting layer; removing a native oxide film formed on said lower interconnecting layer, said removing being performed by non-oxidative plasma processing using a plasma processing device having a plasma generation source generating a plasma density of between 1×10 11 /cm 3 and 1×10 14 /cm 3 , while applying a substrate bias voltage; and forming an upper interconnecting layer after removing the native oxide film so as to fill said contact hole and contact said lower interconnecting layer.
Claim 2
Independent Claim
145 words
A method of manufacturing a semiconductor device having multilevel interconnections comprising: forming a lower interconnecting layer through a first interlayer insulation film on a semiconductor substrate wherein the lower interconnecting layer is an Al-based metal layer, forming a second interlayer insulation film on said lower interconnecting layer and forming a contact hole in said second interlayer insulation film so as to expose a portion of said lower interconnecting layer; removing a native oxide film formed on said lower interconnecting layer, said removing being performed by non-oxidative plasma processing using a plasma processing device having a plasma generation source generating a plasma density of between 1×10 11 /cm 3 and 1×10 14 /cm 3 , while applying a substrate bias voltage; and forming an upper interconnecting layer after removing the native oxide film so as to fill said contact hole and contact said lower interconnecting layer.
Claim 3
Dependent Claim
24 words
A method of manufacturing a semiconductor device as defined in claim 1, wherein the substrate bias voltage is between 200 V and 800 V.
Claim 4
Dependent Claim
38 words
A method of manufacturing a semiconductor device as defined in claim 1, wherein the plasma processing device is constructed such that a power source for said plasma generation source and a substrate bias voltage can be controlled independently.
Claim 5
Dependent Claim
38 words
A method of manufacturing a semiconductor device as defined in claim 1, wherein the plasma processing device is a ECR plasma processing device, an ICP processing device, a TCP processing device or a helicon wave plasma processing device.
Claim 6
Dependent Claim
39 words
A method of manufacturing a semiconductor device as defined in claim 1, wherein said removing the native oxide film and forming the upper interconnecting layer are conducted in sequence while said semiconductor device is constantly exposed to a vacuum.
Claim 7
Independent Claim
135 words
A method of manufacturing a semiconductor device having multilevel interconnections comprising: forming a lower interconnecting layer through a first interlayer insulation film on a semiconductor substrate, forming a second interlayer insulation film on said lower interconnecting layer and forming a contact hole in said second interlayer insulation film so as to expose a portion of said lower interconnecting layer; removing a native oxide film formed on said lower interconnecting layer, said removing being performed by non-oxidative plasma processing using a plasma processing device having a plasma generation source generating a plasma density of between 1×10 11 /cm 3 and 1×10 14 /cm 3 , while applying a substrate bias voltage; and forming an upper interconnecting layer after removing the native oxide film so as to fill said contact hole and contact said lower interconnecting layer.
Claim 8
Independent Claim
135 words
A method of manufacturing a semiconductor device having multilevel interconnections comprising: forming a lower interconnecting layer through a first interlayer insulation film on a semiconductor substrate, forming a second interlayer insulation film on said lower interconnecting layer and forming a contact hole in said second interlayer insulation film so as to expose a portion of said lower interconnecting layer; removing a native oxide film formed on said lower interconnecting layer, said removing being performed by non-oxidative plasma processing using a plasma processing device having a plasma generation source generating a plasma density of between 1×10 11 /cm 3 and 1×10 14 /cm 3 , while applying a substrate bias voltage; and forming an upper interconnecting layer after removing the native oxide film so as to fill said contact hole and contact said lower interconnecting layer.
Claim 9
Dependent Claim
24 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein the substrate bias voltage is between 200 V and 800 V.
Claim 10
Dependent Claim
38 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein the plasma processing device is adapted such that a power source for said plasma generation source and a substrate bias voltage can be controlled independently.
Claim 11
Dependent Claim
39 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing the native oxide film and forming the upper interconnecting layer are conducted in sequence while said semiconductor substrate is constantly exposed to a vacuum.
Claim 12
Dependent Claim
53 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing a native oxide film further comprises: placing said semiconductor substrate in a plasma processing chamber of said plasma processing device; and generating a plasma with an induction coupling coil disposed on lateral sides of said plasma processing chamber.
Claim 13
Dependent Claim
52 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing a native oxide film further comprises: placing said semiconductor substrate in a plasma processing chamber of said plasma processing device; and generating a plasma with TCP coils disposed on an upper surface of said plasma processing chamber.
Claim 14
Dependent Claim
55 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing a native oxide film further comprises: placing said semiconductor substrate in a plasma processing chamber of said plasma processing device to which is connected a plasma generation chamber; and generating a plasma with microwaves emitted into said plasma generation chamber.
Claim 15
Dependent Claim
68 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing a native oxide film further comprises: placing said semiconductor substrate in a plasma processing chamber of said plasma processing device to which is connected a plasma generation chamber; and generating a plasma with a helicon wave antenna disposed on said plasma generation chamber, wherein solenoid coils are disposed around said plasma generation chamber.
Claim 16
Dependent Claim
57 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said removing a native oxide film further comprises: placing said semiconductor substrate on a stage in a plasma processing chamber of said plasma processing device; adjusting the position of said stage within said plasma processing chamber to expose said semiconductor substrate to a plasma.
Claim 17
Dependent Claim
23 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said substrate has a diameter of 8 inches or more.
Claim 18
Dependent Claim
20 words
A method of manufacturing a semiconductor device as defined in claim 14, wherein said substrate bias voltage is 250 V.
Claim 19
Dependent Claim
20 words
A method of manufacturing a semiconductor device as defined in claim 6, wherein said substrate bias voltage is 200 V.
References Cited (Backward Citations)
US4705595A
Cited
US4704301A
Cited
US5498768A
Cited
US4985372A
Cited
US5447613A
Cited
US5316975A
Cited
US5512512A
Cited
US5403434A
Cited
US5629236A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-03-09 | 2001-09-08 | 2002-03-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-03-09 | 2005-09-08 | 2006-03-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-03-09 | 2009-09-08 | 2010-03-10 | $7700.00 | Window Closed / Lapsed |