Patent US5674413A successfully refreshed from Google Patents.
US5674413A
Expired / Lapsed
US
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Scattering reticle for electron beam systems
Assignee: International Business Machines Corp
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Filing: 1995-11-22
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Granted: 1997-10-07
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Expires: 2015-11-22
Abstract
Abstract A reticle for an electron beam system for direct writing applications has a base layer that contains a reticle pattern; a set of reinforcing struts connected to the base layer separating the base layer into a set of non-contiguous subfields; in which the pattern is carried by a set of apertures in said base layer; and in which the base thickness is set such that the probability that an electron traversing said base thickness will suffer a collision that removes it from the beam is greater than 90% while the probability that the electron will be absorbed is low; and in which, optionally, selected subfields of the reticle are compensated for errors in the remainder of the system.
Inventors
- 👤 Hans Christian Pfeiffer
- 👤 Werner Stickel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:36
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/20
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
156 words
A reticle for patterning an electron beam having a beam energy in an ebeam system comprising: a base layer of a base thickness and containing a reticle circuit pattern; a set of reinforcing struts connected to said base layer on a first side thereof and forming a strut pattern separating said base layer into a set of non-contiguous subfields, characterized in that: said reticle circuit pattern is carried by a set of apertures and scattering regions in said base layer; said set of non-contiguous subfields is comprised of two subsets of complementary subfields that are disposed in a plurality of parallel stripes, each having a stripe axis parallel to a mechanical scanning direction and having rows of N subfields disposed along said stripe axis where N is greater than 1; and adjacent stripes contain complementary subfields from said two subsets of complementary subfields, whereby each subfield is displaced from a complementary subfield on the same row.
Claim 2
Dependent Claim
156 words
A reticle for patterning an electron beam having a beam energy in an ebeam system comprising: a base layer of a base thickness and containing a reticle circuit pattern; a set of reinforcing struts connected to said base layer on a first side thereof and forming a strut pattern separating said base layer into a set of non-contiguous subfields, characterized in that: said reticle circuit pattern is carried by a set of apertures and scattering regions in said base layer; said set of non-contiguous subfields is comprised of two subsets of complementary subfields that are disposed in a plurality of parallel stripes, each having a stripe axis parallel to a mechanical scanning direction and having rows of N subfields disposed along said stripe axis where N is greater than 1; and adjacent stripes contain complementary subfields from said two subsets of complementary subfields, whereby each subfield is displaced from a complementary subfield on the same row.
Claim 3
Dependent Claim
19 words
A reticle according to claim 1, further characterized in that: said base thickness is less than a threshold thickness.
Claim 4
Dependent Claim
67 words
A reticle according to claim 2, further characterized in that: said subfields comprise a defined subfield and at least one overlap region adjoining an edge of said defined subfield and containing extensions of lines extending over said edge of said defined subfield, whereby images of said extensions on a target extend past the boundary of an image of said defined subfield and overlap an adjacent subfield image.
Claim 5
Dependent Claim
54 words
A reticle according to claim 1, further characterized in that: elements within at least one subfield on an outer position of at least one row are displaced compared with elements at corresponding positions within a central subfield of said at least one row, whereby optical distortions within said system are compensated by said displacement.
Claim 6
Dependent Claim
42 words
A reticle according to claim 4, further characterized in that: elements within at least one subfield on an outer position of at least one row are displaced in linear distortion of a magnitude sufficient to compensate for linear distortion in said system.
Claim 7
Dependent Claim
42 words
A reticle according to claim 4, further characterized in that: elements within at least one subfield on an outer position of at least one row are displaced in non-linear distortion of a magnitude sufficient to compensate for non-linear distortion in said system.
References Cited (Backward Citations)
US4140913A
Cited
US4243866A
Cited
US4376249A
Cited
US4577111A
Cited
US4621371A
Cited
US4544846A
Cited
US4780382A
Cited
US4855197A
Cited
US5364718A
Cited
US5036209A
Cited
US5105089A
Cited
US5260151A
Cited
US5308991A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-10-06 | 2001-04-07 | 2001-10-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-10-06 | 2005-04-07 | 2005-10-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-10-06 | 2009-04-07 | 2009-10-07 | $7700.00 | Window Closed / Lapsed |