US4577111A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for electron beam lithography
Assignee: Hitachi Ltd
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Filing: 1983-07-22
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Granted: 1986-03-18
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Expires: 2003-07-22
Abstract
Abstract An apparatus for electron beam lithography comprises at least one mask equipped with a polygonal aperture to be subjected to an electron beam from an electron beam generator, an electron lens system for demagnifying and imaging the polygonal aperture of the mask, and a solenoid coil for electron beam rotation adjustment placed between the mask and the final-stage electron lens.
Inventors
- 👤 Norio Saitou
- 👤 Susumu Ozasa
- 👤 Takashi Matsuzaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 22:55
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/02; H01J37/04; H01J37/10; H01J37/14; H01J37/141; B; B82; B82Y; B82Y10/00; B82Y40/00; H01J37/30; H01J37/3002; H01J37/3007; H01J37/317; H01J37/3174; H10; H10P; H10P95/00; H01J2237/00; H01J2237/04; H01J2237/045; H01J2237/0451; H01J2237/15; H01J2237/1505; H01J2237/152; H01J2237/30; H01J2237/304; H01J2237/30472; H01J2237/317; H01J2237/3175; H01J2237/31776
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
115 words
An apparatus for electron beam lithography comprising: means for generating an electron beam; first electrooptic means for shaping said electron beam to yield a desired sectional shape, said first electrooptic means including at least one mask having a polygonal aperture; second electrooptic means for demagnifying and imaging a shaped beam produced by said first electrooptic means onto a sample face and for deflecting the shaped beam; and third electrooptic means placed between said first and second electrooptic means for rotating and adjusting said shaped beam, said third electrooptic means including a solenoid coil having a focal distance which is at least five times as large as the distance between said first and second electrooptic means.
Claim 2
Independent Claim
115 words
An apparatus for electron beam lithography comprising: means for generating an electron beam; first electrooptic means for shaping said electron beam to yield a desired sectional shape, said first electrooptic means including at least one mask having a polygonal aperture; second electrooptic means for demagnifying and imaging a shaped beam produced by said first electrooptic means onto a sample face and for deflecting the shaped beam; and third electrooptic means placed between said first and second electrooptic means for rotating and adjusting said shaped beam, said third electrooptic means including a solenoid coil having a focal distance which is at least five times as large as the distance between said first and second electrooptic means.
Claim 3
Dependent Claim
50 words
An apparatus for electron beam lithography according to claim 1, wherein said first electrooptic means includes first and second masks respectively having first and second polygonal apertures and means for deflecting an electron beam passed through said first polygonal aperture and imaging said electron beam onto said second polygonal aperture.
Claim 4
Dependent Claim
48 words
an apparatus for electron beam lithography according to claim 1, wherein said second electrooptic means includes at least one-stage demagnifying lens, a projection lens and a deflector, and said third electrooptic means is placed between said polygonal aperture and either the final-stage demagnifying lens or said projection lens.
Claim 5
Dependent Claim
44 words
An apparatus for electron beam lithography according to claim 1, wherein said second electrooptic means includes a deflector and a projection lens which functions also as a demagnifying lens, and said third electrooptic means is placed between said polygonal aperture and said projection lens.
Claim 6
Dependent Claim
51 words
An apparatus for electron beam lithography according to claim 2, wherein said second electrooptic means includes at least one demagnifying lens, a projection lens and a deflector, and said third electrooptic means is placed between said seocnd polygonal aperture and either final one of said demagnifying lens or said projection lens.
Claim 7
Dependent Claim
44 words
An apparatus for electron beam according to claim 2, wherein said second electrooptic means includes a deflector and a projection lens which functions also as a demagnifying lens, and said third electrooptic means is placed between said second polygonal aperture and said projection lens.
References Cited (Backward Citations)
US4182958A
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JPS5445025A
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GB2005243A
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JPS551186A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-17 | 1989-09-16 | 1990-03-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-17 | 1993-09-16 | 1994-03-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-17 | 1997-09-16 | 1998-03-18 | $7700.00 | Window Closed / Lapsed |