Process chamber sleeve with ring seals for isolating individual process modules in a common cluster

Claim 2

A process chamber sleeve for isolating individual process modules in a common cluster, comprising: a cylindrical body with top and bottom opposite edges and extendible within a process station; a top ring seal disposed at said top edge for sealing against the inside surface of a lid attached to a wafer handling chamber; and a bottom ring seal disposed at said bottom edge for sealing against the top inside surface of said wafer handling chamber; wherein said process station is isolated from other process stations located in the same plane of the wafer processing chamber when the cylindrical body is extended to complete the seals of the top and bottom ring seals.

Claim 3

The sleeve of claim 1, wherein: the top ring seal is flared inward of the cylindrical body and mates with an upper seat disposed in said lid.

Claim 4

The sleeve of claim 1, wherein: the bottom ring seal is flared outward of the cylindrical body and mates with lower seat disposed in the floor of said wafer handling chamber.

Claim 5

The sleeve of claim 1, wherein: said wafer handling chamber has a planar lid that provides for the containment of a vacuum and includes a plurality of processing ports distributed around said planar lid with mating seats on an outside surface that provide for interchangeability with a plurality of process reactors that provide for independent types of semiconductor process functions and that each can mount at any one of said mating seats in individual ones of the plurality of processing ports.

Claim 6

The sleeve of claim 1, further comprising: means for allowing the shuttling of wafers for processing to points beneath individual ones of a plurality of processing ports in said lid, wherein said wafers are generally shuttled parallel to the plane of said planar lid simultaneously.

Claim 7

A modular wafer processing system, comprising: a wafer handling chamber with a planar lid that provides for the containment of a vacuum; a plurality of processing ports distributed around said planar lid with mating seats on an outside surface that provide for interchangeability; a plurality of process reactors that provide for independent types of semiconductor process functions and that each can mount at any one of said mating seats in individual ones of the plurality of processing ports; means for shuttling wafers for processing to points beneath individual ones of the plurality of processing ports and accessible to the output of each of the plurality of process reactors in the wafer handling chamber, wherein said wafers are generally shuttled parallel to the plane of said planar lid simultaneously; a plurality of cylindrical metal sleeves each with top and bottom end ring seals and extendible between the wafer handling chamber and corresponding ones of the plurality of processing ports, and providing for the isolation of eachprocess reactor from another; an anteroom chamber connected to one side of the wafer handling chamber and including a double-axis wafer transfer arm for linearly transferring a plurality of semiconductor wafers through the anteroom chamber; and an elevator chamber accessible to said double-axis wafer transfer arm and that accepts a cassette loaded with a plurality of said semiconductor wafers through a removable door and including an elevator platform on which said cassettes ride up and down, and an elevator drive to automatically position said elevator platform.

Claim 8

A modular wafer processing system, comprising: a wafer handling chamber with a planar lid that provides for the containment of a vacuum; a plurality of processing ports distributed around said planar lid with mating seats on an outside surface that provide for interchangeability; a plurality of process reactors that provide for independent types of semiconductor process functions and that each can mount at any one of said mating seats in individual ones of the plurality of processing ports; means for shuttling wafers for processing to points beneath individual ones of the plurality of processing ports and accessible to the output of each of the plurality of process reactors in the wafer handling chamber, wherein said wafers are generally shuttled parallel to the plane of said planar lid simultaneously; a plurality of cylindrical metal sleeves each with top and bottom end ring seals and extendible between the wafer handling chamber and corresponding ones of the plurality of processing ports, and providing for the isolation of eachprocess reactor from another; an anteroom chamber connected to one side of the wafer handling chamber and including a double-axis wafer transfer arm for linearly transferring a plurality of semiconductor wafers through the anteroom chamber; and an elevator chamber accessible to said double-axis wafer transfer arm and that accepts a cassette loaded with a plurality of said semiconductor wafers through a removable door and including an elevator platform on which said cassettes ride up and down, and an elevator drive to automatically position said elevator platform.

Claim 9

The system of claim 6, wherein each of the plurality of cylindrical metal sleeves comprises: a cylindrical body with top and bottom opposite edges and extendible within a process station; a top ring seal disposed at said top edge for sealing against the inside surface of a lid attached to a wafer handling chamber; and a bottom ring seal disposed at said bottom edge for sealing against the top inside surface of said wafer handling chamber; wherein said process station is isolated from other process stations located in the same plane of the wafer processing chamber when the cylindrical body is extended to complete the seals of the top and bottom ring seals.

Claim 10

The system of claim 6, wherein: the means for shuttling wafers comprises a multiple-spoke single-axis rigid-arm transfer carousel centrally located within the wafer handling chamber and providing for a simultaneous clockwise or counterclockwise transfer of a plurality of wafers.