Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
116 words
A method of fabricating a tapped CCD shift register, the tapped CCD shift register defining a longitudinal direction and including first and second CCD shift register segments, the first and second CCD shift register segments being characterized by a pitch length in the longitudinal direction, the method comprising steps of: forming a sense node adjacent to a terminal storage element of the first CCD shift register segment, the sense node being disposed between the first and second CCD shift register segments; and forming a first storage element in an initial end of the second CCD shift register segment, the first storage element and the sense node being disposed within one pitch length in the longitudinal direction.
Claim 2
Independent Claim
116 words
A method of fabricating a tapped CCD shift register, the tapped CCD shift register defining a longitudinal direction and including first and second CCD shift register segments, the first and second CCD shift register segments being characterized by a pitch length in the longitudinal direction, the method comprising steps of: forming a sense node adjacent to a terminal storage element of the first CCD shift register segment, the sense node being disposed between the first and second CCD shift register segments; and forming a first storage element in an initial end of the second CCD shift register segment, the first storage element and the sense node being disposed within one pitch length in the longitudinal direction.
Claim 3
Dependent Claim
90 words
The method of claim 1, further comprising a step of forming a second storage element adjacent to the first storage element in the second CCD shift register segment so that the first storage element is capable of storing the same signal charge as the second storage element, the second storage element being spaced from the first CCD shift register segment by one pitch length in the longitudinal direction, the first storage element and the sense node being disposed between the second storage element and the first CCD shift register segment.
Claim 4
Dependent Claim
137 words
The method of claim 2, wherein: the steps of forming a first storage element and forming a second storage element includes a step of forming a buried layer, the buried layer having a first dopant impurity concentration; the steps of forming a first storage element and forming a second storage element further includes a step of forming a trench region, the trench region having a second dopant impurity concentration, the second dopant impurity concentration being greater than the first dopant impurity concentration; and the step of forming a trench region includes steps of forming a first trench region characterized by a first trench area in the first storage element and forming a second trench region characterized by a second trench area in the second storage element, the first trench area being larger than the second trench area.
Claim 5
Independent Claim
130 words
A method of fabricating a CCD shift register, the CCD shift register defining a longitudinal direction, the CCD shift register being characterized by a pitch length in the longitudinal direction, the method comprising steps of: forming a first storage element in the CCD shift register, the first storage element being characterized by a first storage area and an extent in the longitudinal direction of one pitch length; and forming a second storage element in the CCD shift register so that the first storage element is capable of storing the same signal charge as the second storage element, the second storage element being characterized by a second storage area and an extent in the longitudinal direction of one pitch length, the second storage area being greater than the first storage area.
Claim 6
Independent Claim
130 words
A method of fabricating a CCD shift register, the CCD shift register defining a longitudinal direction, the CCD shift register being characterized by a pitch length in the longitudinal direction, the method comprising steps of: forming a first storage element in the CCD shift register, the first storage element being characterized by a first storage area and an extent in the longitudinal direction of one pitch length; and forming a second storage element in the CCD shift register so that the first storage element is capable of storing the same signal charge as the second storage element, the second storage element being characterized by a second storage area and an extent in the longitudinal direction of one pitch length, the second storage area being greater than the first storage area.
Claim 7
Dependent Claim
137 words
The method of claim 4, wherein: the steps of forming a first storage element and forming a second storage element includes a step of forming a buried layer, the buried layer having a first dopant impurity concentration; the steps of forming a first storage element and forming a second storage element further includes a step of forming a trench region, the trench region having a second dopant impurity concentration, the second dopant impurity concentration being greater than the first dopant impurity concentration; and the step of forming a trench region includes steps of forming a first trench region characterized by a first trench area in the first storage element and forming a second trench region characterized by a second trench area in the second storage element, the first trench area being larger than the second trench area.