US5645646A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Susceptor for deposition apparatus
Assignee: Applied Materials Inc
•
Filing: 1996-11-14
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Granted: 1997-07-08
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Expires: 2016-11-14
Abstract
Abstract An apparatus for depositing a material on a wafer includes a susceptor plate mounted in a deposition chamber. The chamber has a gas inlet and a gas exhaust. Means are provided for heating the susceptor plate. The susceptor plate has a plurality of support posts projecting from its top surface. The support posts are arranged to support a wafer thereon with the back surface of the wafer being spaced from the surface of the susceptor plate. The support posts are of a length so that the wafer is spaced from the susceptor plate a distance sufficient to allow deposition gas to flow and/or diffuse between the wafer and the susceptor plate, but still allow heat transfer from the susceptor plate to the wafer mainly by conduction. The susceptor plate is also provided with means, such as retaining pins or a recess, to prevent lateral movement of a wafer seated on the support posts.
Inventors
- 👤 Israel Beinglass
- 👤 Mahalingam Venkatesan
- 👤 Roger N. Anderson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:55
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/76; H10P72/7604; H10P72/7614; H10P72/7611
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
118 words
A susceptor for an apparatus for depositing a layer of a material on a surface of a wafer comprising: a plate having a continuous surface; and a plurality of support posts coupled to and projecting from the continuous surface of the plate, said support posts being arranged in spaced relation in a pattern which permits a wafer to be seated on the support posts with the wafer being spaced from the surface of the plate said support posts being sized and spaced sufficient to allow a gas to flow and/or diffuse between said continuous surface and substantially the entire back surface of the wafer, but still allow heat transfer from the plate to the wafer mainly by conduction.
Claim 2
Dependent Claim
118 words
A susceptor for an apparatus for depositing a layer of a material on a surface of a wafer comprising: a plate having a continuous surface; and a plurality of support posts coupled to and projecting from the continuous surface of the plate, said support posts being arranged in spaced relation in a pattern which permits a wafer to be seated on the support posts with the wafer being spaced from the surface of the plate said support posts being sized and spaced sufficient to allow a gas to flow and/or diffuse between said continuous surface and substantially the entire back surface of the wafer, but still allow heat transfer from the plate to the wafer mainly by conduction.
Claim 3
Dependent Claim
30 words
The susceptor of claim 1 in which the susceptor posts are arranged along a circle whose diameter is slightly less than the diamater of the wafer to be seated hereon.
Claim 4
Dependent Claim
21 words
The susceptor of claim 2 in which there are at least three support posts projecting from the surface of the plate.
Claim 5
Dependent Claim
19 words
The susceptor of claim 3 in which there are six support posts projecting from the surface of the plate.
Claim 6
Dependent Claim
20 words
The susceptor of claim 2 in which the support posts are of a length of between one-half to ten millimeters.
Claim 7
Dependent Claim
17 words
The susceptor of claim 5 in which the support posts are of diameter of about three millimeters.
Claim 8
Dependent Claim
20 words
The susceptor of claim 2 in which the support posts are of a length of between one to six millimeters.
Claim 9
Dependent Claim
45 words
The susceptor of claim 2 further comprising a plurality of retaining pins projecting from the surface of the plate, said retaining pins being longer than the support posts and being positioned so that a wafer mounted on the support posts is within the retaining pins.
Claim 10
Dependent Claim
34 words
The susceptor of a claim 8 in which the retaining pins are spaced around a circle whose diameter is slightly greater than the diameter of the wafer to be seated on the support posts.
Claim 11
Dependent Claim
26 words
The susceptor of claim 9 in which the retaining pins are of a length at least one-half millimeter longer than the length of the support pins.
Claim 12
Dependent Claim
38 words
The susceptor of claim 2 in which the plate has a top surface and a recess in the top surface, said recess having a bottom surface and the support posts project from the bottom surface of the recess.
Claim 13
Dependent Claim
41 words
The susceptor of claim 11 in which the recess has a diameter which is slightly greater than the diameter of the wafer to be seated on the support posts, and has a depth greater than the length of the support posts.
Claim 14
Independent Claim
118 words
An apparatus for depositing a layer of a material on a wafer comprising: a deposition chamber; a circular susceptor plate in the chamber and mounted on a shaft for rotation, said susceptor plate having a surface at the top thereof and a plurality of support posts projecting from said surface, said support posts being arranged in spaced relation in a pattern which permits a wafer to be seated on the support posts with the wafer being spaced from the surface of the susceptor plate to allow a gas to flow and/or diffuse between said susceptor plate and substantially the entire back surface of the wafer; a gas inlet into the chamber; and a gas outlet from the chamber.
Claim 15
Independent Claim
118 words
An apparatus for depositing a layer of a material on a wafer comprising: a deposition chamber; a circular susceptor plate in the chamber and mounted on a shaft for rotation, said susceptor plate having a surface at the top thereof and a plurality of support posts projecting from said surface, said support posts being arranged in spaced relation in a pattern which permits a wafer to be seated on the support posts with the wafer being spaced from the surface of the susceptor plate to allow a gas to flow and/or diffuse between said susceptor plate and substantially the entire back surface of the wafer; a gas inlet into the chamber; and a gas outlet from the chamber.
Claim 16
Dependent Claim
66 words
The apparatus of claim 13 in which the support posts on the susceptor plate are of a length to space the wafer from the surface of the susceptor plate a distance sufficient to allow a deposition gas to flow and/or diffuse between the wafer and the surface of the susceptor plate but still allow heat transfer from the susceptor plate to the wafer mainly by conduction.
Claim 17
Dependent Claim
27 words
The apparatus of claim 14 in which the support posts are of length of between one-half to 10 millimeters and of a diameter of about three millimeters.
Claim 18
Dependent Claim
46 words
The apparatus of claim 14 further comprising a plurality of retaining pins projecting from the surface of the susceptor plate, said retaining pins being longer than the support posts and being positioned so that a wafer seated on the support post is within the retaining pins.
Claim 19
Dependent Claim
33 words
The apparatus of claim 16 in which the retaining pins are spaced around a circle whose diameter is slightly greater than the diameter of the wafer to be seated on the support posts.
Claim 20
Dependent Claim
26 words
The apparatus of claim 17 in which the retaining pins are of a length at least one-half millimeter longer than the length of the support posts.
Claim 21
Dependent Claim
36 words
The susceptor of claim 14 in which the susceptor plate has a recess in its top surface with the recess having a bottom surface, and the support posts project from the bottom surface of the recess.
Claim 22
Dependent Claim
43 words
The susceptor of claim 19 in which the recess has a diameter which is slightly greater than the diameter of the wafer to be seated on the support posts and a depth which is slightly greater than the length of the support posts.
Claim 23
Dependent Claim
26 words
The apparatus of claim 13 in which the support posts are arranged along a circle whose diameter is slightly less than the diameter of the wafer.
Claim 24
Dependent Claim
22 words
The apparatus of claim 21 in which there are at least three support posts projecting from the surface of the susceptor plate.
Claim 25
Dependent Claim
13 words
The apparatus of claim 13 further comprising means for heating the susceptor plate.
Claim 26
Dependent Claim
11 words
The apparatus of claim 23 wherein said means comprises a lamp.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-07-07 | 2001-01-06 | 2001-07-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-07-07 | 2005-01-06 | 2005-07-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-07-07 | 2009-01-06 | 2009-07-08 | $7700.00 | Window Closed / Lapsed |