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US5622893A
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Method of forming conductive noble-metal-insulator-alloy barrier layer for high-dielectric-constant material electrodes
Assignee: California Institute of Technology
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Filing: 1994-08-01
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Granted: 1997-04-22
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Expires: 2014-08-01
Abstract
Abstract A preferred embodiment of this invention comprises an oxidizable layer (e.g. TiN 50), an noble-metal-insulator-alloy barrier layer (e.g. Pd-Si-N 34) overlying the oxidizable layer, an oxygen stable layer (e.g. platinum 36) overlying the noble-metal-insulator-alloy layer, and a high-dielectric-constant material layer (e.g. barium strontium titanate 38) overlying the oxygen stable layer. The noble-metal-insulator-alloy barrier layer substantially inhibits diffusion of oxygen to the oxidizable layer, thus minimizing deleterious oxidation of the oxidizable layer.
Inventors
- 👤 Scott R. Summerfelt
- 👤 Jason Reid
- 👤 Marc Nicolet
- 👤 Elzbieta Kolawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 09:04
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/60; H10D1/68; H10D1/692; H10D1/682; H10D1/696
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
69 words
A method of forming a microelectronic structure, said method comprising: (a) forming an oxidizable layer; (b) forming a noble-metal-insulator-alloy layer on said oxidizable layer; (c) forming an oxygen stable layer on said noble-metal-insulator-alloy layer; and (d) forming a layer of a high-dielectric-constant material on said oxygen stable layer, wherein the noble-metal-insulator-alloy layer inhibits diffusion of oxygen to the oxidizable layer, whereby deleterious oxidation of the oxidizable layer is minimized.
Claim 2
Independent Claim
69 words
A method of forming a microelectronic structure, said method comprising: (a) forming an oxidizable layer; (b) forming a noble-metal-insulator-alloy layer on said oxidizable layer; (c) forming an oxygen stable layer on said noble-metal-insulator-alloy layer; and (d) forming a layer of a high-dielectric-constant material on said oxygen stable layer, wherein the noble-metal-insulator-alloy layer inhibits diffusion of oxygen to the oxidizable layer, whereby deleterious oxidation of the oxidizable layer is minimized.
Claim 3
Dependent Claim
30 words
The method according to claim 1, said method further comprising exposing said structure to oxygen between said steps (c) and (d) to pre-oxidize a sidewall portion of said noble-metal-insulator-alloy layer.
Claim 4
Dependent Claim
31 words
The method according to claim 1, said method further comprising exposing said structure to oxygen between said steps (c) and (d) to pre-oxidize an upper surface portion of said noble-metal-insulator-alloy layer.
Claim 5
Dependent Claim
30 words
The method according to claim 1, said method further comprising forming an oxygen stable sidewall adjacent said noble-metal-insulator-alloy layer and said oxygen stable layer between said steps (c) and (d).
Claim 6
Dependent Claim
17 words
The method according to claim 1, wherein said noble-metal-insulator-alloy layer is partially oxidized during said step (d).
Claim 7
Dependent Claim
12 words
The method according to claim 1, wherein said noble-metal-insulator-alloy layer comprises Pd-Si-N.
Claim 8
Dependent Claim
30 words
The method according to claim 1, wherein said noble-metal-insulator-alloy layer is selected from the group consisting of: Pd-Si-N, Pt-Si-N, Pt-Si-O, Pd-Si-O, Pd-B-O, Pd-B-N, Pd-Al-N, Pd-Al-O, Ru-Si-O, Ru-Si-N, and combinations thereof.
Claim 9
Dependent Claim
46 words
The method according to claim 1, wherein said oxidizable layer is selected from the group consisting of: tantalum, tungsten, titanium, molybdenum, titanium nitrite, zirconium nitrite, titanium silicide, tantalum silicide, tungsten silicide, molybdenum silicide, tantalum carbide, titanium boride, boron carbide, silicon, germanium, carbon, GaAs, and combinations thereof.
Claim 10
Dependent Claim
50 words
The method according to claim 1, wherein said high-dielectric-constant material is selected from the group consisting of: barium strontium titanate, lead zirconate titanate, lead lanthanum titanate, lead lanthanum zirconate titanate, bismuth titanate, potassium tantalate, lead scandium tantalate, lead niobate, lead zinc niobate, potassium niobate, lead magnesium niobate, and combinations thereof.
Claim 11
Dependent Claim
13 words
The method according to claim 1, wherein said oxygen stable layer comprises platinum.
Claim 12
Dependent Claim
39 words
The method according to claim 1, wherein said oxygen stable layer is selected from the group consisting of: platinum, palladium, rhenium, rhodium, ruthenium oxide, tin oxide, indium oxide, rhenium oxide, osmium oxide, rhodium oxide, iridium oxide, and combinations thereof.
Claim 13
Dependent Claim
19 words
The method according to claim 1, said method further comprising forming an upper electrode on said high-dielectric-constant material layer.
Claim 14
Dependent Claim
35 words
The method according to claim 12, wherein said upper electrode is selected from the group consisting of: tungsten, tungsten nitride, titanium, titanium nitride, ruthenium dioxide, YBCO, platinum, palladium, rhodium, gold, iridium, silver, and combinations thereof.
Claim 15
Independent Claim
57 words
A method of forming a microelectronic structure, said method comprising: (a) forming a TiN layer; (b) forming a Pd-Si-N layer on said TiN layer; (c) forming a Pt layer on said Pd-Si-N layer; and (d) forming a barium strontium titanate layer on said Pt layer, wherein said Pd-Si-N layer inhibits diffusion of oxygen to said TiN layer.
Claim 16
Independent Claim
57 words
A method of forming a microelectronic structure, said method comprising: (a) forming a TiN layer; (b) forming a Pd-Si-N layer on said TiN layer; (c) forming a Pt layer on said Pd-Si-N layer; and (d) forming a barium strontium titanate layer on said Pt layer, wherein said Pd-Si-N layer inhibits diffusion of oxygen to said TiN layer.
References Cited (Backward Citations)
EP0514149A1
Cited
EP0609081A2
Cited
US5348894A
Cited
US5335138A
Cited
US5471364A
Cited
US5381302A
Cited
US5392189A
Cited
US5478772A
Cited
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